Sulfur in chromia

The solubility of sulfur in chromia has been studied in H₂-H₂O-H₂S tagged with³⁵S at 973 and 1173 K at low oxygen and sulfur partial pressures typical for coal gasification-systems. For monocrystalline samples, it has been shown that sulfur-containing species are only present adsorbed on the surface of the specimens and can be removed by ultrasonic cleaning in acetone. The surface coverage after 4 weeks of exposure to H₂-H₂O-H₂S was between 2.8 and 19.3% of a monolayer. In polycrystalline chromia, sulfur was located only in pores and cracks of the sample. In dense, compact areas of the specimens the solubility of sulfur was below the detection limit of autoradiography, which was estimated to be better than 0.17 ppm.     

Kinetics of the methanation of carbon dioxide over a supported Ni-La2O3 catalyst

The kinetics of the methanation of carbon dioxide was investigated using an alumina supported Ni-La₂O₂ catalyst in a differential and integral reactor. In the differential reactor the molar ratio of H₂ to CO₂ was varied from 0.6 to 30. In the integral reactor the rates were measured with up to 90% conversion. Both reactor tests were carried out at temperatures between 513 and 593 K. The experimental results were described by a Langmuir-Hinshelwood type equation. The kinetics can be explained by assuming equilibrium of dissociative carbon dioxide and hydrogen adsorption, and assuming hydrogenation of surface carbon as the rate determining step.     

Fluor SOx净化工艺--为俄罗斯绿色环境开发的将SO2转化为元素硫的经济技术

Fluor公司开发的Fluor SO_2净化工艺具有广泛多样的工艺布局,可以通过经济的方式定制脱除烟气中的有害组成。该工艺几乎能去除全部SO_2并减少CO排放。Fluor SO_x净化工艺的主要步骤已在多套工业装置中得到成功的证实。除技术可行、经济合理之外,Fluor SO_x净化工艺不会产生任何有害副产物,也不会遇到与SO_3 有关的腐蚀问题。此外,该工艺生产高纯度可市售的元素硫。论述了Fluor SO_x净化工艺的特征、技术和成本优势、设计和操作的简易性以及实施的便利性。     

改良MEA脱碳技术在小氮厂变换气脱碳中的应用

介绍了改良MEA脱碳技术的基本原理、工艺特点以及在工业中的应用情况，实践表明，改良MEA提高了溶液的吸收能力，降低了再生热耗，解决了MEA易降解损耗等问题。     

The removal of dichloromethane from atmospheric pressure air streams using plasma-assisted catalysis

Plasma-assisted catalysis was used for the destruction of 500 ppm of dichloromethane, CH₂Cl₂ (DCM), in gas streams of air using a non-thermal, atmospheric pressure plasma utilising a dielectric packed bed. The combination of plasma and catalyst gave improved destruction of DCM. Eight catalysts which including alumina, TiO₂ and various zeolites were investigated with the finding that alumina in a one-stage reactor configuration and TiO₂ and HZSM-5 in two-stage configurations gave the best DCM destructions. The sodium zeolites are capable of reducing by 50% the unwanted NO_x by-products, formed by plasma processing in air. The nature of the catalyst is important in terms of the destruction efficiency, end-product selectivity and NO_x reduction.     

Supported Vanadia Catalysts for Dehydrogenation of Ethylbenzene with CO2

Alumina supported vanadia catalysts (V/Al) for selective oxidehydrogenation of ethylbenzene with CO₂ were prepared by impregnation method. During preparation the effect of promoters and calcined temperature was investigated, it was found these two items had a strong influence on the activity of V/Al catalysts. Dehydrogenation reaction with CO₂ was happened in the fixed-bed reactor at 450 °C. Results showed that 15.2% ethylbenzene conversion and 99.2% styrene selectivity were acquired when V₂K/Al catalyst was used.     

Concentration of tocopherols from soybean sludge by supercritical carbon dioxide

A supercritical fluid extraction method has been applied to test the feasibility of tocopherol concentration from soybean sludge with carbon dioxide at temperatures and pressures ranging from 35 to 70°C and 200 to 400 bar, respectively. The supercritical solubility of the esterified soybean sludge was over 4–6 times greater than that of the original soybean sludge. By a simple batch-type one-stage method the tocopherols in the esterified soybean sludge could be concentrated up to 40 wt%. The overall results of the present study show that soybean sludge initially containing about 13–14 wt% tocopherols may require a countercurrent multistage column to be highly and effectively concentrated.     

Proton diffusion in γ-manganese dioxide

Deconvolution of the electrolytic manganese dioxide (EMD) discharge curve has indicated the presence of a number of energetically different reduction processes. This has been used to determine the contribution of each reduction process to the total discharge. Using step potential electrochemical spectroscopy (SPECS), the i-t data were modelled as the sum of the discharge of the individual reduction processes. From this, A√ D for each reduction process as a function of degree of discharge was determined. The maximum A√ D values for each process ranged from 2.3×10⁻² to 4.0×10⁻⁴ cm³ s^−1/2 g⁻¹ values are consistent with previously reported values for A√ D, although in this case we have determined values for the entire compositional range.     

Intergranular oxidation of silicon in 20Cr-25Ni niobium-stabilized stainless steel at 1140–1230 K

The kinetics of intergranular oxidation of silicon in a 20Cr-25Ni Nb-stabilized stainless steel are reported, at temperatures in the range 1140–1230 K, in CO₂ at 40 bar pressure. The depth of attack increased parabolically with respect to time, with an activation energy of 335±30 kJ/mol. The mechanism of growth is discussed in terms of classical internal-oxidation theories, and an alternative explanation based on an available-space theory is developed. The internal oxidation rates in a number of different alloys are compared with diffusivities of metals in the base alloy. It is proposed that intergranular oxidation in the 20–25 Nb steel is controlled by the rate of outward diffusion of iron or chromium in the alloy.     

Application of optical transmission interferometry for in-situ structural investigations of titanium dioxide sputter-deposited coatings

Titanium dioxide coatings (from 0.1 to 1.5 μm thick) have been dc sputter-deposited on glass slides from titanium targets in various Ar-O₂ reactive gas mixtures. Deposition rate and optical properties were controlled in-situ by optical transmission interferometry (OTI) with an optical fibre located behind the glass substrate in order to perform a real-time control of transmittance of the growing film. Thus, it is possible to determine in-situ the optical indices (n, k) and the thickness of the as-deposited film by using a simple simulation, developed on Matlab software. The optical properties of the films were investigated in relation to their structure, which depends on the sputtering conditions adopted. In particular, the effects of the sputtering pressure (working pressure and oxygen partial pressure), the discharge power and the substrate location into the reactor are investigated in detail. Films structure is assessed by standard grazing incidence X-ray diffraction (XRD).