智能反射表面辅助的MISO通信系统的物理层安全设计方案

智能反射表面(IRS)可通过调整反射单元的相位来提升无线通信物理层安全.针对IRS辅助的多输入单输出(MISO)通信系统,提出一种基于交替迭代的物理层安全设计方案.首先基于安全速率最大化原则,构建一个含有非凸约束的非凸目标函数;然后采用丁克尔巴赫算法和黎曼流形优化算法将非凸问题转化为一系列易于求解的子问题;最后采用交替...     

Enhanced thermal stability of a sputtered titanium-nitride film as a diffusion barrier for capacitor-bottom electrodes

The effect of a thin RuO_x layer formed on the Ru/TiN/doped poly-Si/Si stack structure was compared with that on the RuO_x/TiN/doped poly-Si/Si stack structure over the post-deposition annealing temperature ranges of 450–600°C. The Ru/TiN/poly-Si/Si contact system exhibited linear behavior at forward bias with a small increase in the total resistance up to 600°C. The RuO_x/TiN/poly-Si/Si contact system exhibited nonlinear characteristics under forward bias at 450°C, which is attributed to no formation of a thin RuO_x layer at the RuO_x surface and porous-amorphous microstructure. In the former case, the addition of oxygen at the surface layer of the Ru film by pre-annealing leads to the formation of a thin RuO_x layer and chemically strong Ru-O bonds. This results from the retardation of oxygen diffusion caused by the discontinuity of diffusion paths. In particular, the RuO_x layer in a nonstoichiometric state is changed to the RuO₂-crystalline phase in a stoichiometric state after post-deposition annealing; this phase can act as an oxygen-capture layer. Therefore, it appears that the electrical properties of the Ru/TiN/poly-Si/Si contact system are better than those of the RuO_x/TiN/poly-Si/Si contact system.     

HART协议物理层设备的测试（II）

本文介绍HART协议物理层设备的测试要求、测试设备、测试方法及测试时的一些特别说明。     

ONT传输会聚(TC)层上行组帧中基于IP核的ATM信元存储方案及其FPGA实现

IP核可重用设计方法是未来大规模集成电路的主流设计方法。本文论述了在设计光网络终端ONT传输会聚(TC)层上行组帧中,一种将IP核模块与VHDL语言描述相结合的ATM信元存储方案,并用FPGA予以实现,得出IP核设计方法的优越性。     

缓冲层对多量子阱材料GaAs/Ga_(1-x)Al_xAs共振态的影响

从理论上研究缓冲层的厚度和特性对多量子阱材料 (GaAs/Ga1-xAlxAs)中的共振态的影响 ,利用界面响应理论的格林函数方法 ,计算了局域和总电子态密度以及电子对结的穿透率 ,展示了缓冲层特性对态密度特征峰、穿透率的影响。结果表明 ,缓冲层具有控制共振隧穿电子和影响系统电子态的作用     

高频阻燃成端电缆技术发展

全面分析了成端电缆在高频传输特性、阻燃性和机械物理性能等方面的要求和存在的问题，讨论了相关电缆标准的局限性并提出了修改建议，总结了成端电缆制造技术、包括阻燃材料选择方面的经验。最后指出提高成端电缆性能的关键是改进绝缘芯线，提出了适用于室内通信电缆的复合双层绝缘结构的设计原则和制造工艺。     

ZnO growth on Si with low-temperature CdO and ZnO buffer layers by molecular-beam epitaxy

Low-temperature (LT) buffer-layer techniques were employed to improve the crystalline quality of ZnO films grown by molecular-beam epitaxy (MBE). Photoluminescence (PL) spectra show that CdO, as a hetero-buffer layer with a rock-salt structure, does not improve the quality of ZnO film grown on top. However, by using ZnO as a homo-buffer layer, the crystalline quality can be greatly enhanced, as indicated by PL, atomic force microscopy (AFM), x-ray diffraction (XRD), and Raman scattering. Moreover, the buffer layer grown at 450°C is found to be the best template to further improve the quality of top ZnO film. The mechanisms behind this result are the strong interactions between point defects and threading dislocations in the ZnO buffer layer.     

CdS薄层对有机电致发光器件性能的影响

将光电材料硫化镉(CdS)薄层插入到结构为ITO/NPB/Rubrene/NPB/DPVBi/Alq3/LiF/Al的白光有机发光器件(OLED)的Alq3和LiF之间,研究了CdS对OLED性能的影响。结果表明,0.1nm厚的CdS插入Alq3和LiF之间的器件性能最好。器件电压从7 V变化到14 V时,色度均在白光的中心区域;当电压为7V时,器件的最大电流效率为9.09cd/A;当电压为14V时,器件的最大亮度为16 370cd/m2。不加CdS时,当电压为8V时,器件的最大效率为5.16cd/A;当电压为14V时,最大亮度为6 669cd/m2。加CdS的器件比不加CdS的器件最大效率提高了1.76倍,最大亮度提高了2.42倍。     

In Situ Synthesis of Titanium Nickel Intermetallic Compounds Layer and TiN Coating By Laser Cladding

1 Introduction Laser cladding technology has been widely used in ma- terial processing and tool repairing because it causes little distortion and leads to high quality coatings [1]. Since the appearance ofhigh power diode lasers, the laser cladding is more efficient, economical and flexible[2￣5]. Titanium nickel alloys have excellent properties such as low density, high strength, and high chemical stability, which have promoted their applications in the aerospace, chemical, petrochemical and …     

同质缓冲层对ZnO薄膜光学性质的影响

利用射频磁控溅射技术,在单晶硅衬底上生长出高质量(0002)晶面取向的ZnO外延薄膜。通过XRD、AFM、吸收光谱、光致荧光发光谱的实验研究,发现加入适当厚度的、低温生长的ZnO同质缓冲层,可有效降低晶格失配和因热膨胀系数不同引起的晶格畸变。在衬底温度200℃、沉积时间5min的ZnO缓冲层上,以450℃衬底温度溅射ZnO薄膜主层,得到的ZnO样品的晶体结构、表面形貌和光学性质均有较明显的改善。