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991.
《Vacuum》2004,75(3):195-205
Amine-containing organic films are deposited onto silicon substrates from mass-selected beams of 5-200 eV Si2NC8H19+ (silazane) and 15-100 eV C3H6N+ (allylamine) ions produced by electron impact ionization of 1,3-divinyltetramethyldisilazane and allylamine. Silazane films are also deposited onto aluminum substrates. These ion-deposited films are analysed directly and/or after air exposure by X-ray photoelectron spectroscopy (XPS) and atomic force microscopy (AFM). Chemical derivatization prior to XPS analysis is utilized to distinguish primary and secondary amine groups in the films from non-amine nitrogen. Primary amines are absent in silazane films. Secondary amine containing films form at low silazane ion energies whereas the higher ion energies lead to formation of more inorganic, silico-carbo-nitride-like films. The ion energy trend is similar for films from allylamine ions, except for the fact that both primary and secondary amines are detected. The primary amines from allylamine ions survive film ageing in air for periods of several days. Ion-induced film-substrate reactions are observed for silazane films. 相似文献
992.
The problem of computerized batch control of the silicon epitaxial layer deposition technological process has been solved using optimal stochastic control methods. A control algorithm is presented the main emphasis being given to the forecasting and compensating of disturbing processes which act on a process unit under real operation conditions. The method of multidimensional time series, stochastic model form identification for the process noise is developed based on multidimensional time series, correlation analysis results. The “maximum likelihood” identification method is applied in order to obtain efficient estimates of the model parameters. The identification of the model form and model parameters is carried out on the basis of a rather extensive set of data obtained from operation records of a high capacity epitaxial unit. The adequacy of the identified models is checked by means of a correlation analysis of the model residuals. It is demonstrated that results comparable to those with an intuitive process control by an experienced operator, can be achieved when using the algorithm presented in the present work for process computer control. This algorithm thus represents a reliable and rational basis for process control computer software development. 相似文献
993.
Pushkar Tandon James P. Terrell Xiaodong Fu Amy Rovelstad 《International Journal of Heat and Mass Transfer》2003,46(17):3201-3209
A method is presented to predict the soot volume fraction in soot-laden gas streams in systems where thermophoresis is the dominant mechanism of particle deposition onto adjoining surfaces. In particular, we considered deposition of silica particles on a circular cylinder in cross-flow to a premix CH4/O2 flame, a setup similar to the one used in the outside vapor deposition process used for making optical fibers. Silica particles were produced by introducing SiCl4 along with the premix gases to the burner and were collected on a cylinder. Heat flux and mass deposition rate measurements on the cylinder were performed and recorded as a function of time. Considering thermophoresis to be the dominant mechanism of particle deposition, a simple theory was developed to establish the relationship between the measured quantities. The theory predicted that the thickness at any given time t was expected to increase linearly with the integral of (integrated from t=0 to t=t), where q′′(t) is the heat flux. Such a linear relationship was observed for five different reactant flow rates confirming thermophoresis to be the dominant mechanism of particle deposition. Soot volume fraction and soot mass fraction were calculated from the slope of these linear fits and were seen to be in good agreement with the estimates of the soot fraction from light scattering measurements. Based on the light scattering estimates of particle diameter, particle number densities were also estimated. 相似文献
994.
碳氮纳米管薄膜及其场致电子发射特性 总被引:4,自引:2,他引:2
利用微波等离子体增强化学气相沉积技术,在玻璃衬底上600℃~650℃的低温下制备出了碳氮纳米管薄膜,氮含量为12%,采用扫描电子显微镜(SEM)、X射线光电子谱(XPS)和Raman光谱等测试手段对所制备薄膜的表面形貌、微结构和成分进行了分析,并研究了其场致电子发射特性,阈值电场为3.7V/μm。当电场为8V/μm时,电流密度为413.3μA/cm^2,实验表明该薄膜具有优异的场发射性能,而且用这种方法制备的薄膜将大大简化平板显示器件的制作工艺。 相似文献
995.
996.
We developed a double slit method in order to reduce droplets that were a problem in pulsed laser deposition (PLD) of tantalum oxide. The tantalum oxide films were deposited using KrF excimer laser ablation of a Ta target in 5 mass% O3 at a pressure of 10 Pa. Stoichiometric and dense films with few droplets were obtained at a pressure of 10 Pa. Without double slit, as the laser pulses increased, the number of droplets containing rich metal on the film gets increased and its size became larger, and the surface morphology of the target also became more and more rugged. It was found that the number of droplet could be controlled by changing the initial roughness of the target. The number of droplets with a diameter size of under 1 μm was decreased to 1/10 of their sizes. Droplets larger than 3 μm, which mostly affect the corrosion resistance and hardly increase even beyond the laser pulses of 100 000. It is evident from this study that the double slit is a very effective method for reducing the droplets, which are otherwise a problem often seen in film production by PLD. 相似文献
997.
研究了过共晶Al-17Si-xLa合金在室温下不同频率的阻尼一应变振幅行为。Al-17Si-xLa合金通过常规的铸造和喷射成形工艺制备,并采用动态热机械分析仪(DMTA)对其阻尼行为进行研究。结果表明大多数铸态以及喷射成形态Al-17Si-xLa合金显示了类似的室温应变振幅-阻尼行为:即随振幅的增加,阻尼先不增大,然后明显升高出现阻尼峰,最后回落,可以用G-L位错阻尼理论加以解释;铸态下添加La对Al-17Si合金的阻尼行为影响不大,过量La(6%(质量分数))添加明显降低阻尼性能。La的添加明显提高喷射成形态Al-Si合金阻尼性能。喷射成形态Al-Si合金的阻尼明显比相应铸态Al-Si合金的阻尼高。 相似文献
998.
大气环境研究若干领域的动态与进展 总被引:1,自引:1,他引:0
介绍了大气环境中若干研究领域的动态与进展,内容包括“欧洲示踪实验计划”;符合指数d的概念,IAEA等开展环境迁移模式有效性的大型国际合作计划,扩散参数的不确定度和其对扩散因子的影响;海陆风环流的实验观测与分析;不同地表干,湿沉积,再悬浮参数及其实测值,事故评价中的大气扩散,天气取样技术,事故冲洗因子计算模式及有效扩散参数。 相似文献
999.
1000.
两步电镀铜对Cf/Cu复合材料的复合效果的影响 总被引:11,自引:1,他引:10
通过对碳纤维表面进行空气热氧化短处理,然后采用两步镀铜法对纤维表面进行电镀铜,有效的避免了普通镀铜方法中常见的“黑心”现象,使得纤维束内部单丝获得了均匀连续的镀铜层,而且纤维与镀铜层之间结合牢固.经两步镀铜处理后的碳纤维复合丝与铜基体复合后,碳纤维/铜复合材料中常见的严重纤维偏聚现象得到很大改善,获得了Cf/Cu界面结合良好,纤维分布均匀的铜基复合材料. 相似文献