Mg-Ca合金表面氧化行为的研究

研究了几种不同Ca含量的Mg Ca二元合金表面氧化程度及其氧化膜形貌。合金表面氧化膜的XRD ,SEM ,TEM及其电子探针分析表明 ,Ca元素的加入可有效地减少镁合金熔体表面的氧化 ,且随着Ca含量的增加 ,氧化程度减弱 ,表面品质变好。含Ca镁合金熔体氧化膜由外到内分为MgO层、CaO层和MgO·CaO层。还从热力学角度探讨了Ca元素的阻燃机理。     

Removal of post-etch 193 nm photoresist in porous low-k dielectric patterning using UV irradiation and ozonated water

All-wet processes are gaining a renewed interest for the removal of post-etch photoresist (PR) in the back-end-of-line (BEOL) semiconductor manufacturing. However, degradation of DUV-PR by etch plasmas results in a modified top layer of the PR that is cross-linked (so-called crust) and therefore not soluble anymore using pure organic solvents. This study investigates the modification of 193 nm post-etch PR by UV irradiation with different wavelengths. UV irradiation showed to be an interesting process to increase CC bond concentration in post-etch PR, which was used as an intermediate step to enhance PR wet strip using ozonated DI water. Treatment of post-etch PR by 222 or 283 nm led to the largest increase in CC bonds. The combination of UV with ozonated DI water is a promising process sequence for PR and BARC strip in BEOL applications.     

Phthalimide‐N‐oxyl (PINO) Radical,a Powerful Catalytic Agent: Its Generation and Versatility Towards Various Organic Substrates

The last two decades represents a “start line” for the worldwide chemists, to develop new oxidizing methods, to replace the “old‐fashioned” ones, which are expensive, pollute the environment, and proceed in harsh conditions. One of the best candidates to satisfy the present global needs is N‐hydroxyphthalimide (NHPI), which can be used as a catalytic reagent successfully in a wide range of organic transformations. In this article, a review of the most frequently used methods to transform the NHPI into its nitroxyl radical correspondent, and the use of this powerful catalytic agent into various organic transformations, are presented.     

Comparison of Foliar Spray Efficacy of Electrolytically Ozonated Water and Acidic Electrolyzed Oxidizing Water for Controlling Powdery Mildew Infection on Cucumber Leaves

We investigated and compared the effects of foliar sprays of electrolytically ozonated water (OW) and acidic electrolyzed oxidizing water (AEOW) on severity of powdery mildew infection (PMI) and occurrence of visible physiological disorder on cucumber leaves. Foliar spray of OW contained severity of PMI to almost the same level as the initial value, without any visible physiological disorder. Although severity of PMI on AEOW-sprayed leaves was significantly lower than on OW-sprayed leaves, the leaves showed a visible physiological disorder after the first spray. These results indicate that OW is a viable option for controlling PMI on cucumber leaves at low initial severity levels, or for prevention of PMI, and that AEOW can be used for controlling PMI with special efforts taken against a visible physiological disorder.     

预氧化纤维阻燃产品的开发

利用德国SGL CARBON GROUP公司生产的320 K预氧化纤维长丝,合理制定牵切、并条、粗纱、细纱工艺,纺制预氧化纤维的纱线,并织成了相应织物.测试了产品的力学性能、阻燃性能及保暖性能.结果表明:选择合适的工艺流程和工艺参数,可以在传统的环锭纺纱机上纺制预氧化纤维纱,其产品具有优异的阻燃性能.     

不锈钢母液的氧化脱磷

阐述不锈钢母液氧化脱磷的基本原理，比较各种脱磷剂的脱磷效果以及氧化脱磷的热力学分析和不锈钢母液成分对脱磷的影响。     

氧化亚铁硫杆菌的驯化与诱变选育

以高含量的硫化物金精矿为驯化介质 ,将驯化后的氧化亚铁硫杆菌 (T.f菌 )用紫外线、微波作为诱变剂进行选育 ,经过诱变选育的 T.f菌的氧化活性由未被驯化、诱变前的 0 .0 7g/L· h提高到 3.18g/L·h;氧化活性提高了 4 0多倍 ,有效地提高了氧化亚铁硫杆菌对硫化物的氧化分解能力 ,为优势浸矿菌种的选育提供了简便、有效的育种手段     

耐候钢板表面微裂纹研究

通过金相观察和扫描电镜分析等,对连铸坯热轧耐候钢板表面微裂纹进行了研究,发现裂纹附近存在Cu和Cr元素,初期裂纹沿晶界形成和延伸。Cu在γ晶界的偏聚以及Cr在基体和氧化铁层问的富集,是导致表面微裂纹的主要原因。生产耐候钢板应合理控制加热温度和时间,加强高压水除鳞。     

苛化泥为焙烧添加剂从石煤提取五氧化二钒

从石煤中提取五氧化二钡时,用苛化泥作焙烧添加剂,以取代氯化钠。焙烧后的物料先用水水浸,再用碳酸氢铵并通入二氧化碳中加压浸出。浸出液经离子交换法净化,再经沉钒和灼烧,得到合格的五氧化二钒产品。     

Efficiency of reducing and oxidizing ash plasmas in preventing metallic barrier diffusion into porous SiOCH

This work focuses on the efficiency of reducing and oxidizing plasma chemistries in preventing metallic barrier diffusion into porous dielectric materials (SiOCH with a k value close to 2.2, porosity content around 40%). The ash processes have been performed on SiOCH coated blanket and patterned wafers in either reactive ion etching (RIE) or downstream (DS) reactors. The Rutherford backscattering spectroscopy technique (RBS) has shown that titanium based compounds diffuse into the blanket porous SiOCH without treatment during a typical TiN barrier deposition process by chemical vapor deposition (CVD). The metallic barrier diffusion is strongly limited on blanket wafers when the porous SiOCH has been previously modified (partially or fully) by ash plasmas (RIE-O₂, RIE-NH₃, DS-H₂/N₂ and DS-O₂/N₂) while the metallic barrier diffusion occurs with no modifying ash plasmas (DS-H₂/He). We have shown that ellipsometric porosimetry (EP) measurements clearly point out that no complete pore sealing is achieved with all the investigated ash plasmas. Energy-filtering transmission electron microscopy experiments (EFTEM) performed on single damascene structures have revealed significant titanium diffusion into the porous dielectric lines for DS-H₂/He and RIE-O₂ and sidewalls modification of the porous SiOCH lines (lower C/O ratio) for all the ash plasmas. The RC product (resistance × capacitance) have been extracted from the single damascene structures and the evolution of RC product will be discussed in terms of lines modification (titanium diffusion and porous SiOCH modification).