剪切变形方向特征对高纯铝箔轧制织构的影响

运用取向分布函数(ODF)研究了每个轧制道次的剪切变形特征对高纯铝箔轧制织构的影响.提出用中性角的相对大小来量化轧制剪切变形作用方向改变的位置,运用Taylor晶体塑性变形理论模拟计算了中性角的相对大小对轧制织构演变的影响.实测与模拟的轧制织构特征表明:中性角靠近轧制变形区的中心位置有利于形成{001}<110>剪切织构,从而证实了除剪切变形的程度外,剪切变形方向改变的位置也是影响高纯铝箔轧制织构的重要因素.     

等离子熔积直接成形形状特性的基础研究

系统分析了熔积成形技术中影响成形形状特性的原因,研究了转移弧电流、扫描速度和起弧高度对成形精度的影响机理.实验表明,以上参数对等离子熔积直接成形形状特性的影响显著,对改善零件的成形精度起决定性的作用;通过优化成形工艺参数,焊道表面质量得到显著好转.     

Reaction of Iradium with Metal Carbides in the Temperature Range of 1923 to 2400 K

The reactions of titanium carbide and hafnium carbide with iridium have been studied in thin film couples fabricated by vapor deposition processes. The reaction product layers after exposure in the temperature range of 1923 to 2400 K are dependent on the stoichiometry of the metal carbide layers and range from simple solid solutions to MIr_x compounds. The observed microstructures are predictable from available thermochemical data. The morphology of residual carbon in the reacted metal carbide-iridium product layer varies from interfacial deposits to uniform carbon dispersion and depends upon exposure temperature and metal carbide stoichiometry.     

常压CVD法制备氮氧化硅薄膜沉积特性的研究

采用常压化学气相沉积方法(atmospheric pressure chemical vapor deposition,APCVD)制备了氮氧化硅(Si—O—N)薄膜,研究了影响其沉积速率和生长模式的因素。在φ(NH_3):φ(SiH_4)=20:1,基板温度为650℃的条件下,当混合气体流量小于720ml/min时,薄膜的形成主要受气体扩散过程控制;当混合气体流量大于720 ml/min时,则主要受表面气相反应过程控制;混合气体流量为720 ml/min的条件下,氮氧化硅薄膜的沉积过程主要受基板表面的气相反应过程控制,薄膜沉积厚度与沉积时间成线性关系,反应速率为常数1640 nm/min,表面活化能为283 kJ/mol。通过SEM分析发现:氮氧化硅薄膜的形成方式符合三维成核模型,即反应初期Si,N,O等原子在基板表面相遇结合在一起形成原子团,一定数量的原子团构成临界核;反应中期临界核长大为岛状结构,岛不断长大,岛与岛之间相互接合形成通道网络结构;反应后期,原子不断填补网络空洞,最后成为连续薄膜。     

The role of the surface free energy in the selection of a suitable excipient in the course of a wet-granulation method

Pellets containing metronidazole were produced in a centrifugal granulator, with hydroxypropylcellulose (Klucel LF®) as binding agent, and corn starch, microcrystalline cellulose (Vivapur 101®) and lactose as excipients. The wettability of the pharmaceutical powders was assessed by means of contact angle measurements, and the dispersive and polar surface energies were determined. The spreading coefficients, the work of adhesion and the work of cohesion were calculated and correlated with the pellet properties (friability, bulk and tapped density, and porosity). The aim was to investigate the role of the surface free energy of one- and two-component powder compositions in pellet production. The interactions between the particles were found to be connected with the measured pellet parameters. It was concluded that, in the course of the growth of the pellets, the particle sizes of the pharmaceutical powders and the interactions between them are important. If the work of cohesion of the binder is lower than the work of cohesion of the substrate and the work of adhesion, then the optimal amount of the binding agent is that which coats the particles uniformly in minimal quantity and in continuous layer.     

Surface Pretreatments of Silicon Nitride for CVD Diamond Deposition

The efficiency of different surface pretreatments (four standard chemical etchings and four diamond powder abrasive procedures) on silicon nitride (Si₃N₄) substrates for chemical vapor deposition (CVD) of diamond has been systematically investigated. Blank Si₃N₄ samples were polished with colloidal silica (∼0.25 μm). Diamond nucleation and growth runs were conducted in a microwave plasma chemical vapor deposition apparatus for 10 min and 6 h, respectively. Superior results concerning nucleation density ( N _d∼ 10¹⁰ cm⁻² after 10 min), film uniformity, and grain size (below 2 μm after 6 h) were obtained for the mechanically microflawed samples, revealing that chemical etchings (hot and cold strong acids, molten base or CF₄ plasma) are not crucial for good CVD diamond quality on Si₃N₄.     

Growth of sculptured polymer submicronwire assemblies by vapor deposition

We have grown helical nanowire assemblies of parylene C, thereby demonstrating that polymeric sculptured thin films (STFs) can be fabricated by a combination of physical and chemical vapor deposition processes. The deposition method is explained in detail and electron micrographs of 200-400 nm size sculptured thin film of parylene are given. The shapes of the submicron and nanowire assemblies can be engineered so that the polymeric STF acts as a template for preferential attachment of biomolecules.     

薄板坯连铸浸入式水口结构数值模拟

使用有限元计算方法开展薄板坯连铸浸入式水口流场的研究 ,分别对水口不同浸入深度的流场分布、水口出口不同角度的流场分布进行计算。结果发现 :水口的浸入深度在 30 0mm时较为合理 ;水口的出口角度以R1 5、60°、45°为宜     

液相法制备纳米Fe_3O_4的研究进展

介绍沉淀法、微乳液法及水热法等纳米Fe3O4的制备方法,讨论了这些方法的优缺点。指出了沉淀法是目前制备纳米Fe3O4的最广泛应用的方法,而超声技术、交流电沉积与传统沉淀法的结合,是制备高纯度、小粒径、均匀分散的Fe3O4最有前途的方法。     

臭氧氧化处理法对聚丙烯表面涂装性的改良 Ⅳ.聚丙烯表面亲水性和涂膜剥离强度的关系

讨论了用臭氧氧化法对聚丙烯表面进行涂装性改良时,丙烯均聚物、乙烯-丙烯嵌段共聚物及无规共聚物表面以接触角表示的亲水性和涂膜剥离强度之间的关系。结果表明,当聚丙烯表面对水的接触角在84°附近时,可反应型涂料的涂膜剥离强度将出现最大值。在此也证明了涂膜的剥离破坏存在着接着破坏和凝集破坏两种机理,当接触角减小到84°及84°以上时,剥离发生在聚丙烯和涂层的界面上产生接着破坏;当接触角减小到84°以下时,剥离发生在聚丙烯的表面氧化层相中,产生凝集破坏。