电子材料

提升OLED发光效率磁性掺杂技术显神威；康宁扩充在华光纤生产厂；国产新型12英寸无位错硅单晶生长设备研制成功；中科院物理所合作建立国内首条碳化硅晶片中试生产线；NEC小型薄型高频砷化镓开关IC用于高速无线通信……     

Study on Effect of Flux on CeMgAl11O19：Tb^3＋ Phosphor

High calcination temperature is an important factor in the preparation process of CeMgAl11O19:Tb^3 . To decrease the temperature, different fluxes (H3BO3, MgF2 and AlF3) were tested in order to compare their influence on the luminescence property and particle size distribution of CeMgAl11O19: Tb^3 . The result shows that when the content of MgF2 is 0.1 mol/mol, the intensity of luminescence can attain a maximum. Furthermore, MgF2 can improve the particle size quality of the phosphor. So MgF2 can take the place of the conventional flux H3BO3 to prepare high quality CeMgAl11O19:Tb^3 phosphor. In addition, the relation between phosphor property and content of AlF3 was also studied. The crystal structure of the phosphor was analyzed by XRD method. The phase composition analysis shows that the reason of decrease of the brightness of CeMgAl11O19:Tb^3 phosphor is the emergence of TbAlO3 and α-Al2O3 during the preparation process.     

Al_(10)Zn_(2.9)Mg_(1.7)Cu超高强铝合金的喷射成形制备研究

采用喷射成形技术制备了Al1 0 Zn2 .9Mg1 .7Cu高强高韧铝合金沉积坯件 ,研究了喷射成形制备过程中各工艺参数对沉积坯件的成形性、显微组织、致密度的影响 ,确定了适当的工艺参数 ,研究了沉积坯件的热挤压及热处理工艺 ,对材料的组织进行了分析并对不同状态的材料性能进行了比较。研究结果表明 :当喷射成形工艺参数合理时 ,沉积坯件具有良好的成形性与致密度 ,在随后的热挤压过程中 ,通过较低的挤压比即可使材料达到全致密 ;通过对合金进行适当的热处理 ,材料的极限抗拉强度达到 810MPa ,同时延伸率保持在 8%～ 11% ,该材料是一种理想的轻质高强结构材料。     

掺Nd纳米ZnO薄膜特性研究

研究了用真空蒸发法在玻璃衬底上制备稀土掺杂纳米ZnO薄膜结构、导电性及光透射性能。结果显示 ,在 5 0 0℃氧化、热处理稀土元素Nd掺杂后能够明显改善纳米ZnO薄膜的结构特性 ,薄膜的晶粒尺寸随掺杂含量的增加而减小。掺Nd使ZnO薄膜的电性能有所改善但使纳米ZnO薄膜的光透射性有所降低。     

BPxN1-x薄膜的制备及磷元素对其光学能隙的影响

本文从应用出发，选择光学石英为衬底，采用热丝辅助射频化学气相沉积的方法沉积BPxN1—x薄膜，对样品进行了X射线衍射(XRD)、扫描电子显微镜(SEM)、紫外—可见等测试。XRD、SEM结果显示薄膜多晶态，表面形貌随时间变化，最终为胞状；紫外—可见光光谱结果显示BPxN1—x薄膜的紫外吸收边随沉积时间的加长、PH3流量的增加而向长波长方向移动。因此，该材料的光学能隙可以通过生长工艺适当调整。另外，BPxN1—x薄膜与液晶层能较好匹配等特性更使其适用于紫外空间光调制器。     

Preparation and Properties of Sintering Additives Coated Si3N4 from Heterogeneous Nucleation Processing

The sintering additives such as Al2O3 and /or Y2O3 were coated on the surfaces of Si3N4 particles via heterogeneous nucleation processing using a buffered pH solution as the precipitation reagent .They nucleated and grew only on the surfaces of Si3N4 and did not form sol particles in solution by TEM observation .The isoelectric point(IEP) of coated Si3N4 was different from that of as-received Si3N4.The IEP of Al(OH)3-coated Si3N4 occurred at pH8.4, which is close to that of alumina .When Al(OH)3-coated Si3N4 particles were coated with Y(OH)3,the IEP of coated Si3N4 powder shifted from pH8.4 to pH9.2 ,similar to that of yttria.In addition ,the rheological data showed that Al2O3 and /or Y2O3 coated Si3N4 suspension is nearly Newtonian and that added Si3N4 suspension shows a shear rate thinning behavior.     

Mg-Si基热电化合物的研究现状

重点综述了Mg-Si基热电化合物的基本特性，该体系热电材料的制备方法与掺杂改性的研究进展，并提出了要重点解决的问题。     

工业还原NS—掺杂蓝钨过程中掺杂剂相的形成和结合

本文叙述了用于生产具有不下垂性能的细钨丝的ＮＳ－掺杂蓝钨工业还原过程中掺杂剂相的形成和结合。在还原过程中结合适量的掺杂剂是钾残留在烧结锭中的基本保证，钾能在丝材制造中形成钾泡串，使在随后的的灯丝工作时形成大晶联锁微结构，而这是不下垂特性的关键所在。本文的第一部分讨论了金属钨粉的工业生产方法。虽然掺杂Ｋ、Ａｌ、Ｓｉ的钨粉的生产方法与末掺杂的钨粉的生产方法基本相同，但仍有一些特别的区别要介绍。本文分析     

金属蒸气法制备聚合物固载Pd－Cu双金属原子簇

为了不使用任何还原剂而获得聚合物固载高分散零价双金属加氢催化剂，利用金属蒸气法制备了３种不同Ｐｄ／Ｃｕ质量比的聚合物固载双金属原子簇。透射电镜（ＴＥＭ）和Ｘ衍射（ＸＲＤ）测定表明，Ｐｄ－Ｃｕ原子簇粒度很小，平均直径小于３．０ｎｍ。Ｘ射线光电子能谱（ＸＰＳ）表明，Ｐｄ和Ｃｕ均为零价态。Ｐｄ－Ｃｕ原子簇在异丙叉加氢反应中具有很高的活性和选择性。这些结果提供了令人信服的证据，即金属蒸气法可用于在聚合物孔穴内直接而温和地置入小的零价金属原子簇，而且这样制备的聚合物固载金属原子簇很适合于催化应用。