30.4 nm Si/C多层膜反射镜的制备与测量

采用离子束溅射镀膜装置制备了一种新的材料组合Si/C多层膜 ,用于 30 4nm波段的正入射多层膜反射镜。并用软X射线反射率计测得其反射比最大值为 0 14。有效地抑制了 15 0nm处的二级衍射峰。     

Growth of calcium carbonate by the atomic layer chemical vapour deposition technique

Thin films of CaCO₃ (calcite) have been grown with the atomic layer chemical vapour deposition (ALCVD) technique, using Ca(thd)₂ (Hthd=2,2,6,6-tetramethylheptan-3,5-dione), CO₂, and ozone as precursors. Pulse parameters for the ALCVD-type growth are found and self-limiting reaction conditions are established between 200 and 400 °C. Calcium carbonate films have been deposited on soda-lime glass, Si(100), -Al₂O₃(001), -Al₂O₃(012), -SiO₂(001), and MgO(100) substrates. The observed textures were: in-plane oriented films with [100](001)CaCO₃ [100](001)Al₂O₃ and [100](001)CaCO₃[110](001)Al₂O₃ on -Al₂O₃(001), amorphous films on -Al₂O₃(012) when grown at 250 °C, and columnar oriented films on soda-lime glass, Si(001), -SiO₂(001), and MgO(100) substrates with (00l) and (104) parallel to the substrate plane at 250 and 350 °C, respectively. The film topography was studied by atomic force microscopy and AC impedance characteristics were measured on as-deposited films at room temperature. The films were found to be insulating with a dielectric constant (_r) typically approximately 8. Thin films of CaO were obtained by heat treatment of the carbonate films at 670 °C in a CO₂-free atmosphere, but the thermal decomposition led to a significant increase in surface roughness.     

Atomic layer deposition of thin films of ZnSe—structural and optical characterization

Thin films of sphalerite-type ZnSe were grown by atomic layer deposition (ALD) from elemental Zn and Se precursors. These films, grown on various substrates, show bright blue ‘edge’ emission accompanied by donor-acceptor pair emissions in the blue, green and red spectral regions. Red, green and blue emissions mixed together give a white color, with a color temperature between 2400 and 4500 K depending on a layer thickness and temperature. ZnSe grown by ALD is in consequence a promising material for the fabrication of semiconductor-based white light emitting thin film electroluminescence displays.     

中厚板矫直过程中中性层偏移动态研究

研究中性层偏移对矫直力的影响,以提高矫直力精度。通过对矫直件三维弹塑性变形进行分析,提出中性层偏移理论,利用数值模拟和实验讨论中性层偏移的动态变化规律,说明中性层偏移是影响矫直力精度的重要因素之一,并验证了理论推导公式与数值计算结果之间的误差,为建立更为准确的矫直力模型提供理论基础和数据。     

二层交换机的攻击分析与防范技术的研究

本文通过OSI模型的第二层的特点,分析了二层交换机存在的安全隐患,提出了相应的解决办法。     

室内模拟稳定边界层和对流边界层的初步研究

介绍了一套自行研制的室内模拟湍流系统.通过加热以及制冷手段控制水槽的顶部和底部温度,模拟暖空气均匀越过冷空气表面条件下的稳定边界层(SBL)温度场结构特征,以及平坦下垫面均匀加热条件下的对流边界层(CBL)温度场结构特征,并测量两种情况下的平均温度和热通量垂直廓线,分析对流混合层发展的演变过程.结果表明,模拟SBL和CBL的温度场结构与大气边界层的温度场结构观测结果符合较好.     

基于目的层预约的双子电梯群优化控制方法

针对双子电梯群控系统多目标性、不确定性的特点,提出了一种基于目的层预约的双子电梯群优化控制方法。在分析双子电梯结构特点的基础上,构造了适合双子电梯群的目标函数;在不同交通模式下,运用改进的遗传算法进行目的层预约系统下双子电梯群的优化控制仿真。仿真结果表明,控制方法能够适应双子电梯的运行特点,并能适应不同交通流模式,与传统电梯控制系统比较,平均候梯时间、长候梯时间发生率和电梯停靠次数明显减小,可为双子电梯群控系统的工程应用提供理论依据。     

A mathematical model to analyze heat and mass transfer characteristics of a CPL evaporator porous wick

A capillary pumped loop (CPL), because of its high power thermal transport character, has been developed as an attractive system for the thermal discharge of electronic chips with high power loads, especially on spacecrafts. A working fluid having relatively larger heat of evaporation, methanol for example, may transfer significant heat flux. In this paper a new mathematic model is constructed, in which the most important character is the treatment or the unsaturated region of the evaporator porous wick. Numerical simulation of heat and mass transfer in the evaporator porous wick is carried out with a new three‐layer model. The importance of unsaturated layer to simulate the present problem is clear. © 2005 Wiley Periodicals, Inc. Heat Trans Asian Res, 34(4): 209–218, 2005; Published online in Wiley InterScience ( www.interscience.wiley.com ). DOI 10.1002/htj.20066     

An Alternative Route Towards Metal–Polymer Hybrid Materials Prepared by Vapor‐Phase Processing

Transition metals incorporated into polymers lead to unusual or improved physical properties that significantly differ from those of purely organic polymers. A simple and practicable incorporation of diverse transition metals into any available polymer would make an important contribution to overcome some of the synthetic difficulties of metal‐polymer hybrid materials. Here, it is demonstrated that atomic layer deposition (ALD) can be a promising means to resolve some of those difficulties. It is found that even polytetrafluoroethylene (PTFE) with its great physical and chemical stability can be easily transformed into a transition metal–PTFE hybrid material simply by applying a metal‐oxide ALD process to PTFE. Upon metal incorporation into the PTFE, the molecular structure as well as mechanical properties (tensile behavior) of PTFE were observed to significantly change. For a better understanding of the changes to the material, experimental investigations using Raman spectroscopy, attenuated‐total‐reflection Fourier‐transform infrared spectroscopy, wide‐angle X‐ray diffraction, and energy‐dispersive X‐ray analysis were performed. In addition, with density functional theory calculations, potential bonding states of the incorporated metal into PTFE were modeled and predicted. The ALD‐based vapor‐phase approach for metal incorporation into a polymer could bring about rapid progress in the research area of metal–polymer hybrid materials.     

Churchill-Chu关系式在极薄金属层内传热的适用性研究

在假设的堆芯融毁事故中,反应堆压力容器的下封头内可能会形成分层的熔池结构。底部重金属层的形成会导致熔池顶部的金属层高度逐渐降低,使得顶部金属层的侧壁热聚焦效应逐渐增强,压力容器有可能会失效。本文通过开展HELM?LR试验,针对薄金属层在低高度条件下的传热进行了研究。结果表明,Churchill?Chu径向传热关系式在低高度的条件下依然适用。Churchill?Chu关系式在低高径比且以水为工质的条件下,计算结果偏不保守。将Churchill?Chu关系式运用到反应堆的熔池结构案例中发现,随着氧化物层衰变功率的增大和薄金属层高度的降低,氧化物层的等温边界假设将不再适用;虽然薄金属层侧壁的热聚焦效应仍会随其高度的降低而逐渐增强,但增加速度变缓慢。