Architectural Control of Hierarchical Nanobelt Superstructures in Catanionic Reverse Micelles

BaXO₄ (X = Mo, W) nanobelts and a variety of hierarchical superstructures assembled from the nanobelts have been synthesized in a catanionic reverse‐micelle system. The effects of various factors, such as the mixing ratio (r) between the anionic and cationic surfactants, the temperature, and the presence of polymeric additives, on the formation of the nanobelts and their hierarchical assembly have been examined in detail. In particular, r has been shown to be powerful in modulating the formation and assembly of the BaMoO₄ and BaWO₄ nanobelts. Architectural control of the penniform nanobelt superstructures has been readily achieved by changing the experimental parameters. A plausible two‐stage growth mechanism has been proposed for the formation of penniform BaXO₄ nanobelt superstructures in catanionic reverse micelles.     

环氧基的PCB对无铅组装的兼容性

综述了环氧树脂基的PCB与无铅化组装的兼容性问题。经过大量试验表明,常规的FR-4基材和双氰胺固化的高Tg基材是不能满足无铅化组装要求的,而采用酚醛固化的中等-Tg的环氧树脂基材是可能成为无铅化组装用基材的。同时,PCB制造过程也起着重要的作用。PCB设计和再(回)流焊的加热梯度也影响着无铅化的性能。     

Deep‐UV Photochemistry and Patterning of (Aminoethylaminomethyl)phenethylsiloxane Self‐Assembled Monolayers

The 193 nm photochemistry of (aminoethylaminomethyl)phenethylsiloxane (PEDA) self‐assembled monolayers (SAMs) under ambient conditions is described. The primary photodegradation pathways at low exposure doses (< 100 mJ cm^–2) are benzylic C–N bond cleavage (ca. 68 %), with oxidation of the benzyl C to the aldehyde, and Si–C bond cleavage (ca. 32 %). Amine‐containing photoproducts released from the SAM during exposure remain physisorbed on the surface, where they undergo secondary photolysis leading to their complete degradation and removal after ca. 1200 mJ cm^–2. NaCl(aq) post‐exposure rinsing removes the physisorbed materials, showing that degradation of the original PEDA species (leaving Si–OH) is substantially complete after ca. 450 mJ cm^–2. Consequently, patterned, rinsed PEDA SAMs function as efficient templates for fabrication of high‐resolution, negative‐tone, electroless metal and DNA features with good selectivity at low dose (i.e., ca. 400 mJ cm^–2) via materials grafting to the intact amines remaining in the unirradiated PEDA SAM regions.     

装配式贝雷桁架门机设计

本文就装配式贝雷桁架门机的设计要点作了简要的介绍,并对其拼装的技术质量提出要求。     

微波介质谐振器介电参数的测量

本文讨论了微波介质谐振器介电参数测试技术。用研制的测试装置对多个介质样品进行了实测，结果表明，本文的分析与实际值是吻合的。该测试技术可对微波介质谐振器的复介电常数进行迅速、准确、可靠、宽频带、无损伤、自动化和批量检测，具有较强的实用性。     

国内外电雷管电引火元件现状及改进思路

文章分析了目前国内外电引火元件的现状，列举了国外著名火炸药公司典型的几种电引火元件结构及电火参数，提出了改进我国电引火元件的技术构思。