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131.
Pulsed Laser Deposition of magnetically ordered polycrystalline SmFeO3 films has been optimized onto SiO2 glass substrates as function of substrate temperature, oxygen pressure and pulsed laser fluency. Using a KrF excimer laser, crystallization temperature is found to be about 1048 K for a weak fluency of only 1.7 J cm− 2. We show that this growth temperature can be reduced using higher fluency and that it is possible to obtain a film texturation along the c axis by reducing the oxygen pressure at given temperature and fluency. In a second part, we focus on the SmFeO3 optical constants determined by in situ ellipsometry using a stacking model and the Cauchy dispersion relation for SmFeO3 layer. We show a good correlation between the transmission and reflection calculated from these data and measured by ex situ spectrophotometry in the visible range.  相似文献   
132.
133.
本文通过光谱椭偏仪测量浮法玻璃空气面和锡面的偏振信息,利用Cauchy光学模型分析得到浮法玻璃两表面的布鲁斯特角和光学常数,分析结果表明浮法玻璃空气面、锡面、理想玻璃界面的布鲁斯特角分别为56.7°、57°和56.8°,空气面形成疏松的表面层,厚度为2.75nm,折射率小于玻璃本底,锡面形成锡扩散表面层,厚度为81.29nm,折射率大于玻璃本底折射率,并且随厚度呈现出非线性梯度变化,结合透光率数据分析得到玻璃消光系数在10-6量级。由于浮法玻璃空气面和锡面的折射率明显不同,需要在后续玻璃镀膜光学设计时区别对待。  相似文献   
134.
The microstructures of molybdenum (Mo) thin films deposited at pressures from 3.3 to 10.3 mTorr were characterized, and the relationships between these microstructures and the properties of the films (residual stress and electrical resistivity) were investigated. In the low deposition pressure regime (region I, below 7 m Torr), the residual stress in the tensile direction increases with increasing pressure and the electrical resistivity increases gradually, but at high deposition pressures (region II, above 7 m Torr) the residual stress is reduced and the resistivity increases more steeply. These variations of the properties of the Mo films in the low pressure regime are due to the variation in grain size; the carrier mobility decreases due to increased grain boundary (GB) scattering and the tensile stress increases due to increased atomic attraction across the GBs. In contrast, the porosity of the Mo films increases significantly in the high pressure regime, as demonstrated with variable angle spectroscopic ellipsometry (VASE). Most of these pores are believed to be present along the grain boundaries of the Mo films, so their presence reduces the GB attraction and thus the tensile stress and enhances the carrier scattering. The high porosity of the Mo back contact was shown with secondary ion mass spectroscopy profiling to accelerate the Na diffusion from soda-lime glass into the Cu(In,Ga)Se2 (CIGS) film.  相似文献   
135.
Er3+/Yb3+-codoped transparent oxyfluoride borosilicate glass ceramics containing Ba2GdF7 nanocrystals were prepared and spectroscopic properties of rare earth ions were investigated.Fluoride nanocrystals Ba2GdF7 were successfully precipitated in glass matrix,which was confirmed by X-ray diffraction(XRD)and transmission electron microscopy(TEM)results.In comparison with the as-made precursor,significant enhancement ofupconversion luminescence was observed in the Er3+/Yb3+codoped oxyfluoride glass ceramics,which may be due to the variation of coordination environment around Er3+and Yb3+ions after crystallization.The transition mechanisms of the green and red upconversion luminescence were ascribed to a two-photon process,and that of the blue upconversion luminescence was a three-photon process.  相似文献   
136.
The generalized ellipsometry formalism was used for a right-handed ambichiral sculptured thin film. The amplitude ratios and phase differences were calculated using an experimental dielectric function for bulk titania. The results showed that the occurrence of the circular Bragg regimes can be adduced from ellipsometry spectra.  相似文献   
137.
In this paper the formulae enabling us to calculate the values of the ellipsometric parameters of randomly rough surfaces and very thin films with randomly rough boundaries with respect to the influence of the shadowing between the irregularities of roughness are presented. These formulae are derived within the scalar diffraction theory of light. The first formula allows the calculation of the ellipsometric parameters using a numerical method, while the second formula is the approximative one but it expresses the ellipsometric parameters in a closed form. The numerical analysis of both formulae is performed for several examples of randomly rough surfaces and thin films. Moreover, the comparison of the results achieved using both formulae respecting the shadowing and an earlier formula not including this effect is performed. The experimental data of two samples of the randomly rough silicon surfaces covered with very thin surface layers are interpreted using all the formulae mentioned. Using this experimental study, the correctness of both formulae taking into account the shadowing, is confirmed.  相似文献   
138.
张丽明  王莹 《陕西化工》2012,(4):588-590
采用磁控溅射方法在硅片上制备了不同氮偏压下的非晶GaAs1-xNx薄膜,结合拉曼光谱仪和椭偏仪等手段对样品进行了表征。结果表明,掺入氮气后,α-GaAs薄膜的拉曼光谱有明显变化;随着氮偏压的升高,α-GaAs1-xNx薄膜的折射率和消光系数逐渐减小,其峰值向短波长略微移动。另外,α-GaAs1-xNx薄膜在红外和近红外波段内几乎是透明的。  相似文献   
139.
程海涛 《食品科学》2012,33(4):57-61
利用新型催化剂固体超强酸SO42-/TiO2合成VE乙酸酯,研究催化剂用量、反应物配比、反应时间、反应温度等因素对合成的影响,通过模糊数学模型确定了最佳合成条件。最优合成工艺:温度40℃,时间3h,乙酸酐与VE摩尔比1.2,固体超强酸SO42-/TiO2催化剂用量1.0g,反应酯化率为96.6%。利用IR、元素分析和1H NMR对产物结构进行表征,证明得到的产物为VE乙酸酯。  相似文献   
140.
在光谱椭偏测量中,玻璃基底的背反射会给测量结果造成较大影响。针对平板显示器件玻璃基底表面氮化硅镀膜进行了椭偏测量和模型计算。采用相干背反射模型“空气基底空气”计算并拟合得到与厂商数据符合较好的玻璃基底折射率。对氮化硅薄膜采用Tauc Lorentz色散模型进行了分析拟合,讨论了薄膜与基底界面层、表面粗糙度对光学常数及模型拟合的影响,表明在薄膜与基底间晶格失配的情况下,界面层的引入对改善拟合度是必要的。给出了薄膜体系的光学常数、薄膜结构的分析结果。  相似文献   
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