Micro-RBS characterisation of the chemical composition and particulate deposition on pulsed laser deposited Si1−xGex thin films

The formation and deposition of particulates by pulsed laser deposition of Si_1−xGe_x semiconductor alloy thin films are discussed. Using Rutherford backscattering spectrometry with micrometer lateral resolution (micro-RBS) the film composition was measured with high accuracy, even in the presence of particulates with a high areal density of 20,000–30,000 particulates per mm². We show that on impact of a particulate, the part of the thin film which is already deposited probably melts and its Ge content segregates to the surface.     

Study on axiomatic rules for building up relationships between requirement and source programs

The purpose of our study is to build up relationships between requirement and source programs with our originally thought-out rules. When other rules to be derived from these original rules are applied to software development, even a single instruction in a programming language could be determined, and the program would satisfy the requirement. More specifically speaking, these rules will turn into a formula or a prototype of software programs. Hence, when the variables in the requirement are placed in the formula, we can get a required program in an automatic way.     

Surface Hardening of High-Strength Low Alloy Steels (HSLA) Dual-Phase Steels by Ball Burnishing Using Factorial Design

Burnishing is used increasingly as a finishing operation which gives additional advantages such as increased hardness, fatigue strength, and wear resistance. Experimental work based on 3⁴ factorial design was carried out to establish the effects of ball burnishing parameters on the surface hardness of high-strength low alloy steels (HSLA) dual-phase (DP) steel specimens. Statistical analysis of the results shows that the speed, feed, lubricant and ball diameter have significant effect on surface hardness.     

一种基于GE90-30PLC的飞剪自动控制系统

本文介绍了调整线材轧线精轧机前专用于切头的启停式飞剪的自动控制系统。该系统以GE90—30PLC为控制核心，辅以热金属HMD、光电编码器等元件，能很好地完成飞剪的剪切及定位。其中着重阐述了飞剪控制中各个重要参数的计算原理和方法。     

PRO——一种新的地震资料处理方法

PRO(影像的参数展开)技术是由俄罗斯地球物理学家开发的一种崭新的地震资料处理技术。本文从PRO基本原理入手,简单介绍了PRO的速度分析原理。PRO速度分析和成像均以信号的椭圆展开和参数展开为基础,其中参数展开方法考虑波型转换、介质的横向不均匀造成传播速度的变化。该技术抛开了传统共中心点叠加的思想,从根本上解决了以CMP方法为基础的传统地震处理技术遇到的困难。通过模型与实例分析对比,PRO比传统CMP方法更优越。     

聚氨酯-聚丙烯酸酯共聚乳液的成膜和性能

通过XPS和接触角测试研究了聚氨酯-聚丙烯酸酯共聚乳液在不同基材上的成膜情况，并对共聚胶膜的耐水性和附着力进行了考察．由于该共聚乳液同时存在着亲水组分和疏水组分，所以它在不同的基材上成膜可导致其膜表面的组成成分不同，因而导致其耐水性和附着力也随基材而异。结果表明，亲水性的聚氨酯组分均富集于胶膜内部，但胶膜底层聚氨酯组分的含量却随基材的不同而不同。在憎水且表面张力较高的基材上，共聚胶膜的耐水性良好；共聚胶膜的附着力在表面张力较高的基材上也良好。     

76 mm口径EFP成形过程数值模拟及影响因素研究

采用LS-DYNA3D对76mm口径药型罩爆炸成型弹丸(EFP)的成形过程进行了数值模拟，模拟结果与实验数据基本吻合．通过数值模拟着重分析了装药长径比L／D、壳体厚度、药型罩壁厚对EFP速度的影响规律，得到了有关EFP成形速度公式，得出EFP速度随L／D的增大而增大，随药型罩厚度增大而减小，受装药外壳厚度影响不大．     

大庆油田三类油层聚合物驱注入速度研究

注入速度是影响聚合物驱开发效果的重要指标,而由于假设条件的局限性,数值模拟方法无法体现聚合物溶液弹性对注入速度的影响。为了确定大庆油田三类油层合理注入速度,通过不同注入速度条件下的天然岩心驱油试验,对水驱和聚合物驱驱油效率进行了研究,结果表明,聚合物驱驱油效率提高值随驱替速度的变化可由二次多项式来表示。依据此关系式,由势的叠加理论得到的流体在油层中的渗流速度的基础上,建立了该类油层合理注入速度模型,并给出大庆油田三类油层在100 m注采井距下的合理注入速度为0.288 PV年/,该方法对现场开发方案编制有重要指导意义。     

The Amygdala Modulates Hippocampus-Dependent Context Memory Formation and Stores Cue-Shock Associations.

Preexposing rats to the context facilitates subsequent contextual fear conditioning. This effect depends on the hippocampus (J. W. Rudy, R. M. Barrientos, & R. C. O'Reilly, 2002). The authors report that inactivating the basolateral region of the amygdala (BLA) by injecting muscimol, a GABAA agonist, before or after preexposure reduced this effect. In contrast, bilateral injections of anisomycin, a protein synthesis inhibitor, into BLA did not impair the consolidation of the context memory. However, when injected after fear conditioning, anisomycin impaired consolidation of both contextual and auditory-cue fear conditioning. Results are consistent with 2 ideas about the amygdala's contribution to memory: (a) It modulates memory formation in other regions of the brain, and (b) it is a storage site for cue-shock associations. (PsycINFO Database Record (c) 2010 APA, all rights reserved)     

Formation of C49-TiSi2 in flash memories: a nucleation controlled phenomenon?

The formation of Ti silicides has been examined in flash memories with 0.25 μm linewidth by X-ray diffraction, scanning electron microscopy, and transmission electron microscopy. It has been observed that, after the first rapid thermal process and the selective metal etch, there is no silicide on the source and on a majority of drain contacts while C49-TiSi₂ is found on the gate. A pre-amorphisation implant increases drastically the formation of C49-TiSi₂ in the drain zone while modifications of annealing conditions have little impact. These results indicate that the formation of C49-TiSi₂ is most likely controlled by nucleation and that this nucleation is sensitive to both the width and the length of the reaction zone. The formation of a Ti rich silicide may play an important role in this nucleation by decreasing the driving force for the formation of C49-TiSi₂. Curiously enough, the formation of C49-TiSi₂ appears thus as a major concern for the salicide process in flash memories.