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The causes of lightning outage are subdivided into direct lightning strokes and induced lightning strokes, which are identified by the characteristics of the lightning overvoltage. In the past, lightning protection devices were directed mainly toward the latter, and attention has been focused on the installation of lightning protection devices, ground wires, and reinforcement of insulators. However, lightning outages continue to occur. Thus it is extremely important to clarify the fault characteristics of lightning surges and to study the effectiveness of various lightning protection devices by considering both direct lightning stroke and induced lightning stroke in order to prevent lightning outage in the future. In this research, the electromagnetic transients program (EMTP) has been applied to the direct lightning stroke, and the induced lightning outage analysis program for multiple conductor systems has been applied to the induced lightning stroke to study the effectiveness of lightning protection devices provided by combination of various lightning protection devices. The most effective lightning protection schemes are analyzed and evaluated based on verification tests on the full scale models as well as economic considerations. 相似文献
13.
本文对CIMS装配线和拆卸线的可靠性问题进行研究。文中分析了它们的运行状况,求出了两种生产线的稳态可用度,并用一个例子加以说明。 相似文献
14.
本文利用等效工作站理论和工件流平衡原理,推导出非串行离散事件生产线可以等价于串联系统,并归结为装配和拆卸两条定理,解决了系统的建模、分析与设计问题。 相似文献
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16.
中频反应溅射SiO2膜与直流溅射ITO膜的在线联镀 总被引:2,自引:2,他引:0
多数ITO透明导电玻璃生产线在实现SiO2膜与ITO膜在线联镀时,应用SiO2靶射频溅射沉积SiO2膜工艺和ITO靶直流溅射沉积ITO膜工艺,如果SiO2膜应用硅靶反应磁控溅射工艺,存在这种工艺是否可以与ITO靶直流溅射沉积ITO膜工艺在线联用以及如何实现联用的问题。作者对现有的生产线进行了改造设计、加工,做了大量实验、质谱分析和多项测试研究,成功地实现反应溅射SiO2膜与ITO膜在线联镀,做到SiO2镀膜室的工作状态的变化基本上不影响ITO镀膜室的工艺条件。 相似文献
17.
R. T. DeHoff 《Journal of microscopy》1985,138(2):143-151
Elements of surfaces that bound a phase (β) in a two phase mixture (α+β) may be classified as: (a) convex (++) if both principal curvatures are positive; (b) concave (? ?) if both are negative; and (c) saddle (+ ?) if one is positive and the other negative. This classification excludes the limiting cases for which one or both of the principal curvatures is zero. The traces of these surfaces that form the boundaries of the β areas on a representative two dimensional section may also be: (a) convex (+) if the local curvature is positive; or (b) concave (?) if it is negative. Line intercepts may be tabulated separately for intersections with convex (+) and concave (?) segments of boundary. This paper presents a derivation of fundamental stereological formulae that relate these counting measurements to three-dimensional geometric properties of the structure they sample. 相似文献
18.
介绍了隔河岩电厂220kV线路保护的原理设计及运行情况,以及采用了双重微机化继电保护装置后带来的优越性,简要描述了CSL-101A高频保护和RCS-931A光纤保护的应用特点。 相似文献
19.
本文针对安钢高炉冷却壁破损的形式、原因进行研究分析,探讨了冷却壁的结构、材质、加工与安装工艺对其寿命的影响。介绍了安钢高炉炉役后期冷却壁的维护生产实践。 相似文献
20.
Herbert S. Bennett 《Journal of research of the National Institute of Standards and Technology》2007,112(4):209-221
In this paper, we present the theory for calculating Raman line shapes as functions of the Fermi energy and finite temperatures in zinc blende, n-type GaAs for donor densities between 1016 cm−3 and 1019 cm−3. Compared to other theories, this theory is unique in two respects: 1) the many-body effects are treated self-consistently and 2) the theory is valid at room temperature for arbitrary values of the ratio R = (Q2/α), where Q is the magnitude of the normalized wave vector and α is the normalized frequency used in the Raman measurements. These calculations solve the charge neutrality equation self-consistently for a two-band model of GaAs at 300 K that includes the effects of high carrier concentrations and dopant densities on the perturbed densities of states used to calculate the Fermi energy as a function of temperature. The results are then applied to obtain the carrier concentrations from Fermi energies in the context of line shapes in Raman spectra due to the coupling between longitudinal optical phonons and plasmons. Raman measurements have been proposed as a non-destructive method for wafer acceptance tests of carrier density in semiconductor epilayers. The interpretation of Raman spectra to determine the majority electron density in n-type semiconductors requires an interdisciplinary effort involving experiments, theory, and computer-based simulations and visualizations of the theoretical calculations. 相似文献