基于ebXML的零售业ECR系统的数据交换技术研究

ECR是目前零售行业正在大力推广的管理策略,但与其相关的信息技术方面的基础还相对比较薄弱.从实际应用出发,以现有的EDI商务流程为基础,使用ebXML基础架构,建立了ebXML商务流程模型,实现了ebXML消息服务,并解决了消息在Internet上的传输和安全问题,构建满足ECR系统要求的ebXML数据交换系统,实现精确的信息流和高效的实物流在整个供应链内及时有序的流动.     

Preparation of diamond-like carbon by PBII-enhanced microwave ECR chemical vapor deposition

Diamond-like carbon (DLC) films were fabricated with methane on the surface of Si(100) wafer by combining plasma-based ion implantation and microwave ECR chemical vapor deposition. Raman scattering spectroscopy and X-ray photoelectron spectroscopy (XPS) were used to analyze the chemical structure of the DLC films and sp³ content of the DLC films was measured by XPS. Atomic force microscope was employed to investigate the surface morphology information of DLC films synthesized by different methods. The hardness of the films was evaluated using microindentation techniques. Results showed that plasma-based ion implantation enhanced ECR chemical vapor deposition could result in the better surface morphology, the higher adhesion strength and the enhanced hardness; in addition, the hardness of the DLC films was elevated by doping with nitrogen.     

Study of tribological performance of ECR-CVD diamond-like carbon coatings on steel substrates: Part 1. The effect of processing parameters and operating conditions

Diamond-like carbon (DLC) coatings were prepared on AISI 440C steel substrates at room temperature by electron cyclotron resonance chemical vapor deposition (ECR-CVD) process in C₂H₂/Ar plasma. Using the designed Ti/TiN/TiCN/TiC interfacial transition layers, relatively thick DLC coatings (1-2 μm) were successfully prepared on the steel substrates. The friction and wear performance of the DLC coatings was evaluated by ball-on-disk tribometry using a steel counterbody at various normal loads (1-10 N) and sliding speeds (2-15 cm/s). By optimizing the deposition parameters such as negative bias voltage, DLC coatings with hardness up to 30 GPa and friction coefficients lower than 0.15 against the 100Cr6 steel ball could be obtained. The friction coefficient was maintained for 100,000 cycles (∼2.2 km) of dry sliding in ambient environments. In addition, the specific wear rates of the coatings were found to be extremely low (∼10⁻⁸ mm³/Nm); at the same time, the ball wear rates were one order of magnitude lower. The influences of the processing parameters and the sliding conditions were determined, and the frictional behavior of the coatings was discussed. It has been found that higher normal loads or sliding speeds reduced the wear rates of the coatings. Therefore, it is feasible to prepare hard and highly adherent DLC coatings with low friction coefficient and low wear rate on engineering steel substrates by the ECR-CVD process. The excellent tribological performance of DLC coatings enables their industrial applications as wear-resistant solid lubricants on sliding parts.     

环保节能型ECR玻璃纤维技术的研究与开发

ECR玻璃的成分中不含三氧化二硼，具有特强的耐酸性、耐水性、耐应力腐蚀性以及良好的电学性能。ECR玻璃纤维广泛地用于玻璃钢管与罐、管道、高压绝缘材料等领域。     

不同种类等离子处理对超高分子量聚乙烯表面能的影响

以表面能为评价指标,研究不同种类等离子(氢、氧、氩)处理对超高分子量聚乙烯(UHMWPE)的活化作用.研究结果表明,UHMWPE经氧等离子处理后表面能增幅最大,经氩离子处理表面能增幅次之,而经氢离子处理表面能不仅没有增加,反而还有所下降.光电子能谱(XPS)和红外光谱(FT-IR)分析表明,氧和氩等离子处理后UHMWP...     

Preliminary Results of Drift Instability by Fast Optical Images in KT-5D Toroidal Plasma

Drift instability in plasma generated by electron cyclotron resonance （ECR） in KT- 5D device was investigated by using a fast camera and Langmuir probes. The similarity between the distribution of light intensity from the images and the plasma pressure indicates a nearly linear relationship. The discharge images taken by the camera and the plasma parameters measured by the probes also indicate the existence of low frequency turbulent events with a time scale less than a few mini-seconds.     

Intermediate Gas Phase of CHa/[Si（CH3）2O]5 Plasma and Its Effect on Structure of SiCOH Film

This paper investigated the radical behaviour of the plasma of a mixture of methane （CH4） and decamethylcyclopentasiloxane （DMCPS） by optical emission spectroscopy. The plasma was generated by electron cyclotron resonance （ECR） discharge and was used for depositing porous SiCOH low dielectric-constant film. In the ECR discharge plasma, CH, H, H2, C2, Si, O and SiO radicals were obtained. The CH, H and C2 radicals were from the dissociation of CH4, while the SiO. Si and O radicals from the dissociation of the Si-O chain. CHx radicals absorbed in the film were thermally unstable and could be removed by annealing. The dissociation of the Si-O chain led to an increase in a ratio of the Si-Ocage to Si-Onetwork. The removed of CHx radicals and the increased Si-Ocage to Si-Onetwork ratio were beneficial for reducing the film density and dielectric constant.     

Development of capacitive-coupled hall-type MHD generator

We have demonstrated a capacitively coupled Hall-type MHD generator using ECR plasma. To clarify the characteristics of the fabricated MHD generator, we measured the power generation characteristics as a function of magnetic field strength using a DC Hall-type MHD power generation experiment. The results showed that the output power decreased due to magnetic pressure at the higher magnetic field. However, the output power corresponded to the theoretical value at the lower magnetic field. An AC Hall-type MHD power generation experiment was conducted using an AC magnetic field. As a result, full-wave rectification voltage was observed as per theory. Finally, capacitively coupled Hall-type MHD power generation experiments were conducted, and full-wave rectified waveforms were observed as in AC Hall-type MHD power generation. These waveforms were similar to the output waveforms predicted from theory. These results show that the capacitively coupled Hall-type MHD generator is feasible.