Measurement and Identification of the Parameters of SPICE-Models of a Bipolar Transistor

A method of measuring and identifying the static parameters of a bipolar transistor is considered. The characteristic of the transistor, from which the parameters of the model are determined, is chosen depending on what group the calculated parameters belong to. The characteristics are measured in such a way that the equations of the model describing them can be reduced to the simplest form.     

纳米ZrO2等离子涂层的结构,性能和工艺特点

采用大气等离子喷涂技术(APS)，制备了常规氧化锆和纳米结构氧化锆两种涂层．利用扫描电镜(SEM)对涂层的显微结构进行了观察．对两种涂层的沉积效率、表面粗糙度和显微硬度作了对比研究．结果表明，粉末原料的显微结构、粒度、形态、喷涂工艺参数(喷涂功率和距离)对涂层的显微结构有较大的影响．等离子喷涂造粒纳米氧化锆粉制备的涂层沉积效率高而稳定，其显微结构与喷涂功率和距离密切相关．与常规氧化锆涂层相比，纳米结构氧化锆涂层具有较高的显微硬度和较低的表面粗糙度．     

基于模式理论光栅椭偏参数反演的数值模拟

将一种广泛用于求解系统优化问题的方法——正单纯形法，求解光栅的椭偏方程。首先，利用求解光栅的傅立叶模式理论对TE和TM波的复反射系数进行求解。然后计算出其相应的椭偏参数(△，Ψ)，并在该值的基础上加入不同偏差的随机高斯噪声，将加入噪声后的值(△m，Ψm)作为模拟测量值。最后使用优化算法进行反演。通过对几种常用面形光栅椭偏参数的数值模拟，一方面表明傅立叶模式理论计算光栅的椭偏参数不仅精度高。而且速度快；另一方面表明利用正单纯形法得到的光栅参数值很接近于正演时假设的参数值，从而从理论上证明了利用椭偏法测量光栅各种光学参数的可行性。     

露天多段深孔微差爆破孔网参数优化设计

本文对露天多段深扎微差爆破孔网参数进行了优化，使每排炮扎成直线排列，两排之间成交替正三角形排列，优化设计后，爆破作用比较均匀，大块率下降了56％，同时，爆破根底产生的机会和程度也大大下降。     

A closed loop exponential feeding law: Invariance and global stability analysis

This article addresses the computation of invariant control laws [A. Fradkov, I. Miroshnik, V. Nikiforov, Nonlinear and Adaptive Control of Complex Systems, Kluwer, 1999] for fed-batch fermenters represented by two standard models. It will be shown how to derive partial state feedbacks that, assuming ideal conditions and perfect model, keep the specific growth rate μ constant provided the initial conditions are adequate. The invariant control law is the closed loop version of the exponential feeding already suggested in several references as shown later. The paper presents an analysis of invariance and a study of global stability within the framework of partial stability. That is, stability with respect to some of the state variables. This enables us to treat the case with Haldane-like or non-monotonous kinetics.     

钻井参数仪的模块化设计方法研究

文章以模块化设计原理为基础，讨论了钻井参数仪的模块划分，模块化设计准则和主要设计内容。采用模块化设计方法、现场设备网络的开放网络和现场总线解决方案设计的钻井参数仪，具有传输信号稳定、可靠性高、抑制噪声能力强、组建现场网络成本低等特点。     

聚甲亚胺改性尼龙6复合材料的等温结晶动力学

采用差示扫描量热法（DSC）对聚甲亚胺（PAM）/尼龙6复合材料等温结晶过程进行了研究。结果表明，PAM的加入使得基体的结晶速率增大，尤其是当含量为5%时，半结晶期明显减少。研究还发现，该体系的等温结晶过程完全可以用Avrami方程来描述，各试样的Avrami指数均在2-3之间，表明Avrami指数，球晶生长方式基本不受聚甲亚胺加入的影响。基体中原位形成的聚甲胺微纤起到了诱导结晶的作用，使得基体的结晶速率加快，但随着微纤含量的增加，由于分散性能变差而使得诱导结晶的能力减弱，表现为结晶速率又有所降低。     

STATIONARY TANGENT: THE DISCRETE AND NON-SMOOTH CASE

Abstract. In Keich (2000 ),we define a stationary tangent process, or a locally optimal stationary approximation, to a real non-stationary smooth Gaussian process. This paper extends the idea by constructing a discrete tangent – a `locally' optimal stationary approximation – for a discrete time, real Gaussian process. Analogously to the smooth case, our construction relies on a generalization of the recursion formula for the orthogonal polynomials of the spectral distribution function. More precisely, we use a generalization of the Schur parameters to identify the stationary tangent. By way of discretizing, we later demonstrate how this tangent can be used to obtain `good' local stationary approximations to non-smooth continuous time, real Gaussian processes. Further, we demonstrate how, analogously to the curvatures in the smooth case, the Schur parameters can be used to determine the order of stationarity of a non-smooth process.     

带参数的一阶脉冲微分方程边值问题

利用上下解和单调迭代法。讨论了带参数的一阶脉冲微分方程。获得了单边Lipschitz条件下这类方程边值问题的解的存在性。     

Investigation into polishing process of CVD diamond films

A new technique used for polishing chemical vapor deposition (CVD) diamond films has been investigated, by which rough polishing of the CVD diamond films can be achieved efficiently. A CVD diamond film is coated with a thin layer of electrically conductive material in advance, and then electro-discharge machining (EDM) is used to machine the coated surface. As a result, peaks on the surface of the diamond film are removed rapidly. During machining, graphitization of diamond enables the EDM process to continue. The single pulse discharge shows that the material of the coated layer evidently affects removal behavior of the CVD diamond films. Compared with the machining of ordinary metal materials, the process of EDM CVD diamond films possesses a quite different characteristic. The removal mechanism of the CVD diamond films is discussed.