ZnAl_2O_4/α-Al_2O_3衬底上GaN的生长

研究了直接在 Zn Al2 O4/α-Al2 O3 衬底上用 MOCVD法一步生长 Ga N薄膜 .利用脉冲激光淀积法在α-Al2 O3衬底上淀积了高质量 Zn O薄膜 ,对 Zn O/α-Al2 O3 样品在 110 0℃退火得到了具有 Zn Al2 O4覆盖层的 α-Al2 O3 衬底 ,并在此复合衬底上利用光加热低压 MOCVD法直接生长了纤锌矿结构 Ga N. X射线衍射谱表明反应得到的Zn Al2 O4层为 ( 111)取向 .扫描电子显微镜照片显示随退火时间从小于 3 0 min增加到 2 0 h,Zn Al2 O4表面由均匀的岛状结构衍变为突起的线状结构 ,相应的 Ga N X射线衍射谱表明 Ga N由 c轴单晶变为多晶 ,单晶 Ga N的摇摆曲线半高宽     

用SiH2Cl2沉积MEMS中的多晶硅薄膜研究

用SiH2Cl2在3种温度下进行了多晶硅薄膜的沉积,根据膜厚计算出了沉积速率,用SEM、XRD和薄膜应力测试仪对薄膜进行测试分析.证明用SiH2Cl2在950℃时可以快速沉积用于MEMS的多晶硅.     

Ni(Pt)Si硅化物温度稳定性的研究

对比研究了夹层结构N i/P t/N i分别与掺杂p型多晶硅和n型单晶硅进行快速热退火形成的硅化物薄膜的电学特性。实验结果表明,在600~800°C范围内,掺P t的N iS i薄膜电阻率低且均匀,比具有低电阻率的镍硅化物的温度范围扩大了100~150°C。依据吉布斯自由能理论,对在N i(P t)S i薄膜中掺有2%和4%的P t样品进行了分析。结果表明,掺少量的P t可以推迟N iS i向N iS i2的转化温度,提高了镍硅化物的热稳定性。最后,制作了I-V特性良好的N i(P t)S i/S i肖特基势垒二极管,更进一步证明了掺少量的P t改善了N iS i肖特基二极管的稳定性。     

ZnO薄膜的XPS研究

利用等离子体增强型MOCVD设备,在C面蓝宝石上生长出了C轴取向的未退火、生长后一次退火和生长过程中多次退火的ZnO薄膜样品,并通过X光衍射和X光电子能谱对样品进行了表征,结果表明生长过程中多次退火的样品具有较高的质量,O/Zn原子比较大,且受空气中氧和水汽的影响最小.     

无铅压电陶瓷(Bi1/2Na1/2)TiO3-KNbO3制备工艺研究

采用传统陶瓷工艺制备了(1-x)(Bi1/2Na1/2)TiO3-xKNbO3(x=0.01,0.02,0.04,0.6,0.08,0.12)无铅压电陶瓷。利用热重-差热(TG-DSC)、X-射线衍射(XRD)和扫描电镜(SEM)等分析技术,研究了(1-x)(Bi1/2Na1/2)TiO3-xKNbO3无铅压电陶瓷的制备工艺条件对陶瓷晶体结构、压电性能的影响。TG-DSC、XRD的结果表明,该体系的的最佳预合成温度在800~850℃;SEM及性能测试的结果表明,该体系随KNbO3含量的增加,烧结温度提高,烧结的温度范围变窄,当x>0.1时,烧结的温度范围只有5~10℃。     

InSb红外探测器芯片粘接工艺研究

基于InSb红外探测器的封装特点,采用正交试验法研究了芯片粘接过程中基板平整度、粘接剂抽真空时间、配胶时间、固化条件等工艺参数对芯片性能及可靠性的影响。通过计算极差和方差分析了各因素对芯片可靠性的影响大小。结果表明,固化条件对粘接后芯片的性能影响最大,其次是配胶时间,而抽真空时间和基板平整度影响相对较小。针对极差分析得出的较优参数组合和较差参数组合,利用X射线衍射(XRD)研究了不同参数组合对晶片粘接的应力大小,所得结果与正交试验一致。     

In Situ X‐Ray Diffraction Studies on Structural Changes of a P2 Layered Material during Electrochemical Desodiation/Sodiation

Sodium layered oxides with mixed transition metals have received significant attention as positive electrode candidates for sodium‐ion batteries because of their high reversible capacity. The phase transformations of layered compounds during electrochemical reactions are a pivotal feature for understanding the relationship between layered structures and electrochemical properties. A combination of in situ diffraction and ex situ X‐ray absorption spectroscopy reveals the phase transition mechanism for the ternary transition metal system (Fe–Mn–Co) with P2 stacking. In situ synchrotron X‐ray diffraction using a capillary‐based microbattery cell shows a structural change from P2 to O2 in P2–Na_0.7Fe_0.4Mn_0.4Co_0.2O₂ at the voltage plateau above 4.1 V on desodiation. The P2 structure is restored upon subsequent sodiation. The lattice parameter c in the O2 structure decreases significantly, resulting in a volumetric contraction of the lattice toward a fully charged state. Observations on the redox behavior of each transition metal in P2–Na_0.7Fe_0.4Mn_0.4Co_0.2O₂ using X‐ray absorption spectroscopy indicate that all transition metals are involved in the reduction/oxidation process.     

Annealing temperature dependent structural and optical properties of electrodeposited CdSe thin films

Cadmium selenide films were synthesized using simple electrodeposition method on indium tin oxide coated glass substrates. The synthesized films were post annealed at 200 °C, 300 °C and 400 °C. X-ray diffraction of the films showed the hexagonal structure with crystallite size <3 nm for as deposited films and 3–25 nm for annealed films. The surface morphology of films using field emission scanning electron microscopy showed granular surface. The high resolution transmission electron microscopy of a crystallite of the film revealed lattice fringes which measured lattice spacing of 3.13 Å corresponding to (002) plane, indicating the lattice contraction effect, due to small size of CdSe nanocrystallite. The calculation of optical band gap using UV–visible absorption spectrum showed strong red-shift with increase in crystallite size, indicating to the charge confinement in CdSe nanocrystallite.     

In Situ Observation of Crystallization Dynamics and Grain Orientation in Sequential Deposition of Metal Halide Perovskites

Metal halide perovskites have revolutionized the development of highly efficient, solution‐processable solar cells. Further advancements rely on improving perovskite film qualities through a better understanding of the underlying growth mechanism. Here, a systematic in situ grazing‐incidence X‐ray diffraction investigation is performed, facilitated by other techniques, on the sequential deposition of formamidinium lead iodide (FAPbI₃)‐based perovskite films. The active chemical reaction, composition distribution, phase transition, and crystal grain orientation are all visualized following the entire perovskite formation process. Furthermore, the influences of additive ions on the crystallization speed, grain orientation, and morphology of FAPbI₃‐based films, along with their photovoltaic performances, are fully evaluated and optimized, which leads to highly reproducible and efficient perovskite solar cells. The findings provide key insights into the perovskite growth mechanism and suggest the fabrication of high‐quality perovskite films for widespread optoelectronic applications.     

Strain relaxation in silicon ion molecular beam epitaxy on silicon (001) substrates during aging

Silicon strained epitaxial films were grown on Si (001) substrates by low energy ion beam assisted molecular beam epitaxy. Films grown in the range of 450– 550°C with concurrent Ar⁺ ion bombardment (100 eV) were characterized using x-ray diffraction and transmission electron microscopy and found to be disloca-tion free and ununiformly strained. During aging, the strained layers stay stable until 500°C. Relaxation of most of the strain occurred at temperatures of 500-650°C. At higher aging temperatures, the strained layers relaxed by the formation of dense dislocation structures.