可见光引发剂研究进展

光固化技术的应用非常广泛,常用于光固化涂料、油墨、牙科固化、胶粘剂以及3D打印材料等领域。与紫外光固化相比,可见光固化具备辐射安全、固化深度高、设备价格低廉等优势。作为光固化体系的重要组成部分,光引发剂的研究一直备受关注。本文对近2～3 a可见光引发剂的研究进展进行了综述,主要从TPO类、萘酰亚胺类、蒽醌类、咔唑类、硅酮类、肟酯类、共轭染料类、光生酸剂类和金属配合物类光引发剂9个方面进行了综述,并对可见光引发剂的发展方向做了简单的概述。     

含硫光引发剂的进展

综述了国内外近３０年含硫光引发剂或称光增感剂的进展。对其中性能较好、实用价值较大的硫杂蒽酮系、硫醚二苯甲酮系、锍盐或盐系，以及我们新研究开发成功的新型含硫光引发剂作了重点介绍。     

Tetrakis(2,4,6‐Trimethylbenzoyl)Silane—A Novel Photoinitiator for Visible Light Curing

Visible light curing of photopolymers has gained increasing interest in recent years. Dental materials are one of the important areas of application, where the bimolecular camphorquinone/amine initiator system is currently state of the art initiator. In this study, the authors describe the synthesis and photochemistry of tetrakis(2,4,6‐trimethylbenzoyl)silane, as cleavable Type I visible light photoinitiator. Besides excellent photobleaching behavior, this photoinitiator can well compete with up to now used long wavelength initiators.

     

我国辐射固化产业发展特点与现状

20 0 2年我国辐射固化产业继续得到迅速发展 ,原材料生产有了新突破 ,产品产量增长、企业规模壮大 ,已成为世界活性稀释剂和光引发剂的生产大国和出口大国。然而在发展过程中 ,产业发展欠缺有序性 ,前瞻性也不够 ,企业的生产管理规范性亟待加强。本文详细介绍了中国辐射固化行业主要生产企业的性质、产品类型、产量、产值。     

快速成型工艺所用光敏树脂

立体光刻工艺是目前快速成型技术领域中研究得最多、技术上最为成熟、成型的零件精度最高的方法。该工艺的核心技术之一是光敏树脂。介绍了此类光敏树脂的基本概况 :树脂组成、固化机理、类别 ,并探讨了其现状与发展趋势     

自由基型高分子光引发剂的研究进展

介绍了提氢型(硫杂葸酮、联苯甲酰、蒽醌型)和光裂解型(苯偶姻醚、酰基膦氧型、有机硅烷类)2类自由基高分子光引发剂的引发机理和研究进展，并对光引发剂的发展趋势进行了展望。     

新型含硫化合物的荧光光谱及其光解机理

本工作合成了硫代ａ－萘甲酸－ｓ－苯酯和硫代苯甲酸－ｓ－苯并噻唑酯，对其光化学和光物理行为进行了研究。由于萘基和苯并噻唑基的引入，有效地增加了该类化合物的最大吸收光谱范围，并在受光激发后，可观察到有荧光发射。工作中发现，硫代ａ－萘甲酸－ｓ－苯酯荧光发射强度会随光照时间的增加而加强，这是因该化合物光解时生成了有高荧光量子产率的ａ，ａ’－联苯；但在硫代苯甲酸－ｓ－苯并噻唑酯的光解中观察不到上述现象，文章     

硫杂蒽酮类光引发剂的电子自旋共振研究

本文采用ESR手段对五种硫杂蒽酮类光引发剂2-甲基硫杂蒽酮(MTX)2,4-二甲基硫杂蒽酮(DMTX)、1,2,4-三甲基硫杂蒽酮(TMTX)、2-甲氧基硫杂蒽酮(MOTX),2-戊氧基硫杂蒽酮(AOTX)和三乙胺引发体系进行了研究,提出了该类光引发剂和三乙胺暗反应的机理。     

A water‐soluble supramolecular‐structured photoinitiator between methylated β‐cyclodextrin and 2,2‐dimethoxy‐2‐phenylacetophenone

A water‐soluble supramolecular‐structured photoinitiator (SSPI) was synthesized by supramolecular self‐assembling between methylated β‐cyclodextrin (MβCD) and hydrophobic 2,2‐dimethoxy‐2‐phenylacetophenone (DMPA). The structure of SSPI was characterized by X‐ray diffraction, FTIR, ¹H NMR, UV–vis, and fluorescence spectra. The results indicated that MβCD and DMPA had formed 1 : 1 inclusion complex in methanol solution. The binding constant (K) for the complex was 7.51 × 10²M^?1. SSPI could be dissolved in water easily and its water‐solubility was 15.3 g/100 mL. SSPI was the more efficient photoinitiator than DMPA for the photopolymerization of acrylamide (AM) in homogeneous aqueous system. The conversion for photopolymerization of trimethylolpropane triacrylate system initiated by SSPI was similar to that initiated by DMPA. © 2007 Wiley Periodicals, Inc. J Appl Polym Sci 2007     

pH‐response superabsorbant hydrogel synthesized by ultraviolet photopolymerization

A new synthesis method of pH‐response superabsorbent hydrogels (SHG) was achieved by direct ultraviolet (UV) photopolymerization, and in particular, the synthesis of SHGs of acrylic acid (AA), sodium acrylate (AANa), and methacrylcholine chloride (MACC) tricomponent copolymer by UV photopolymerization were investigated. The pH value responsive behavior of SHG with different monomer ratios of MACC and AA was researched, and SHG showed large swelling properties at pH value approximately 7. Influences of monomer ratio (mol) of AANa to AA, photoinitiators, crosslinking agents, and exposure time of UV light on the water absorbent properties were studied. The results showed that the water absorbent capacity of SHG based on photoinitiators: Esacure KTO46 or Irgacure 651 can reach comparatively high, N,N′‐Methylene bisacrylamide and diethylene glycol diacrylate (DEGDA) were high efficient crosslinking agents for its crosslinking the molecular chains through attending the copolymerization with monomers. When the exposure time was 10 min, the distilled water absorbency of SHG was 1503 mL/g under the condition: content of MACC, 14.3 wt %; monomer ratio (mol) of AANa to AA: 5.67; content of DEGDA and Irgacure 651, 0.0025 and 0.25 wt %. © 2006 Wiley Periodicals, Inc. J Appl Polym Sci 103: 1847–1852, 2007