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91.
The glass transition temperatures (Tgs) of polystyrene (PS) and styrene/methyl methacrylate (S/MMA) random copolymer films are characterized by intrinsic fluorescence, i.e., monomer fluorescence from an excited-state phenyl ring and excimer fluorescence from an excited-state dimer of two phenyl rings. The Tg is determined from the intersection of the rubbery- and glassy-state temperature dependences of the integrated fluorescence intensity measured upon cooling from an equilibrated state. With PS, the effects of nanoconfinement on Tg and the transition strength agree with results from studies using probe fluorescence and ellipsometry. The Tg-nanoconfinement effect is “tuned” by copolymer composition. As S-content is reduced from 100 mol% to 22 mol%, the confinement effect changes from a reduction to an enhancement of Tg relative to bulk Tg. Intrinsic fluorescence is also a powerful tool for characterizing relaxation of residual stresses. Stresses induced by spin coating affect local conformations, which in turn affect excimer and monomer fluorescence and thereby integrated intensity. The heating protocol needed to achieve apparently equilibrated local conformations is determined by equivalence in the integrated intensities obtained upon heating and subsequent cooling. While partial stress relaxation occurs upon heating in the glassy state, full relaxation of local conformations requires that a film be heated above Tg for times that are long relative to the average cooperative segmental relaxation time. For example, in thin and ultrathin films, equilibration is achieved by heating slowly (∼1 K/min) to 15-20 K above Tg. Dilute solution fluorescence of PS and S/MMA copolymers is also characterized and compared to reports in the literature. 相似文献
92.
Jeffrey R. Wank 《Powder Technology》2004,142(1):59-69
Experiments are conducted with alumina (Al2O3) deposition on a wide size range of hexagonal boron nitride (BN) platelet-like particles. Successful deposition of alumina films on these particles, with film thickness controllable at the Angstrom level, is observed based upon TEM imaging, ICP-AES, particle size distributions, and surface area analysis. While fluidizing, fine BN particles aggregate in the bed. The aggregates are the entities fluidizing, not the primary particles. However, individual particles are coated using Atomic Layer Deposition (ALD), not aggregates. Since ALD is a surface chemistry phenomenon, the films grow uniformly on every primary particle. BN particles are small platelets with different functional groups on the basal planes and edge planes. A small exposure to reagents [2.5×106 Langmuir (L) per reagent per cycle], will only coat the edge planes of uncoated BN particles. A larger dose of 1×108 L will coat the entire uncoated BN particle (edge and basal planes). After 10 ALD cycles of the 1×108 L dose, the exposures can be reduced to 1×106 L as the film is then growing on alumina and not BN. Peel strength data indicate that adhesion between the coated particles and a cured epoxy in a filled composite is ∼25% stronger than that of uncoated particles and the epoxy. The overall thermal conductivity drops ∼17% for an identical filler loading as expected due to the additional thermal resistance added by the film. However, the viscosity of an epoxy resin loaded with coated BN is as much as five times lower than that of the resin loaded with the same amount of uncoated BN. These results indicate that the loading of Al2O3 nanocoated BN particles in an epoxy matrix can be substantially increased relative to that of uncoated particles. The thermal conductivity of the more highly filled composite will be increased without adversely impacting filled resin viscosity or the peel strength of the cured material. This is the first reported study indicating that cohesive primary particles that fluidize as aggregates in a fluidized bed can be individually coated with a nano-thick ceramic film using ALD. 相似文献
93.
A thin circular film clamped at the periphery is adhered to the planar surface of a rigid cylindrical punch. An external tensile load is applied to the punch, causing the film to delaminate from the substrate and the circular contact edge to contract. The film spontaneously separates from the punch, or pulls off, when the contact radius reduces to a range between 0.1758 and 0.3651 of the film radius, depending on the magnitude of the residual membrane stress. The mechanical delamination process is derived by a thermodynamic energy balance based on a coupled interfacial adhesion and residual membrane stress. The theoretical model has significant implications in nanoforce measurement, microelectromechanical systems (MEMS) comprising active moveable films, and biological cell adhesion. 相似文献
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Sheng-Min Yang Yin-Yu Chang Da-Yung Wang Dong-Yih Lin WeiTe Wu 《Journal of Alloys and Compounds》2007,440(1-2):375-379
Ti1−xSixN coatings were synthesized by cathodic arc evaporation with plasma-enhancing filter duct, using Ti80Si20 alloy target as cathodes. Optical emission study revealed that excitation, ionization and charge transfer reactions of the Ti-Si-N plasma occurred during the Ti1−xSixN deposition process. The chemical content of Si varied from 3.3 to 6.0 at% in Ti1−xSixN depending on the nitrogen partial pressure of the reaction chamber. All the Ti1−xSixN coatings displayed a NaCl structure and a preferred (2 0 0) orientation parallel to the substrate surface. Among the studied Ti1−xSixN coatings, the Ti1−xSixN with 6 at.% Si possessed the highest hardness of 45 GPa and H3/E*2 ratio of 0.527 GPa, indicating the best resistance to plastic deformation. We found that the structure and mechanical properties of the Ti1−xSixN films were correlated with the nitrogen pressure and silicon content of the coatings. 相似文献
96.
影响薄壁球墨铸铁白口倾向和球墨数量的因素分析 总被引:1,自引:0,他引:1
研究了不同的冷却速度、稀土加入量、碳量、硅量、Si/C、Mn/S及孕育处理等工艺时薄壁球墨铸铁球墨数量和白口深度的影响。结果表明,随着冷却速率增加,薄壁球墨铸铁石墨小球越多,但容易产生白口。冷速较大时,加入稀土元素进行孕育和控制碳当量,可以有效的消除薄壁球墨铸铁的白口现象,当Si/C大于0.80、Mn/S大于20时薄壁件白口倾向较小。 相似文献
97.
The effect of substrate condition and annealing treatment on the surface morphology of sputter-deposited NiTi-based thin films was studied by means of atomic force microscope. It is found that the surface of the film deposited at 450 °C on a (100) Si wafer is composed of large island groups, consisting of islands of 150–300 nm in diameter. Annealing treatment at 400 °C results in a more homogeneous distribution of the island size. However, for the film deposited at 450 °C on a (111) Si wafer, its surface consists of more homogeneous islands, being about 200–250 nm in diameter. For the film deposited at 450 °C on a SiO2 buffer layer on top of the Si-substrate, the surface islands have ideal spherical shape. After annealed at 650 °C, the islands have grown to about 300 nm in width and 550 nm in length. The surface roughness of the deposited film is related not only to the island sizes but also to the island distributions. 相似文献
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