Effect of interfacial fluorination on the electrical properties of the inter-poly high-k dielectrics

In this paper, the reliabilities and insulating characteristics of the fluorinated aluminum oxide (Al₂O₃) and hafnium oxide (HfO₂) inter-poly dielectric (IPD) are studied. Interface fluorine passivation has been demonstrated in terminating dangling bonds and oxygen vacancies, reducing interfacial re-oxidation and smoothing interface roughness, and diminishing trap densities. Compared with the IPDs without fluorine incorporation, the results clearly indicate that fluorine incorporation process is effective to improve the insulating characteristics of both the Al₂O₃ and HfO₂ IPDs. Moreover, fluorine incorporation will also improve the dielectric quality of the interfacial layer. Although HfO₂ possesses higher dielectric constant to increase the gate coupling ratio, the results also demonstrate that fluorination of the Al₂O₃ dielectric is more effective to promote the IPD characteristics than fluorination of the HfO₂ dielectric. For future stack-gate flash memory application, the fluorinated Al₂O₃ IPD undoubtedly possesses higher potential to replace current ONO IPD than the fluorinated HfO₂ IPD due to superior insulating properties.     

氟对Pt-Sn/γ-Al2O3催化剂重整反应性能的影响

制备了不同氟含量的Pt-Sn/γ-Al2O3催化剂,考察了氟含量对重整催化剂物化性质及反应性能的影响。BET,Py-IR,NH3-TPD 等测试结果表明：氟的引入对催化剂比表面积、孔体积等物化性质没有显著影响;但可明显提高催化剂酸量,氟改性的γ-Al2O3载体表面既存在L酸中心又存在B酸中心,酸量随着氟含量的增加而增大;正庚烷和石脑油的重整反应性能测试表明,随着氟含量的增加,液化气收率明显增加, C5+液体收率与芳烃收率下降,催化剂积炭速率提高,氟质量分数大于1.0%时,催化剂表现出较高的液化气（C3+C4）选择性。     

锂离子电池负极成型工艺初探

本文主要论述了锂离子电池负极特点、电极板成型工艺。介绍了负极成型工艺所采用的有机氟粘合剂。     

Study of the material properties and suitability of plasma-deposited fluorine-doped silicon dioxides for low dielectric constant interlevel dielectrics

A major challenge for back-end interconnection technology as device geometries shrink is the development of low dielectric constant materials with good gap-filling properties that are suitable for microelectronics manufacturing. Recently, there has been much interest in fluorine-doped silicon dioxides (SiOF) as such a material. The advantages of a silicon dioxide based film from an integration standpoint make these films very attractive for manufacturing.

In this study, SiOF films have been prepared in a conventional parallel-plate dual-frequency plasma-enhanced chemical vapor deposition reactor. By varying the deposition parameters, SiOF films with indices of refraction from 1.38 to 1.46 and corresponding changes of as much as 20% in the dielectric constants have been produced. Fourier transform infrared data for these films have been correlated with fluorine concentration by secondary ion mass spectroscopy measurements. The presence of fluorine can also be observed in the capacitance-voltage (CV) characteristics for the films. Fluorine interface states trap electrons which delay the onset of accumulation in the CV measurements for p-type silicon. In a similar way, the fluorine-induced trap states affect the onset of inversion for n-type silicon.

Some films with high fluorine concentrations have been observed to be unstable with respect to moisture absorption. The reliability and stability data for these films are presented.     

氟-氟化氢分析仪的研制

研制了紫外、红外两个双波长一体的氟-氟化氢分析仪。分析仪由卤钨灯光源,带有中心波长分别为2850A、4500A和2.45μm、2.2μm干涉滤光片的新光盘及PbS检测器(红外)和光电倍增管(紫外区)组成。该仪器的输出与氟或氟化氢的分压在0—10、0—30、0—50、0—100和0—200μmHg范围内有良好的线性关系,检测限可达0.3 mmHg。该仪器测最精度高、快速、稳定、操作简单,使用方便。该仪器已用于HF-F_2-Ar和HF-F_2-N_2等混合气体中氟和氟化氢的测定。     

CVD of fluorosilicate glass for ULSI applications

Interlayer dielectrics are key materials for size reduction and speed enhancement of ultra large scale integrated devices. As intralevel metal spacing is reduced and lower capacitance is required, the choices for inorganic dielectrics are limited, Fluorosilicate glass is a material that is being considered to meet these requirements because it has shown the ability to extend SiO₂ chemical vapor deposition processing. Fluorine addition in a conventional glass improves gap fill while simultaneously lowering the dielectric constant. This paper will review the progress of fluorosilicate glass processing, examine the reliability of these materials, and discuss the role of fluorine in increasing gap fill and lowering the dielectric constant of standard SiO₂ films.     

自然条件下寿命超过一千天的含氟有机自由基

快速电子辐照3—氧杂全氟十一烷基磺酸钾盐和ω—氯3氧杂全氟十一烷基磺酸钾盐所生成的含氟有机自由基室温衰变缓慢,寿命已超过一千天,真空存放与空气存放无大差别。它们仍具有反应活性能够引发苯乙烯的聚合发应,及使丙烯腈聚合。     

FHF型分析仪的应用

一、前言在某些工业生产过程中,需要同时监测气体混合物中氟、氟化氢的浓度。我们原使用的φA-5仪表,测量速度慢,误差大。后于1976年自制一台SP-F_2气相色谱仪,作了F_2、HF组分的分离测量试验,操作不理想。因此,1984年从中国原子能科学研究院引进     

Molecular dynamics simulations of large fluorine cluster impact on silicon with supersonic velocity

The etching process by very large reactive gas cluster impact was investigated by molecular dynamics (MD) simulations. Fluorine-molecule clusters with the size up to 100,000 atoms (50,000 F₂ molecules) were irradiated on silicon (1 0 0) targets at supersonic velocity regime (0.1-1 eV/atom, 1.0-3.2 km/s). The MD simulations revealed that the existence of threshold energy-per-atom around 0.3 eV/atom (1.75 km/s) to cause surface deformation and enhancement of Si desorption. When the incident energy-per-atom is less than the threshold, the incident cluster breaks up itself on the target without surface deformation. The fluorine molecules in the cluster spread in the lateral direction along the target surface, and some part of them decompose and adsorbs on the target to form silicon fluoride composites. On the other hand, the clusters penetrate the surface of silicon target when the energy-per-atom is larger than 0.3 eV/atom. In these collisional processes, the target surface is deformed to create shallow crater shape. The incident fluorine molecules are preferentially concentrated at the bottom of the crater, which resulted in high desorption yield of silicon as in the form of SiF₂, SiF₃ and SiF₄.     

A borate fusion method for the determination of fluorine in coal

A new analytical method has been developed for determining fluorine in coal. It incorporates a two stage sinter-fusion procedure using lithium carbonate, lithium tetraborate and zinc oxide. In the sinter stage, coal is ashed at 600 °C and the lithium carbonate and zinc oxide act as collectors to capture volatile species of fluorine. In the second stage, the ash residue is decomposed by fusion with the lithium carbonate and lithium tetraborate at 1050 °C. The fused material is dissolved in nitric acid and the fluoride in solution is determined using an ion selective electrode. The results for a number of coal samples including Certified Reference Materials are reported. These are in good agreement with the certified values and with the results obtained by proton induced gamma ray emission spectrometry. The good agreement confirms that no fluorine is lost during ashing/sintering of the coal and that complete dissolution of the residual ash is obtained by fusion with the lithium carbonate and lithium tetraborate The method is simpler and less labour intensive than pyrohydrolysis and is suitable for use in most commercial coal laboratories.