利用化学气相沉积法在SiO2小球基底上制备纳米碳管的研究

利用匀胶机将经过超声混合的二氧化硅小球的酒精溶液旋涂在洗净的硅片上,获得了具有曲面的纳米碳管生长基底.利用以二茂铁和二甲苯作为反应前驱体的化学气相沉积法在该基底上实现了碳管在二氧化硅与硅之间的选择性生长,并在不同的沉积温度条件下,可以分别获得球状和束状碳管产物.通过扫描电镜观察分析经过退火处理的原始基底的表面形貌,讨论了碳管产物与反应温度之间的关系.     

BGA基板切割过程中唇缘效应的产生及改进措施

采用两种不同结合剂硬度的金刚石刀片切割同一种BGA基板,通过对刀片刃口形貌的变化以及切割断面的分析,探讨了唇缘效应产生的原因.结果表明,在金刚石浓度、粒度及切割工艺等条件相同的情况下,刀片结合剂硬度是造成唇缘效应的最主要因素,并提出了避免唇缘效应产生的改进措施.     

脉冲激光沉积法制备ZnO薄膜的研究进展

基于氧化锌薄膜紫外光发光的实现,ZnO薄膜成为新的研究热点。综述了各种沉积条件对脉冲激光沉积(PLD)技术生长的氧化锌薄膜的微结构、光学和电学性质的影响,ZnO薄膜的厚度在超过400 nm时,呈现出了近似块状的性质。采用PLD技术,可以在适当的条件下制备具有特定功能的氧化锌薄膜。     

Fabrication and characterization of CdTe nano pattern on flexible substrates by nano imprinting and electrodeposition

Nano imprinting technology and the electrodeposition method were applied to make CdTe nano patterns on flexible substrates. An ammonia based aqueous solution was prepared at pH 10.7 and indium tin oxide (ITO)/polyethylene naphthalate (PEN) film with template was used as the working electrode. ITO thin film which was coated on PEN film had good electrical conductivity and optical transmittance. The template was manufactured by nano imprinting technology on ITO/PEN film. It was made from benzyl methacrylate and had nano rod arrays. It was used as the working electrode and for making CdTe nano pattern. CdTe nano pattern were analyzed by X-ray diffractometer, dual beam (DB)-focused ion beam (FIB)-scanning electron microscopy (SEM), Raman spectroscopy, and ultraviolet (UV)-visible (VIS) spectroscopy. The structure and optical properties of CdTe nano pattern on flexible substrates was analyzed. The crystalline size of nano pattern had 8.26 nm. The Te particles that were precipitated on CdTe surface seems to be exist. The absence of annealing process influenced to have low absorption coefficient and narrow band gap compared to bulk CdTe. However, nano pattern increased reflectance.     

磨料对蓝宝石衬底去除速率的影响

蓝宝石晶体已经成为现代工业,尤其是微电子及光电子产业极为重要的衬底材料,提高其化学机械抛光效率是业界无法回避的问题。在CMP系统中,磨料是决定去除速率及表面状态的重要因素。分析了化学机械抛光过程中抛光液中磨料的作用以及抛光机理,在确保表面状态的基础上,研究了抛光液中磨料体积分数、粒径和抛光液的黏度对速率的影响,指出纳米磨料是蓝宝石衬底抛光的最佳磨料。选用合适的磨料体积分数、粒径及抛光液黏度,不仅获得了良好的去除速率,而且有效地解决了表面状态方面的问题。     

透紫玻璃与蓝宝石的热压粘结工艺研究

透射式GaN阴极组件是GaN紫外日盲型探测器的最关键部件之一。介绍了制备透射式GaN阴极组件的工艺难点,主要报道了透紫玻璃与蓝宝石的热压粘结工艺的原理和研制过程,并着重分析了热压粘结工艺中出现的问题,同时提出了拟定的解决方案。     

Pixel‐Structured Scintillator with Polymeric Microstructures for X‐Ray Image Sensors

We introduce a pixel‐structured scintillator realized on a flexible polymeric substrate and demonstrate its feasibility as an X‐ray converter when it is coupled to photosensitive elements. The sample was prepared by filling Gd₂O₂S:Tb scintillation material into a square‐pore‐shape cavity array fabricated with polyethylene. For comparison, a sample with the conventional continuous geometry was also prepared. Although the pixelated geometry showed X‐ray sensitivity of about 58% compared with the conventional geometry, the resolving power was improved by about 70% above a spatial frequency of 3 mm^?1. The spatial frequency at 10% of the modulation‐transfer function was about 6 mm^?1.     

基板预变形下激光立体成形直薄壁件应力和变形的有限元模拟

针对单道多层的直薄件激光立体成形过程,建立了基板预变形和无预变形条件下的3D参数化有限元模型,进行了应力和变形的瞬时热弹塑性有限元模拟分析。模拟结果表明,基板预变形处理影响成形件应力和变形的分布与大小,并可减轻基板的翘曲变形。预变形下基板下表面具有初始拉应力点的残余应力值比无预变形要小,基板与熔覆层接触的界面中间位置残余应力也小于无预变形的情况,直薄壁件最大残余压应力所在位置也发生变化。在两模型中,熔覆层两侧边缘位置变形严重,而中间位置变形较小。熔覆层首层的沉积对基板变形量影响最大,后续熔覆层的沉积对基板变形量影响程度逐渐减小并最终趋于稳定。成形前对基板进行适当的预变形处理可以有效控制成形件变形和改善应力分布。     

玻璃基底和表面粗糙度在氮化硅薄膜椭偏测量中的影响

在光谱椭偏测量中,玻璃基底的背反射会给测量结果造成较大影响。针对平板显示器件玻璃基底表面氮化硅镀膜进行了椭偏测量和模型计算。采用相干背反射模型“空气基底空气”计算并拟合得到与厂商数据符合较好的玻璃基底折射率。对氮化硅薄膜采用Tauc Lorentz色散模型进行了分析拟合,讨论了薄膜与基底界面层、表面粗糙度对光学常数及模型拟合的影响,表明在薄膜与基底间晶格失配的情况下,界面层的引入对改善拟合度是必要的。给出了薄膜体系的光学常数、薄膜结构的分析结果。