基于GIS的水电工程可视化辅助设计理论与方法

针对当前水电工程设计领域存在的计算机应用水平还有待于提高，设计过程复杂且不直观等情况，在探讨工程可视化辅助设计(VCAD)基本概念及其理论构成体系的基础上，提出了基于GIS的水电工程可视化辅助设计理论与方法，实现了直观方便的设计建模和设计过程的交互控制，以及设计成果的直观形象表达，从而有助于提高工程设计的效率和质量，也为大型水利水电工程设计提供了一种新的辅助手段．     

300km/h高速铁路PC槽型梁动力试验研究

介绍北方交通大学与比利时鲁汶大学、布鲁塞尔自由大学、比利时铁路公司合作,在巴黎至布鲁塞尔之间高速铁路线上的Antoing大桥进行的二次高速铁路桥梁动力试验。试验桥梁由跨度50m的多跨预应力混凝土简支槽型梁构成,试验中列车速度达265-310km/h。通过现场试验和实验结果分析,得到了桥梁的频率、振型、阻尼等自振特性,以及桥梁在高速列车作用下的动挠度、梁和桥墩的横向和竖向加速度、橡胶支座的相对位移、梁体的动应变等动力响应特性。试验经验和测试结果对于充实高速铁路桥梁动力分析理论、改进数值分析模型、验证计算结果、提高高速铁路桥梁的动力设计水平、保证行车安全,具有重要的意义。     

Synthesis and luminescence of Sr2CeO4 fine particles

Fine particles of a blue emission phosphor Sr₂CeO₄ have been synthesized using a chemical co-precipitation technique, and the textual and luminescent properties were compared with the one synthesized by the conventional solid-state reaction method. Particle size and distribution of the Sr₂CeO₄ fine powder prepared by the co-precipitation process were smaller and narrower than those obtained by the samples prepared from the conventional one. The emission intensity of the fine particles was equal to that of the larger particles prepared from the solid-state reaction, on the contrary to the general tendency that emission intensity decrease with particle size reduction. Although no Ce³⁺ peaks were observed in EPR measurements, X-ray photoelectron spectra of the samples clearly elucidated the existence of Ce³⁺ only on the surface of Sr₂CeO₄.     

Microchemical Engineering: Components,Plant Concepts User Acceptance – Part I

Over the last five years, many activities have focused on the unexploited field of carrying out reactions on small scales. Due to the rapid development of new components, this paper deals with recent developments only in a compressed form. An important point is the analysis of possible plant concepts for microreactors and whether these are a sensible option. Due to the enormous difference in size between the microchannels and the fluid periphera of possible components this is not just a technical question. It touches on the microtechnology concept as a whole. The direction in which the field should be developed and which measures can be taken to influence its development are questions that are addressed here with respect to the big industrial interest in microreactors.     

Sociotechnical systems, risk management, and public health: comparing the North Battleford and Walkerton outbreaks

Accidents in different complex sociotechnical systems are rarely compared using the same theoretical framework for risk management. We conducted a comparative analysis of two Canadian public health disasters involving drinking water distribution systems, the North Battleford Cryptosporidium parvum outbreak in April 2001 and the Walkerton E. coli outbreak in May 2000. Both accidents resulted from a complex interaction between all levels of a complex sociotechnical system. However, the low-level physical and individual factors differed in the two cases, whereas, the high-level governmental and regulatory factors tended to be the same. These findings may have implications for the design of public policies to minimize risk in complex sociotechnical systems.     

平行线束法的仿射研究

用 3 个仿射图的投射方向构成 1 个仿射坐标系,同时也构成 1 个三棱锥,在此仿射坐标系中用球面三角重新研究由两个仿射图求第 3 个仿射图的投影作图理论 ——平行线束法。进一步还给出了由两个仿射图得到正投影的条件、由两个正投影得到第 3 个正投影的条件、以及由 V,H 两投影得到指定方向上的正投影的条件,简化了研究过程,得到了更简单的公式。     

Investigation into polishing process of CVD diamond films

A new technique used for polishing chemical vapor deposition (CVD) diamond films has been investigated, by which rough polishing of the CVD diamond films can be achieved efficiently. A CVD diamond film is coated with a thin layer of electrically conductive material in advance, and then electro-discharge machining (EDM) is used to machine the coated surface. As a result, peaks on the surface of the diamond film are removed rapidly. During machining, graphitization of diamond enables the EDM process to continue. The single pulse discharge shows that the material of the coated layer evidently affects removal behavior of the CVD diamond films. Compared with the machining of ordinary metal materials, the process of EDM CVD diamond films possesses a quite different characteristic. The removal mechanism of the CVD diamond films is discussed.     

Characterization and optimization of copper chemical mechanical planarization

The feature scale planarization of the copper chemical mechanical planarization (CMP) process has been characterized for two copper processes using Hitachi 430-TU/Hitachi T605 and Cabot 5001/Arch Cu10K consumables. The first process is an example of an abrasive-free polish with a high-selectivity barrier slurry, while the second is an example of a conventional abrasive slurry with a low-selectivity barrier slurry. Copper fill planarization has been characterized for structures with conformal deposition as well as with bumps resulting from bottom-up fill. Dishing and erosion were characterized for several structures after clearing. The abrasive-free polish resulted in low sensitivity to overpolish and low saturation levels for dishing and erosion. Consequently, this demonstrated superior performance when compared to the International Technology Roadmap for Semiconductors (ITRS) 2000 roadmap targets for planarization. While the conventional slurry could achieve the 0.13-μm technology node requirements, the abrasive-free polish met the planarization requirements beyond the 0.10-μm technology node.