放射性工作人员不稳定性染色体畸变分析

本文报道对314例放射性工作人员周血淋巴细胞染色体畸变的分析结果。结果表明,职业组的淋巴细胞染色体畸变率高于对照组。双着丝点畸变率 y 随累积剂量当量 D 的关系,可拟合成线性 同归方程y=3.0×10~(-2)+5.0×10~(-4)D。无着丝点畸变率在观察的剂量范围内起始有随剂量当量增加而增加的趋势。     

Gentle STEM: ADF imaging and EELS at low primary energies

Aberration correction of the scanning transmission electron microscope (STEM) has made it possible to reach probe sizes close to 1 Å at 60 keV, an operating energy that avoids direct knock-on damage in materials consisting of light atoms such as B, C, N and O. Although greatly reduced, some radiation damage is still present at this energy, and this limits the maximum usable electron dose. Elemental analysis by electron energy loss spectroscopy (EELS) is then usefully supplemented by annular dark field (ADF) imaging, for which the signal is larger. Because of its strong Z dependence, ADF allows the chemical identification of individual atoms, both heavy and light, and it can also record the atomic motion of individual heavy atoms in considerable detail. We illustrate these points by ADF images and EELS of nanotubes containing nanopods filled with single atoms of Er, and by ADF images of graphene with impurity atoms.     

Higher-order aberration corrector for an image-forming system in a transmission electron microscope

We developed a new electron optical system with three dodecapoles to compensate for spherical aberration and six-fold astigmatism, which generally remains in a two-hexapole type corrector. In this study, we applied the corrector for image-forming system in transmission electron microscope. Compensation for higher-order aberration was demonstrated through a diffractogram tableau using a triple three-fold astigmatism field system, which was then compared with a double hexapole field system. Using this electron optical system, six-fold astigmatism was measured to be less than 0.1 mm at an acceleration voltage of 60 kV, showing that the system successfully compensated for six-fold astigmatism.     

用斑点成像消除光学系统像差的影响

在详细分析用斑点成像消除目标图像中随机扰动影响的基础上,提出了在有像差光学系统中,应用斑点成像消除图像中像差影响的方法。通过在光学系统的光路中引入随机相位屏,采集物的短曝光像,用斑点成像处理,恢复目标图像的功率谱和相位谱,可以得到目标近衍射极限的图像。实验结果表明,这种方法可以消除图像中光学系统像差的影响。     

Alignment algorithm for three-mirror anastigmatic telescopes based on nodal aberration theory

For most of the alignment algorithms, alignment errors and figure errors cannot be separated due to the coupling effect among optical elements. We present an alignment algorithm for TMA telescopes on the framework of nodal aberration theory (NAT). Based on NAT, we firstly determine the axial misalignments of secondary (SM) and tertiary (TM) mirrors. Then we decouple the lateral misalignments and angular misalignments of SM and TM. Finally, we decouple the figure errors of primary mirror (PM) from the alignment errors of SM and TM. To validate the algorithm, a TMA telescope is designed for simulation. In the simulation, modulation transfer function (MTF) is chosen to evaluate the telescope before and after correction. It is found that the algorithm presented in this paper maintains high precision. In the end, a Monte Carlo simulation is conducted to further demonstrate the accuracy of the presented alignment algorithm even in poor conditions.     

单机立体图象显示仪的研制

本文论述了单机立体图象显示仪的成象原理和光学系统的设计方法，并给出了光学系统的结构参数。实践结果证明，这种方法是可行的精确的。     

Measuring and correcting aberrations of a cathode objective lens

In this paper I discuss several theoretical and practical aspects related to measuring and correcting the chromatic and spherical aberrations of a cathode objective lens as used in Low Energy Electron Microscopy (LEEM) and Photo Electron Emission Microscopy (PEEM) experiments. Special attention is paid to the various components of the cathode objective lens as they contribute to chromatic and spherical aberrations, and affect practical methods for aberration correction. This analysis has enabled us to correct a LEEM instrument for the spherical and chromatic aberrations of the objective lens.     

像差在临界角方法探焦技术中的影响

分析了在临界角方法探焦技术中像差对测量灵敏度的影响。并给出了对两个显微物镜测量的结果。焦点探测试验精度为±1×10^-2μm.     

Electron energy loss spectroscopy of nano-scale CrAlYN/CrN-CrAlY(O)N/Cr(O)N multilayer coatings deposited by unbalanced magnetron sputtering

The nano-scale chemical distribution and microstructure of a nitride based wear and oxidation resistant coating prepared by unbalanced magnetron sputtering was investigated. The coating consisted of multilayers of CrAlYN/CrN with a partially oxidised CrAlY(O)N/Cr(O)N oxy-nitride surface layer. The multilayer period of both the nitride and oxy-nitride layers was 3.8 ± 0.2 nm. Nano-scale chemical analysis and imaging was performed using sub-nanometer resolution electron energy loss spectroscopic profiling in a spherical aberration corrected scanning transmission electron microscope. Experimentally determined fine edge structure in electron energy loss spectra were in good agreement with theoretically determined spectra, calculated using electron density functional theory. This analysis indicated the CrN layers to be near stoichiometric with a relative Cr/N ratio of 1.05 ± 0.1 while for the CrAlYN layers the best match between the direct chemical analysis and the simulated edges was (Cr_0.5Al_0.5)N. A diffuse interface, ∼ 1 nm wide was observed between the CrAlYN and CrN layers. For the outermost oxy-nitride layer, the chromium to nitrogen ratio remains approximately constant though out the layer, while the aluminium decreases as a function of increasing oxygen content.     

Designing of Quasi—universal Compensator for Testing Aspherical Surface

According to the theory of testing aspherical surface by normal aberration compensation method,the designing method of quasi-universal compensator is studied.On the basis of third-order aberration theory,after calculating and optimizing with an optical design program,the structure parameters of a compensator are obtained.This new compensator could be used in Twyman-Green interferometer,and in measurement of a certain range of paraboloid ellipsoid and hyperboloid.The compensation accuracy is more than 0.02λ.