Fabrication of NiO Buffer Layer for YBCO Coated Conductors by Combining Sputtering and SOE Method

In research of YBCO coated conductors, the development of a oxide template for epitaxial growth of YBCO is very important. Matsumoto et al have demonstrated the potential of the surface oxidation epitaxial (SOE) route for formation a cube textured NiO layer on nickel tapes. The epitaxial NiO functions as a buffer layer of chemical reaction between YBCO and nickel, and as a template for the epitaxial growth of YBCO. However, the surface quality of NiO is difficult to control and defects such as crack, spall and deep grooves exist in SOE NiO layer. A new approach combining sputtering and SOE method to obtain crack-free and cube textured NiO layer were reported. Ni tapes prepared by the combination of rolling and recrystallization were used for this work. A coating of Ni was first deposited on the tapes via magnetron sputtering. Then on the coating tapes, continuous and textured NiO layer were achieved by SOE technology.     

Anomalous wear behavior of MoS2 films in moderate vacuum and dry nitrogen

440C steel thrust ball bearing races lubricated with 1 m thick sputtered films of MoS₂ were tested in the unidirectional and oscillatory modes against bare steel balls in moderate (10^–4–10^–5 Pa 10^–6–10^–7 Torr) vacuum and in 1 atmosphere of 99.999% pure ( 1 ppm water) N₂ in the same unbaked environmental chamber. Over 90% of the residual gases in the chamber vacuum consisted of H₂O vapor. The bearings operated in N₂ showed substantially longer lives compared to the specimens tested in vacuum. Scanning electron microscope (SEM) tribometry was also performed on an MoS₂ film powder-burnished onto a 440C flat. This flat was repeatedly oscillated against bare, hemispherical-tipped 440C pins on fresh wear tracks in the same type of N₂ and column vacuum of ~10^–3 Pa 10^–5 Torr itself containing over 90% residual H₂O. The SEM-generated results on the burnished film confirmed the same, atmosphere-dependent difference in wear life observed with the sputtered layers. Varying the moisture content of the burnished flat and its immediate environment by cryosorption predictably manipulated the coefficient of friction and wear life of MoS₂. The various possible causes of this perplexing phenomenon are reviewed, and a plausible hypothesis is offered attributing the unexpected wear life reduction to the physico-chemical consequences of residual H₂O hydrogen-bonding to the oxidized and/or hydrated edge and basal plane sites of MoS₂ in moderate vacuum. The site-specific sorption of water is severely hindered in 1 atm N₂ by the gas molecules disrupting the H-bonding mechanism.     

磁控溅射制备金属铀膜

研究了通过磁控溅射方法制备高纯金属铀膜的可行性。采用X射线衍射（XRD）、俄歇电子能谱（AES）、扫描电镜（SEM）、表面轮廓仪分析了沉积在单晶硅或金基材上铀薄膜的微观结构、成分、界面结构及厚度、表面形貌和表面粗糙度。分析结果表明：磁控溅射制备的铀薄膜为纯金属态,氧含量和其它杂质含量均低于俄歇电子能谱仪的探测下限;溅射沉积的铀镀层与铝镀层之间存在界面作用,两者相互扩散并形成合金相,扩散层厚度约为10nm。铀薄膜厚度可达微米级,表面光洁,均方根（RMS）粗糙度优于15nm。     

空芯玻璃微球表面改性及其介电性能研究

采用直流磁控溅射法对空芯二氧化硅微球表面镀Ni薄膜，利用扫描电镜对镀Ni膜微球形貌进行观察。结果表明获得了金属Ni包覆的玻璃微球。将镀Ni膜微球与高分子粘合剂混合制得人工介质材料，在一定频率范围内，测试其介电常数，并采用有效媒质理论对测试结果进行了分析。研究结果表明，在体积分数一定的情况下，介质材料的有效介电常数eeff随膜厚的增加而增加。eeff随着镀Ni微球体积分数的增加而增加，其实验值与有效媒质理论的C—M公式计算值较好地吻合。     

晶界扩散Tb对烧结Nd-Fe-B组织与磁性能的影响

用磁控溅射法在烧结Nd-Fe-B磁体表面沉积Tb金属薄膜并进行晶界扩散处理,对比经不同热扩散温度及时间处理后的磁体组织和磁性能变化.结果 表明,925℃×10 h+500℃×2 h为最佳晶界扩散工艺,可将磁体矫顽力提高到1630.9 kA· m-1,较原始磁体提升50％,同时剩磁和磁能积无明显下降,磁体仍具有较高的退磁...     

直流磁控溅射研究进展

直流磁控溅射是重要的物理气相沉积技术,广泛应用在工业生产和科学研究中.主要评论了近年来直流磁控溅射技术在溅射机理和非平衡闭合磁控靶等方面取得的重要进展,并评述了脉冲磁控模式和基于闭合磁场直流磁控溅射沉积涂层的结构区域模型.直流非平衡磁控溅射是直流磁控溅射技术中的重要里程碑,使磁控溅射技术直接过渡到离子镀阶段,而脉冲磁控溅射技术为稳定沉积高质量的非导电涂层作出了重要的贡献.     

The effects of impurity and temperature for transparent conducting oxide properties of Al:ZnO deposited by dc magnetron sputtering

Aluminum-doped zinc oxide films (ZnO:Al) were deposited on Si wafers and glass substrates by dc magnetron sputtering from a ZnO target mixed with 2 wt% Al₂O₃ for photovoltaic films. The effect of base pressure, additional oxygen, and substrate temperature were studied in detail. By dc magnetron sputtering at room temperature, the resistivity and the average transmittance in visible range was 2.3 × 10⁻³ Ω cm and 77.3%, respectively. And these were improved up to 3.3 × 10⁻⁴ Ω cm and 86% at the substrate temperature of 400 °C by high deposition rate and low impurity ambient. The mobility and the carrier concentration were improved by the increased preferred orientation of (002) plane and grain size of film with increasing deposition temperature. This advanced AZO film with good resistivity and transmittance can be expected as the front TCO of thin film solar cells.     

氮化铪在蓝宝石衬底上的镀膜研究

利用反应式磁控溅射镀膜系统在蓝宝石衬底上制备了氮化铪(HfxN)薄膜,系统研究了氮气流量fN和镀膜温度Ts对HfxN薄膜的物相组成、晶体结构和电学性质的影响。实验结果表明,在fN=3sccm时,可以在蓝宝石衬底上获得化学计量比接近1的HfxN薄膜,方块电阻为5.24Ω/sq;X射线衍射光谱(XRD)结果显示薄膜为岩盐结构的δ-HfN相;提高镀膜温度可以显著提高HfxN薄膜在蓝宝石衬底上的晶体质量,并且薄膜趋于(111)方向单晶生长;原子力显微镜(AFM)显示薄膜表面平整,均方根粗糙度Rq=0.193nm。     

W/Mo超晶格薄膜的微结构研究

纳米多层膜因常出现物理或力学性能的异常而成为薄膜研究的热点之一。采用ＸＲＤ和ＴＥＭ技术研究了Ｗ／Ｍｏ纳米多层膜微结构。结果表明,Ｗ和Ｍｏ由于同为体心立方结构,且晶格常数相近,由它们交互重叠形成的纳米多层膜具有柱状晶穿过调制界面外延生长的结构特征,形成多晶超晶格结构。     

多弧离子镀与磁控溅射共沉积TiN/TiCN多层膜的高温抗氧化性能

TiN/TiCN多层膜的高温抗氧化性研究对于扩大其应用领域具有重要作用,但目前鲜见相关报道。采用多弧离子镀与磁控溅射技术以不同调制周期在304不锈钢表面共沉积TiN/TiCN多层膜。采用XRD、XPS、倒置显微镜及高温氧化试验研究了多层膜的高温抗氧化行为。结果表明:TiN/TiCN多层膜表面光滑平整、均匀致密,薄膜主要为具有Ti-(C,N)键的fcc-TiN结构;随着调制周期的减小,TiN/TiCN多层膜生长取向发生转变,且具有(111)晶面生长织构;随着氧化温度的升高,多层膜的显微硬度逐渐降低,氧化增重速率不断增大,且在700℃之后变化速率较快,薄膜的开始氧化温度约为750℃;随着调制周期的减小,多层膜TiN与TiCN界面层数量增多,促使晶粒细化,提高了其致密性,还隔断了缺陷贯穿薄膜的连续性,显著降低了薄膜的孔隙率,致使O原子扩散困难,增强了薄膜的高温抗氧化性能。