局部增强压焊块铝层厚度的工艺方法

针对目前铜线封装对芯片压焊块的铝层厚度要求较高的问题,通过改进芯片制造工艺流程,对芯片内部压焊块的铝层进行单独地加厚。以便同时满足芯片封装厂采用铜线打线和芯片制造厂金属刻蚀工艺难易的要求。做法为,在钝化层刻蚀完成后,再生长一层足够厚的金属层,进行钝化层反版的光刻以及湿法刻蚀,只保留下压焊块区域的金属层,此时压焊块区域就...     

同步辐射x射线光刻制作深亚微米T形栅

x射线光刻非常适合用于深亚微米T形栅的制作,这是因为它的高分辨率、大的曝光视场和高的生产效率足以满足MMIC制造工艺的要求。本文中我们首先对我们的x射线掩模制造工艺进行介绍,然后论述了一种用于制造深亚微米T形栅的两层胶工艺,介绍了所取得的一些研究结果,最后对国内的深亚微米光刻现状进行了简要分析。     

等离子体横向刻蚀硅的特性研究

研究了用SiO2 +Al作掩模 ,SF6 +O2 混合气体等离子体对Si的横向刻蚀 ,其结果表明 ,在SF6 +O2 等离子体气氛中 ,Al是很好的保护膜 ,可以在待悬浮器件下形成大的开孔。因此 ,预计用这种技术 ,可以在Si片上集成横向尺寸为数百微米 ,具有优良高频性能的MEMSRF/MW无源器件 ,如开关、传输线、电感和电容等。     

取样光栅周期中等效啁啾的实验研究

在Moire取样Bragg光纤光栅（SBG）的理论基础上，首次通过用相位模板旋转和2次曝光的方法，得出了带有取样啁啾的SBG的各个Fourier级数的等效啁啾率。实验数据和理论值的误差小于9%。     

连续40 W 808 nm量子阱线阵二极管激光封装技术

研究了高功率二极管激光 (LD)封装中的铟焊料蒸镀工艺和回流焊工艺对芯片焊接状态的影响。在数值模拟和实验研究的基础上 ,优化了冷却器结构设计 ,研制出具有热阻低、压降小的铜微通道液体冷却器 ,可以满足热耗散功率大于 6 0W的二极管激光器散热冷却需要。通过封装实验得到输出功率 40W ,波长 80 8nm ,谱线半高宽<2nm ,电光效率近 40 %的连续线阵二极管激光器。用该激光器进行了抽运Nd∶YAG固体激光实验 ,在抽运功率为 40W时 ,获得 11 8W单横模固体激光输出 ,光 光效率约为 30 %。     

Interfacial reactions in In-Sn/Ni couples and phase equilibria of the In-Sn-Ni system

The In-Sn-Ni alloys of various compositions were prepared and annealed at 160°C and 240°C. No ternary compounds were found; however, most of the binary compounds had extensive ternary solubility. There was a continuous solid solution between the Ni₃Sn phase and Ni₃In phase. The Sn-In/Ni couples, made of Sn-In alloys with various compositions, were reacted at 160°C and 240°C and formed only one compound for all the Sn-In alloys/Ni couples reacted up to 8 h. At 240°C, Ni₂₈In₇₂ phase formed in the couples made with pure indium, In-10at.%Sn and In-11at.%Sn alloys, while Ni₃Sn₄ phase formed in the couples made of alloys with compositions varied from pure Sn to In-12at.%Sn. At 160°C, except in the In/Ni couple, Ni₃Sn₄ formed by interfacial reaction.     

数字掩模灰度细分技术研究

数字掩模技术是一种很有发展前途的衍射微光学元件制作技术。实际制作时,由于感光材料具有感光非线性,实际可利用的灰度数目将小于256。即使256级灰度全部可用,也无法实现曝光量的精细控制以达到一般的加工要求。文中提出了2种灰度细分的方法,即多SLM组合调制和彩色等效灰度技术。从理论上分析了2种方法均能实现灰度的细分,从而达到曝光量的精细控制。     

Thermosonic bonding of lead-free solder with metal bump for flip-chip bonding

While extensive research on the lead-free solder has been conducted, the high melting temperature of the lead-free solder has detrimental effects on the packages. Thermosonic bonding between metal bumps and lead-free solder using the longitudinal ultrasonic is investigated through numerical analysis and experiments for low-temperature soldering. The results of numerical calculation and measured viscoelastic properties show that a substantial amount of heat is generated in the solder bump due to viscoelastic heating. When the Au bump is thermosonically bonded to the lead-free solder bump (Sn-3%Ag-0.5%Cu), the entire Au bump is dissolved rapidly into the solder within 1 sec, which is caused by the scrubbing action of the ultrasonic. More reliable solder joints are obtained using the Cu/Ni/Au bump, which can be applied to flip-chip bonding.     

微波组件用镀镍壳体的烧结性能研究

用荧光厚度分析仪、X光透视、扫描电子显微镜/能谱仪及切片分析等手段研究了不同镀镍壳体的烧结性能。结果表明,不同镀镍类型的镀层可焊性不同,电镀暗镍可焊性最差,电镀氨基磺酸镍和化学镀NiP的可焊性相对较好。SnAgCu焊料与镀镍壳体润湿较好,基片烧结空洞率较低,烧结界面与壳体及基片和玻璃绝缘子结合致密,玻璃绝缘子烧结的密封检漏通过率达90%。温度冲击后,烧结界面无明显分层和裂纹出现,镀镍壳体试制样品的电性能满足设计要求。     

Low-cycle fatigue behavior of Sn-Ag, Sn-Ag-Cu, and Sn-Ag-Cu-Bi lead-free solders

Low-cycle fatigue (LCF) tests on as-cast Sn-3.5Ag, Sn-3Ag-0.5Cu, Sn-3Ag-0.5Cu-1Bi, and Sn-3Ag-0.5Cu-3Bi solders was carried out using a noncontact strain-controlled system at 20°C with a constant frequency of 0.1 Hz. The addition of Cu does not significantly affect the fatigue life of eutectic Sn-Ag solder. However, the fatigue life was significantly reduced with the addition of Bi. The LCF behavior of all solders followed the Coffin-Manson relationship. The fatigue life of the present solders is dominated by the fracture ductility and can be described by the ductility-modified Coffin-Manson’s relationship. Steps at the boundaries of dendrite phases were the initiation sites for microcracks for Sn-3.5Ag, Sn-3Ag-0.5Cu, and Sn-3Ag-0.5Cu-1Bi solders, while for Sn-3Ag-0.5Cu-3Bi solder, cracks initiated along both the dendrite boundaries and subgrain boundaries in the dendrite phases. The linking of these cracks and the propagation of cracks inside the specimen occurred both transgranularly through eutectic phases and intergranularly along dendrite boundaries or subgrain boundaries.