Ge/Si量子点的生长研究进展

要有效应用SK模式生长的Ge量子点,必须实现Ge量子点的位置可控并且进一步缩小Ge量子点的尺寸.阐释了这方面的研究进展,特别对图形衬底生长Ge量子点,利用Si表面的自组织性在错切割的邻晶面衬底上生长有序Ge岛,表面杂质诱导成岛这三个方面的进展加以介绍分析.     

掺杂一维光子晶体的杂质态

阐述了无缺陷光子晶体与掺杂光子晶体的结构,用光学特征矩阵方法,通过数值模拟计算具体讨论了一维光子晶体的一个实例。计算结果表明,掺杂光子晶体的禁带出现了极窄的、高透射率的尖峰,即光子杂质态,类似于半导体材料中的杂质能级。杂质层的引入增宽了原来光子禁带的宽度,杂质态的特征与杂质层的光学厚度、折射率及在晶体中的位置等因素有关。     

Time‐resolved investigation of Cu(In,Ga)Se2 growth and Ga gradient formation during fast selenisation of metallic precursors

Ga segregation at the backside of Cu(In,Ga)Se₂ solar cell absorbers is a commonly observed phenomenon for a large variety of sequential fabrication processes. Here, we investigate the correlation between Se incorporation, phase formation and Ga segregation during fast selenisation of Cu–In–Ga precursor films in elemental selenium vapour. Se incorporation and phase formation are analysed by real‐time synchrotron‐based X‐ray diffraction and fluorescence analysis. Correlations between phase formation and depth distributions are gained by interrupting the process at several points and by subsequent ex situ cross‐sectional electron microscopy and Raman spectroscopy. The presented results reveal that the main share of Se incorporation takes place within a few seconds during formation of In–Se at the top part of the film, accompanied by outdiffusion of In out of a ternary Cu–In–Ga phase. Surprisingly, CuInSe₂ starts to form at the surface on top of the In–Se layer, leading to an intermediate double graded Cu depth distribution. The remaining Ga‐rich metal phase at the back is finally selenised by indiffusion of Se. On the basis of a proposed growth model, we discuss possible strategies and limitations for the avoidance of Ga segregation during fast selenisation of metallic precursors. Solar cells made from samples selenised with a total annealing time of 6.5 min reached conversion efficiencies of up to 14.2 % (total area, without anti‐reflective coating). The evolution of the Cu(In,Ga)Se₂ diffraction signals reveals that the minimum process time for high‐quality Cu(In,Ga)Se₂ absorbers is limited by cation ordering rather than Se incorporation. Copyright © 2014 John Wiley & Sons, Ltd.     

新型压电晶体La3Ga5SiO14的生长及特性

用提拉法成功地生长了La3Ga5SiO14(LGS)单晶,用X-ray粉末衍射证明了其单晶结构,测得沿Y、Z方向的热膨胀系数分别为5×10-6 K-1、3.8×10-6 K-1,在453.15 K时测得晶体的比热为0.90 J/g*K,并在200～ 800 nm之间测其透过谱,测得了其全部压电及弹性常数.     

Tin Doping Induced High-Performance Solution-Processed Ga2O3 Photosensor toward Neuromorphic Visual System

Ga₂O₃ is an emerging wide-bandgap semiconductor with high deep ultraviolet absorption, tunable persistent photoconductivity, and excellent stability toward electric fields, making it a promising component for neuromorphic visual systems (NVSs). However, Ga₂O₃-based photosensors with high responsivity and long response decay times are required for efficient NVSs. A solution-processed doping strategy for fabrication of Ga₂O₃ is proposed with tin foil as a dopant source. Tin-doped Ga₂O₃ (Ga₂O₃:Sn) photosensors are obtained with ultrahigh responsivity and extremely long response decay times. These behaviors are attributed to substitutional tin and oxygen vacancies that modulate defect-related hole trapping. High-performance Ga₂O₃:Sn photosensors can mimic photonic synaptic behaviors and image pre-processing functions. NVSs based on a Ga₂O₃:Sn photonic synapse array perform pattern recognition with an accuracy of 97.3% under an unprecedented low-light pulse stimuli of 0.5 µW cm⁻². This work provides a low-cost solution-processed approach to ultrasensitive Ga₂O₃:Sn NVSs and will facilitate developments in artificial intelligence technology.     

高温超导YBa2Cu3O7薄膜的颗粒,杂相生长机制研究

ＹＢａ２Ｃｕ３Ｏ７（ＹＢＣＯ）高温超导薄膜是重要的超导电子器件应用的材料，它们的质量对器件的运行性能至关重要。薄膜表面的颗粒使表面微波性能变坏，但有些生长在ＹＢＣＯ薄膜基体内部的小颗粒，会使薄膜的临界电流密度升高。     

30 V UMOS中影响导通电阻平坦度的因素分析

功率MOSFET作为开关器件时,导通电阻的平坦度是衡量其性能的重要参数。研究影响导通电阻平坦度的因素,并对其进行优化,有助于改善器件的性能。低压UMOS中,沟道电阻是导通电阻的主要部分。文章以沟道电阻为分析对象,利用公式分析影响因素,通过Sentaurus TCAD仿真验证了导通电阻平坦度的变化趋势。通过改变P型基区离子注入剂量和栅氧层厚度进行仿真。仿真结果表明,通过减小栅氧层厚度和减少P型基区注入剂量,可获得较好的导通电阻平坦度。     

外延阻挡杂质带探测器的抗反射

传统外延阻挡杂质带探测器由于其材料物性和特殊的结构设计存在很强的反射,这些能量损失非常不利于器件的探测性能.报道了一种类光栅双层超构表面微结构阵列,并将此人工微结构引入到外延阻挡杂质带红外探测器以抑制对入射光的反射.实验结果显示,具有超构表面微结构阵列的器件在波长30μm处反射率低于3％,在25.3～32.2μm波段范...     

Enhanced Electron Mobility Due to Dopant‐Defect Pairing in Conductive ZnMgO

The increase of the band gap in Zn_1‐xMg_xO alloys with added Mg facilitates tunable control of the conduction band alignment and the Fermi‐level position in oxide‐heterostructures. However, the maximal conductivity achievable by doping decreases considerably at higher Mg compositions, which limits practical application as a wide‐gap transparent conductive oxide. In this work, first‐principles calculations and material synthesis and characterization are combined to show that the leading cause of the conductivity decrease is the increased formation of acceptor‐like compensating intrinsic defects, such as zinc vacancies (V_Zn), which reduce the free electron concentration and decrease the mobility through ionized impurity scattering. Following the expectation that non‐equilibrium deposition techniques should create a more random distribution of oppositely charged dopants and defects compared to the thermodynamic limit, the paring between dopant Ga_Zn and intrinsic defects V_Zn is studied as a means to reduce the ionized impurity scattering. Indeed, the post‐deposition annealing of Ga‐doped Zn_0.7Mg_0.3O films grown by pulsed laser deposition increases the mobility by 50% resulting in a conductivity as high as σ = 475 S cm^‐1.     

非掺杂InP的低温光致发光研究

研究了2K低温下非有意掺杂InP单晶的光致发光谱,对近带边的辐射跃迁进行了仔细分析,报道了InP单晶在大功率光激发时束缚于中性施主的激子跃迁发光相对减弱、而束缚于中性受主的激子跃迁发光相对增强的现象,并探讨了其机制,确认了材料中存在Mg、Zn等残余受主杂质,并计算得到Mg受主的离化能为41.5meV.