Ni包覆Al2O3粉体的RCVD法制备及机理研究

金属Ni包覆于陶瓷粉体的表面,可以促进其烧结、提高导电性或赋予新的功能性质.本文采用旋转化学气相沉积法(RCVD),利用二茂镍(NiCp_2)前驱体的热分解,借助载体氢气对反应的催化促进作用,在Al_2O_3粉体表面包覆了均匀分散的Ni纳米粒子,并研究了包覆温度和原料供应速率对反应产物物相、粒度和形貌的影响规律.研究表明,在包覆温度为450~550℃、前驱体二茂镍(NiCp_2)供给速率为(0.6~2.0)×10~(-6)kg/s条件下,通过对反应过程中镍纳米粒子的包覆温度和前驱体二茂镍(NiCp_2)供给速率调控可对镍纳米粒子的粒径大小和包覆层数进行调控.结合实验结果,分析了载体氢气对二茂镍反应的催化促进作用,阐述了旋转化学气相沉积条件下Ni纳米粒子在Al_2O_3粉体表面均匀包覆的过程与机制.通过调控包覆温度和原料供应速率,可以影响前驱体二茂镍的分解行为,从而调控镍纳米粒子在Al_2O_3粉体表面的包覆状态.     

求解变系数对流扩散反应方程的指数型高精度紧致差分方法

本文给出了一种数值求解变系数对流扩散反应方程的指数型高精度紧致差分方法.我们首先将模型方程变形,借助常系数对流扩散方程的指数型高精度紧致差分格式,采用残量修正法得到变系数对流扩散反应方程的指数型高精度紧致差分格式;并从理论上分析了当Pelect数很大时,本文格式达到四阶计算精度时网格步长的限制条件;离散得到的代数方程组可采用追赶法直接求解.数值实验结果与理论分析完全吻合,表明了本文格式对于边界层问题或大梯度变化的物理量求解问题具有的高精度和鲁棒性的优点.     

Challenges of Diffusion Bonding of Different Classes of Stainless Steels

Solid state diffusion bonding is used to produce monolithic parts exhibiting mechanical properties comparable to those of the bulk material. This requires diffusion of atoms across mating surfaces at high temperatures, accompanied by grain growth. In case of steel, polymorphy helps to limit the grain size, since the microstructure is transformed twice. The diffusion coefficient differs extremely for ferritic and austenitic phases. Alloying elements may shift or suppress phase transformation until the melting range. In this paper, diffusion bonding experiments are reported for austenitic, ferritic, and martensitic stainless steels possessing varying alloying elements and contents. Passivation layers of different compositions are formed, thus affecting the local diffusion coefficient and impeding diffusion across faying surfaces. As a consequence, different bonding temperatures are needed to obtain good bonding results, making it difficult to control the deformation of parts, since strong nonlinearities exist between temperature, bonding time, and bearing pressure. For martensitic stainless steel, it is shown that it is very easy to obtain good bonding results at low deformation, whereas ferritic and austenitic stainless steels require much more extreme bonding parameters.

     

Brazing temperature-dependent interfacial reaction layer features between CBN and Cu-Sn-Ti active filler metal

CBN/Cu-Sn-Ti (CBN: cubic boron nitride) composites are prepared by active brazing sintering at 1123 K, 1173 K, 1223 K and 1273 K, respectively. The effects of brazing temperature on the wettability, interfacial characteristics, and elemental distribution variations are fully investigated. When the brazing temperature is below 1223 K, completely uncoated and/or partially coated CBN particles with sharp edges can still be observed, and the reaction layer, mainly composed of TiN and TiB2, appears to be thin and uneven. When the brazing temperature is 1223 K, all CBN particles are completely coated, suggesting that adequate wetting has taken place. Besides, as Ti diffuses thoroughly and enriches the interface, the reaction layer, filled primarily by TiN, TiB₂ and TiB, becomes thicker (about 1.30 μm), more uniform, stable and continuous. Further increasing the temperature to 1273 K is unnecessary or even harmful as the reaction layer thickness undergoes negligible change yet some tiny micro-cracks appear on the interface, which may likely deteriorate the grinding capability of the final brazing products.     

Skin layer of A380 aluminium alloy die castings and its blistering during solution treatment

Skin layer is a characteristic microstructure of aluminium die castings, which would effect the surface blistering during solution treatment. In this study, the microstructures of skin layer were investigated by the methods of optical microscope (OM), scanning electron microscope (SEM) and electron probe micro-analyzer (EPMA). High resolution X-ray CT was used to compare the skin layer with normal surface before and after solution treatment. With the aid of computational fluid dynamics (CFD), the formation mechanism of the skin layer was discussed based on microstructure distribution, solute segregation, porosity distribution and surface blistering. The results suggested that the skin layer is related to a succession of complex processes before the filling process finished. Pore clusters or laminar defects would be formed in skin layers during solution treatment and cause severe surface blistering.     

工业软测量模型结构与输入变量选择的研究

针对过程工业中难以直接测量的变量建立其软测量模型,对于实现关键指标的在线监测和实时控制具有十分重要的意义.变量的选择直接关系到神经网络软测量模型的预测性能,针对现有输入变量和网络结构选择方法在工业应用中的不足,提出了一种基于敏感度分析的方法来确定网络输入变量集和前馈神经网络隐含层节点个数,并建立了高密度聚乙烯(HDPE...     

Comparison of the RF MEMS switches with dielectric layers on the bridge’s lower surface and on the transmission line

Previously, we proposed that the dielectric layer of RF MEMS switch can be fabricated either on the transmission line, as traditional switches, or on the lower surface of the bridge. This paper presents a detailed comparison of the RF MEMS switches with different positions of dielectric layer. Through theoretically analyzing the physical model of fringing capacitance, it is revealed that different positions of dielectric layer can result in different switch capacitances. Therefore, the change of d...     

PS对剪贴图层创建图层样式的方法

该文介绍了设计Logo时对剪贴图层创建图层样式的方法。     

集散控制系统网络结构的研究

为了提高集散控制系统通信的可靠性、稳定性、抗干扰性和可扩展性,降低集散控制系统通信的故障率,提出了一种基于工业以太网的网络通信方式,并验证了该通信网络的可行性。该网络是一种采用分布式、冗余式、立体式的多层次网络结构。此结构使网络的负荷均匀分配,降低了网络的故障率,并使集散控制系统的网络向开放化、信息化的方向发展。     

Discharge properties and chemical stability of SrZrO films

Abstract— MgO thin film is currently used as a surface protective layer for dielectric materials because MgO has a high resistance during ion sputtering and exhibits effective secondary electron emission. The secondary‐electron‐emission coefficient γ of MgO is high for Ne ions; however, it is low for Xe ions. The Xe content of the discharge gas of PDPs needs to be raised in order to increase the luminous efficiency. Thus, the development of high‐γ materials replacing MgO is required. The discharge properties and chemical surface stability of SrO containing Zr (SrZrO) as the candidate high‐γ protective layer for noble PDPs have been characterized. SrZrO films have superior chemical stability, especially the resistance to carbonation because of the existence of a few adsorption sites due to their amorphous structure. The firing voltage is 60 V lower than that of MgO films for a discharge gas of Ne/Xe = 85/15 at 60 kPa.