Ionoluminescence decay measured with single ions

A new ion beam analysis-based, single ion technique called the time to first photon has been developed to measure the decay of the luminescence signal of phosphors. Such measurements are currently needed to study luminescence decay mechanisms following high-density excitations and to identify strongly luminescent phosphor coatings with short lifetimes for ion photon emission microscopy (IPEM). The samples for this technique consist of thin phosphor layers placed or coated on the surface of PIN diodes. Single ions from an accelerator strike this sample and simultaneously create ion beam induced luminescence (IBIL) from the phosphor that is measured by a single-photon-detector, and an ion beam induced charge collection (IBICC) signal in the PIN diode. In this case, the IBICC signal provides the start pulse and the IBIL signal the stop pulse to a time to amplitude converter. It is straightforward to show that this approach also measures a signal proportional to activity versus time with an accuracy of 5% as long as the number of detected photons per ion is less than 0.1, which usually requires the use of absorbers for the IBIL detector or electronic discrimination for the IBIL signals. Details of the new analysis are given together with examples of luminescence decay measurements of several ceramic phosphors being considered to coat IPEM samples. IPEM is currently being developed at Sandia National Laboratory (SNL), the University of North Texas in Denton, and the Universities and INFN of Padova and Torino.     

注入氮离子的SiC涂层阻氢性能研究

利用离子束混合－离子注入（Ar^ ）和磁控溅射相结合的实验技术在HR－1不锈钢基体上制备了注入N^ 的SiC涂层，并用表面分析手段对所制备涂层的表面形貌，剖面形貌、相结构，表面成分，表面元素的化学态进行了分析，结果表明：制备的涂层结构致密，表面平整、膜层成分均匀；涂层与基体之间形成了一明显的过渡层，增强了涂层和基体之间的结合力，用二次离子质谱（SIMS）对充氘涂层的阻氢性能进行了定性分析，结果表明，涂层元素与氢形成稳定的化学键，抑制了氢的扩散和迁移，使得涂层具有一定的阻氢能力。     

Accurate depth profiling through energy-dependent pulse height deficit compensation in gas ionization detectors

The impact of the pulse height deficit effect in gas ionization detectors on the accurate extraction of depth information from heavy ion elastic recoil detection spectra has been investigated. Thin GaN films and Ge_xSi_1−x/Si heterostructures have been analyzed with a 200 MeV ¹⁹⁷Au beam. Employing an empirical parameterisation of the pulse height deficit, a global energy calibration of the detector can be achieved. Energy spectra have been compared, calibrated with either a constant or a full energy-dependent compensation for the deficit. A constant compensation results in significant distortion of the extracted depth profile for heavier ions, whereas an energy-dependent compensation yields true concentration–depth profiles.     

蜂窝梁在大跨度走廊设计中的应用

介绍仪征化纤股份有限公司大跨度走廊中蜂窝梁的设计。     

波束形成和解码的联合迭代接收技术

SDMA技术是提高频谱利用率的有效技术，但在判决反馈最小均方波束形成中，在深衰落之后期望用户波束会指向干扰用户,严重影响了波束形成的性能。文中提出在波束形成和信道解码之后，经过编码、交织，重新生成波束形成的参考信号，再进行波束形成，有效克服了深衰落之后的波束指向错误。计算机仿真结果证明了该方法的有效性。     

回旋管的应用研究

文章论述了推广回旋管应用中所碰到的高功率传输,模式变换和辐射尖锐的波束等技术难点,对现有的准光系统提出了改进措施。     

磁偏转电子枪研制核靶

文章叙述了磁偏转电子枪的原理和结构以及用ＥＱＤ－３型电子枪研制各种核靶的工艺过程。     

梯度折射率棒中传播的高斯光束轨迹解析解及其存在条件的讨论

本文提出光束轨迹方程的一般解，导出解析解的存在条件，推广了文献［１］的光线传播理论，文中以一特定梯度折射率棒为例，讨论了高斯光束在棒中的传播特性。     

离子束增强沉积薄膜合成及其在材料表面优化中的应用

作者在多年实验工作的基础上，论述了离子束增强沉积薄膜合成及其在材料表面优化中的应用、所用设备、膜的合成、表面优化技术与机理，并展望了前景。     

微波电子回旋共振等离子体技术及其应用

微波电子回旋共振等离子体是淀积薄膜、微细加工和材料表面改性的一种重要手段。由于这种等离子体电离水平高,化学活性好,可以用来实现基片上薄膜的室温化学气相淀积和反应离子刻蚀,因此对于微电子学、光电子学和薄膜传感器件的发展,这种等离子体会具有重要的意义。此外,采用微波电子回旋共振等离子体原理,没有灯丝的离子源可以提高离子源的使用寿命,可以增加离子束的束流密度。可以确信,微波电子回旋共振等离子体的发展,将把离子源技术提高到一个新的水平。显然,这必将对材料表面改性工艺,包括离子注入掺杂等工艺的发展发挥作用。自从1985年以来,为了得到大容积等离子体而发展了微波电子回旋共振多磁极等离子体,这些技术在薄膜技术、微细加工以及材料表面改性中的应用前景是乐观的。我们将在本文中,介绍微波电子回旋共振等离子体的原理及其应用。