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951.
952.
In the present work, we report the formation of residual oxide layer during chemical–mechanical-planarization (CMP) process in the carbon nanotube (CNT) via interconnects and some feasible solutions for its removal. Residual oxide layer makes electrically poor contact between CNTs and metal resulting in high contact resistance in CNT via interconnects. We adopt post-CMP processes such as hydrofluoric acid (HF) or Ar plasma treatment to remove the residual oxide layer. X-ray photoelectron spectroscopy (XPS) was used to confirm the chemical state of samples before and after the post-CMP process. Silicon and oxygen peaks from silicon-based oxide layer observed after the CMP process were disappeared and reduced in its intensity by the post-CMP process, respectively. Furthermore, via resistance decreased more than 1 order of magnitude after the post-CMP process. It is found that the post-CMP process provides good electrical contact between CNTs and metal by removing the residual oxide layer. 相似文献
953.
B. Gaković B. Radak C. Radu M. Zamfirescu M. Trtica S. Petrović J. Stašić P. Panjan I.N. Mihailescu 《Surface & coatings technology》2012
We studied surface modification of a double layer protective coating on steel induced by single fs laser pulse irradiation in ambient air. The outer alumina (Al2O3) layer, which protects against aggressive environments, was 1.7 μm thick and the titanium aluminum nitride (TiAlN) layer in contact with the steel surface had a thickness of 1.9 μm. The pulses (λ = 775 nm, τ = 200 fs) were generated by a Ti:sapphire laser source. The pulse energy was varied from 0.32 μJ to 50 μJ, corresponding to an incident laser fluence of 0.11 J cm− 2 to 16.47 J cm− 2. The surface damage threshold was found to be 0.20 J cm− 2 and the alumina layer removal was initiated at 0.56 J cm− 2. This selective ablation of alumina was possible in a wide range of fluences, up to the maximum applied, without ablating the TiAlN layer beneath. 相似文献
954.
955.
Wei Zou Xiaozhou Cai Jianwen Li Xinyi Dai Haiquan Zhang Aijun Zhou Jingze Li Lijun Song Tomokazu Iyoda 《Surface & coatings technology》2012,206(22):4634-4638
Selective deposition of Ag onto nanostructured block copolymer film template of poly(ethylene oxide) and poly(methacrylate) with azobenzene mesogen (PEO-b-PMA(Az)) has been done by thermal evaporation technique. A hexagonally arranged pattern or ordered strip structure of the PEO nanocylinders dispersed in the PMA(Az) matrix appears on the pure copolymer film surface after thermal annealing at 140 °C or 110 °C, respectively. Atomic force microscopy confirms that the deposited Ag atoms prefer to wet PMA(Az) matrix domains on the film surface, and finally aggregate into discrete nanoparticles in both cases. An ordered porous metallic layer is created on the hexagonally patterned copolymer template surface due to the preferential interaction of Ag toward the PMA(Az) phase. Alternatively, ordered array of metallic chains is formed on the template featured with strip structure. While the nominal layer thickness of the deposited Ag is 50 nm, the ordered metallic nanostructure disappears, indicating the host copolymer template cannot guide the spatial distribution of the deposited metal any more. 相似文献
956.
烧结材料孔隙形态与分布对离子氮碳共渗层组织结构的影响 总被引:1,自引:0,他引:1
研究了烧结材料孔隙形态与分布对离子氮碳共渗层组织结构的影响。试验表明,随试样孔隙数量的增加,γ'相含量和扩散层深度增加。由于试样的正压制面与侧压制面的孔隙形态及分布不同,导致化合物层深度和相组成不同。还观察讨论了氮原子在氮碳共渗层的分布状态。 相似文献
957.
镶嵌活塞Alfin粘结层失效机理及质量提高研究 总被引:1,自引:0,他引:1
通过改变铸铁圈的化学成分,使铸铁镶圈与活塞本体的硅铝合金膨胀性能基本相近,最大限度地降低了Alfin粘结层的热膨胀应力:同时优化模具结构和浇注工艺.使镶圈在模具型腔内准确迅速定位、快速合模及铝液快速覆盖镶圈,降低了镶圈表面扩散层的氧化程度,提高了Alfin粘结层质量,从而延长了镶圈活塞的使用寿命. 相似文献
958.
利用XRD、电子背散射衍射分析(EBSD)和反射高能电子衍射(RHEED)等测试手段对化学溶液沉积技术制备的La2Zr2O7缓冲层的体织构和表面特性进行了研究。结果表明,在金属基带上,利用化学溶液沉积技术制备的La2Zr2O7缓冲层具有良好体织构和表面特性。 相似文献
959.
960.
Nanoflower-like CuO/Ni film was prepared by electrodeposition method in an alkaline nickel electroplating solution, and the nanoflower-like CuO film was obtained by direct oxidation on copper substrate. The nanoflower-like CuO was crystalline with space group of C2/c, and the amorphous Ni particle layer on the surface of film contacted well with the nanoflower-like CuO. The electrochemical properties of CuO/Ni film were investigated by cyclic voltammetry (CV) and galvanostatic charge-discharge tests. Since the metallic Ni can act as conductor and catalyst, the CuO/Ni film exhibits higher initial coulombic efficiency (72.1%) than the pure CuO film (57.0%), and better capacity retention (96.3% of the 2nd cycle) than the pure CuO film (67.8% of the 2nd cycle) at the current density of 0.1 mA cm−2. 相似文献