AZO薄膜双靶PLD沉积及其光学性能分析

介绍了利用锌靶和铝靶在氧气气氛中进行掺铝氧化锌(AZO)透明导电薄膜的脉冲激光沉积(PLD)新方法，并与利用ZnO陶瓷靶沉积AZO薄膜的方法进行了对比，分析了此方法的优势和特点。描述了利用该方法在玻璃和硅片上沉积AZO薄膜的实验过程。通过透射光谱分析了沉积的透明导电膜在可见光区的透射性能，用X-射线衍射谱(XRD)研究了薄膜的结构。     

Electrochemical C-V Characteristics and Photoluminescence of a-C∶N Films

Amorphous carbon (a-C) films and amorphous carbon films incorporating with the nitrogen (a-C∶N) were deposited on silicon substrates in a radio-frequency driven plasma enhanced chemical vapour deposition system, while the surface electrical properties of films were investigated by electrochemical capacitance-voltage measurements. It was examined the effect of the interface defects on the properties and deduced that the conducting type of a-C∶N films was n-type. Subsequently, a comparative studies of a-C and a-C∶N films were performed by photoluminescence spectra depending on the temperature. With the decrease of the temperature, the main band with peak energy of 2.48 eV in the a-C∶N films was more intense compared with the other three bands caused by amorphous C in the a-C films.     

PECVD沉积SiOP电介质膜及其XPS研究

采用等离子体增强化学气相沉积(PECVD)技术沉积含P电介质薄膜,用于无杂质空穴扩散(IFVD)技术中InGaAsP-InP MQW结构中新的包封层,替代传统的SiO2层。经X射线光电子谱(XPS)研究证明,该膜就是SiOP结构。快速退火(RTA)研究表明,该膜结构基本稳定,但膜中P原子存在明显扩散,它增强了InPMQW结构中In原子的外扩,却抑制了Ga原子的外扩。这些都明显区别于常规SiO2膜的性质。     

Effect of drag reducer and pour point depressant on the wax deposition of crude oil pipeline

In this paper, the data of wax precipitation before and after the addition of the additives showed that the addition of the drag reducing agent (DRA) and the pour point depressant (PPD) cannot change the wax appearance temperature (WAT) of crude oil. When the dosage of DRA is small, the DRA cannot increase, stop, or slow down the precipitation of wax crystals. The addition of PPDs has no influence on the amount of precipitated wax crystals. From the GPC analysis, the molecular weight of the wax deposit samples in Linpu pipeline is from 500 to 76,800, which indicates that there is no enrichment of DRA in wax deposit samples. The results of IR show that the C?O group was not detected in the wax deposit sample of the Wei Jing pipeline, which indicates that there is no enrichment of the PPDs in wax deposit samples. The results showed that the DRA and PPD have no obvious effect on crude oil pipeline wax deposition.     

Analysis for surface coke deposition in used Mo-Co/γ-Al2O3 catalyst for diesel hydrodesulfurization

The coked Mo-Co/γ-Al₂O₃ catalysts were Soxhlet extracted with the solvent of tetrahydrofuran. Experimental techniques like FT-IR, GC-MS, XPS, H₂-TPR, BET, etc. were applied for the characterization of coke and catalysts to make a comparison of their physical properties. The results showed that the active components of the catalyst were slightly less after the reaction. The specific surface area and the pore volume had recovered to some degree. These results indicated that the main cause of deactivation of Mo-Co/γ-Al₂O₃ catalysts is carbon deposit. The principal components of the soluble carbon deposit on Mo-Co/γ-Al₂O₃ catalysts were alkyl aromatics with 1–4 rings and C₁₉–C₂₉ long-chain alkane compounds.     

Influence of dry and wet cleaning on the properties of rapid thermal grown and deposited gate dielectrics

Various silicon surface cleaning processes for rapid thermal in-situ polysilicon/ oxide/silicon stacked gate structures have been evaluated. Metal-oxide-semiconductor capacitors were fabricated to assess the effects of cleaning on the quality of gate oxide structures produced by both rapid thermal oxidation (RTO) and rapid thermal chemical vapor deposition (RTCVD). Excellent electrical properties have been achieved for both RTO and RTCVD gate oxides formed on silicon wafers using either an ultraviole/zone (UV/O₃) treatment or a modified RCA clean. On the contrary, poor electrical properties have been observed for RTO and RTCVD gate oxides formed on silicon wafers using a high temperature bake in Ar, H₂, or high vacuum ambient. It has also been found that the electrical properties of the RTCVD gate oxides exhibit less dependence upon cleaning conditions than those of RTO gate oxides. This work demonstrates that initial surface condition prior to gate oxide formation plays an important role in determining the quality of RTO and RTCVD gate oxides.     

半球陀螺金属化膜层的均匀性模拟分析

该文将光学模拟技术与镀膜工艺结合,采用光线追踪程序来模拟溅射粒子在振子表面膜层的分布状态。通过模拟和相关实验验证,当设备相对角度β=10°、φ=60°时,振子表面膜层的均匀性最高,模拟值与实际测试值匹配度较好,误差在7%以内。     

The growth and characterization of AlGaAs double heterostructures for the evaluation of reactor and source quality

AlGaAs double heterostructures are grown by low-pressure metalorganic chemical vapor deposition to evaluate the level of oxygen contamination in different trimethylaluminum sources. Effects of arsine purifiers, misoriented substrates, atmospheric exposure of the growth chamber, and possible phosphorus contamination are also studied. Extensive characterization is performed on these films by a variety of methods, including high-resolution x-ray diffraction, photoluminescence (PL), time-resolved photoluminescence, and secondary-ion mass spectrometry. The PL intensities for structures grown with the low-alkoxide grade are reproducibly much greater than those grown with the regular-grade TMA1. The use of AsH₃ purification improves the PL intensity.     

Strain from modified interface compositions in InGaAs/InP superlattices

Thin strained regions have been inserted at the interfaces of lattice-matched InGaAs/lnP superlattices to assess growth conditions for tailoring of localized compositional changes and for studying As-P intermixing behavior during heterojunction growth. Also, precise growth rates of binary composition layers were determined from specially designed superlattices using strained layers of common anion compounds inserted periodically into InP and GaAs. Growth rates of fractional monolayers are found to be identical to thick layer growth rates. When thin InAs, GaAs, GaP, ALAs, or AIP layers were inserted at the InGaAs/lnP heterojunctions, the measured strain at either one or both interfaces was equal to the strain predicted from the growth rate x time product. Excess strain seen in some cases is due to a change in As-P intermixing and this component can be separated from the predicted strain. Insertion of Ga-compounds at the InP-grown-on-InGaAs interface causes interface roughening which degrades the superlattice. For all other compositions the thin, highly strained regions are not detrimental to the crystalline quality of the periodic structure.     

ArF准分子激光立方氮化硼薄膜的制备

采用ＡｒＦ准分子脉冲激光沉积方法（ＰＬＤ），以六方氮化硼（ｈ－ＢＮ）作靶在Ｓｉ（１００）衬底上制备氮化硼薄膜。ＸＲＤ及ＦＴＩＲ透射谱测量表明生成的氮化硼薄膜是含有少量六方氮化硼结构的立方氮化硼（Ｃ－ＢＮ）．ＡＥＳ测量表明不同条件下生成的薄膜中Ｎ与Ｂ的相对含量是不同的，最大比例近乎为１：１，薄膜的维氏显微硬度ＨＶ最大值为１５８０ｋｇ／ｍｍ２。