Atomically Thin MoS2: A Versatile Nongraphene 2D Material

Two‐dimensional inorganic materials are emerging as a premiere class of materials for fabricating modern electronic devices. The interest in 2D layered transition metal dichalcogenides is especially high. Particularly, 2D MoS₂ is being heavily researched due to its novel functionalities and its suitability for a wide range of electronic and optoelectronic applications. In this article, the progress in mono/few layer(s) MoS₂ research is reviewed by focusing primarily on the layer dependent evolution of crystal, phonon, and electronic structure. The review includes extensive detail into the methodologies adapted for single or few layer(s) MoS₂ growth. Further, the review covers the versatility of 2D MoS₂ for a broad range of device applications. Recent advancements in the field of van der Waals heterostructures are also highlighted at the end of the review.     

Synthesis of Millimeter‐Scale Transition Metal Dichalcogenides Single Crystals

The emergence of semiconducting transition metal dichalcogenide (TMD) atomic layers has opened up unprecedented opportunities in atomically thin electronics. Yet the scalable growth of TMD layers with large grain sizes and uniformity has remained very challenging. Here is reported a simple, scalable chemical vapor deposition approach for the growth of MoSe₂ layers is reported, in which the nucleation density can be reduced from 10⁵ to 25 nuclei cm^?2, leading to millimeter‐scale MoSe₂ single crystals as well as continuous macrocrystalline films with millimeter size grains. The selective growth of monolayers and multilayered MoSe₂ films with well‐defined stacking orientation can also be controlled via tuning the growth temperature. In addition, periodic defects, such as nanoscale triangular holes, can be engineered into these layers by controlling the growth conditions. The low density of grain boundaries in the films results in high average mobilities, around ≈42 cm² V^?1 s^?1, for back‐gated MoSe₂ transistors. This generic synthesis approach is also demonstrated for other TMD layers such as millimeter‐scale WSe₂ single crystals.     

36kV/10kW CO2激光器充电电源的研制

为了改善现有CO2激光器工频LC谐振充电时充电电压随激光器工作频率升高而降低、影响激光输出的稳定性和光束质量,不利于装置的小型化和轻量化的问题。采用全桥逆变结构和串联谐振软开关电路,研究了36kV/10kW高频高压充电电源。该电源系统采用三相380V交流电作为供电系统,大功率智能功率模块作为全桥逆变电路。逆变交流信号经串联谐振电路及高频脉冲变压器得到高压脉冲信号,高压脉冲经整流给负载电容充电,电源应用电压电流双闭环控制系统,输出电压、电流经采样及放大后,反馈到电源控制芯片SG3525,芯片SG3525通过判断反馈信号的大小,控制输出脉冲宽度调制驱动信号的占空比。激光器放电频率为25Hz时,电源输出电压为37kV,峰值输出功率为13.05kW,充电效率为0.826。结果表明,该高频高压充电电源适合用作CO2激光器的高压充电电源。     

应用改进的简单方程法求(2+1)维ZK-MEW方程的精确解

应用改进的简单方程法求得(2+1)维ZK-MEW方程的精确解,这些解包括双曲函数解、三角函数解。当对双曲函数解中的参数取特殊值时,可以得到了孤立波解。当对三角函数解中的参数取特殊值时,可以得到对应的周期波函数解。实践证明,简单方程法对于研究光电子学、量子光学、激光物理和等离子体物理具有非常广泛的应用意义。     

肖特基势垒二极管SiO2-Si3N4复合钝化膜研究

对Si肖特基势垒二极管的钝化技术进行了研究。研究了不同淀积温度、气体流量、射频功率以及气体压力等工艺技术条件下,淀积PECVD SiO_2和LPCVD Si_3N_4膜的介电强度E、介电常数ε_r、耐压V、针孔密度、漏电流I、内应力σ、片间均匀性以及片内均匀性等性能。研究了PECVD SiO_2膜的增密技术。提出了一种应力小、漏电流小且抗辐照能力较好的PECVD SiO_2/LPCVD Si_3N_4复合介质膜钝化工艺方法和技术条件,提高了肖特基势垒二极管的性能。     

La基高k栅介质的研究进展

SiO2作为栅介质已无法满足MOSFET器件高集成度的需求,高k栅介质材料成为当前研究的热点。综述了高k栅介质材料应当满足的各项性能指标和研究意义,总结了La基高k栅介质材料的最新研究进展,以及在改正自身缺点时使用的一些实验方法,指出了有可能成为下一代MOSFET栅介质的几种La基高k材料。La基高k材料的研究为替代SiO2的芯片制造工艺提供优异的候选材料及理论指导,这是一项当务之急且浩大的工程。     

面向视频应用的扩展色域YCC彩色空间-xvYCC标准简介

介绍了IEC61966-2-4《多媒体系统和设备-彩色测量与管理2-4:彩色管理-面向视频应用的扩展色域YCC彩色空间-xvYCC》标准的主要内容,并希望中国的电视技术业重视宽色域视频系统的研发与标准制订。     

DVB-C2标准简介

介绍了欧洲第二代有线数字电视标准DVB-C2在DVB-C基础上所进行的改进,概述了DVB-C2系统原理及应用特性。DVB-C2采用OFDM技术结合先进的LDPC编码以及时域、频域二维交织技术,提高了系统的频带利用率和易用性,并将极大地扩展广播电视网络的服务功能。     

Na和Ti掺杂对Bi2(Zn1/3Nb2/3)2O7陶瓷性能的影响

采用传统固相反应法制备了Na-Ti掺杂Bi2(Zn1/3Nb2/3)2O7陶瓷。研究了Na+替代Bi3+,Ti4+替代Nb5+对Bi2(Zn1/3Nb2/3)2O7陶瓷烧结特性、显微结构和介电性能的影响。结果表明,掺入Na+和Ti4+后,Bi2(Zn1/3Nb2/3)2O7陶瓷的烧结温度从1000℃降到了860℃左右;在–30℃～+130℃的温度范围内,Na-Ti掺杂Bi2(Zn1/3Nb2/3)2O7陶瓷表现出明显的、激活能约为0.3eV的介电弛豫现象。这主要是由缺陷偶极子和晶格畸变在陶瓷中的出现引起的。     

电子发射材料组成对Ba-W阴极性能的影响

利用TGA-DSC和XRD对阴极铝酸盐添加氧化钪(Sc2O3)前后的合成工艺、产物物相等进行了研究,对合成后铝酸盐与钨基的浸渍工艺、阴极的发射性能及蒸发速率进行了分析。结果表明:铝酸盐主晶相为Ba5CaAl4O12,添加w(Sc2O3)3%后,主晶相改变为Ba3CaAl2O7,熔点下降了48.5℃,铝酸盐的浸渍温度降低了130℃,浸渍度略有升高,保温时间缩短了0.5min。在阴极工作温度(1000～1100℃)范围之内,添加Sc2O3后制备的铝酸盐阴极直流发射密度是普通铝酸盐阴极的2倍以上;1100℃时平均蒸发速率是普通铝酸盐的61.5%,性能明显优于普通铝酸盐。