铜合金表面Ti/TiN多层膜的制备、结构及其性能

为了研究多层膜的腐蚀性能,促进多层膜在生产中的应用,采用电弧离子镀技术,通过调整环境N₂和Ar气的时间比例在铜衬底上成功制备了不同调制周期的Ti/TiN多层膜.利用x 射线衍射谱和交流阻抗谱研究了该多层膜的结构和腐蚀性能.表面形貌显示,沉积的Ti/TiN多层膜具有明显的周期性,环境中N2和Ar气的时间比例决定了多层膜的调制周期,N₂气时间越长,多层膜中TiN相层越厚.腐蚀性能测定表明,多层膜的调制周期影响其耐蚀性,当调制周期为550nm时,沉积膜的耐腐蚀性最好.     

Eu~(3+)含量对掺Eu~(3+)铝酸锌荧光粉晶体结构和发光性能的影响

采用改进的共沉淀法合成掺Eu3+铝酸锌荧光粉。对产物进行X射线衍射和发光性能分析。X射线衍射分析结果表明,在Eu3+掺杂质量分数低于5%时,掺Eu3+铝酸锌的结晶质量高;但当Eu3+掺杂质量分数高于5%时,会导致晶体结构缺陷的数目增加,从而引起结晶质量下降。不同掺杂浓度的荧光粉的发射光谱显示,当掺杂质量分数高于5%时,会出现浓度猝灭现象。与固相反应法相比,共沉淀法的猝灭浓度有明显提高。     

HCl酸洗伊利石增白改性实验

通过依次改变HCl浓度、反应时间、反应温度以分别确定HCL酸洗对伊利石增白效果的影响,并采用XRD、SEM和XPS等检测手段对伊利石原矿及增白效果较好的伊利石样品进行表征,以寻求伊利石白度增加的原因。实验表明:HCl酸洗在一定程度上可以增加伊利石白度,适当延长反应时间、增加反应温度以及提高HCl浓度有助于提高伊利石的白度。     

Porous Titania Thin Films Grown by Anodic Oxidation for Hydrogen Sensors

Porous titanium dioxide (Titania) thin films were grown by anodic oxidation using high purity (99.7%) titanium foil in a dilute sulphuric acid (1 M) medium. The anodization process was carried out for 30 minutes with 20 mA/cm² and 50 mA/cm² current densities. The samples were characterized by XRD, SEM, and AFM techniques. It was found that the grown porous titania films were less sensitive to 500 ppm hydrogen in air ambient below 300°C; however, the sensitivity and response behavior of the film at 300°C are very much dependent on the growth conditions. Particularly, the films grown at current density 50 mA/cm² and 1 M acid concentration exhibited the lowest response time of 151 sec at 300°C.     

碳滑板材料石墨化度XRD和Raman光谱研究

采用显微激光拉曼光谱及X射线电子衍射测量，摘要选用进口和国产滑板材料作为对比材料，并进行高温烧结处理。分析了试样的形貌和结构，并表征了不同碳滑板材料在高温烧结前后的结构参数。结果表明，两种表征方法的结果存在一致性；进口碳滑板材料的石墨化度高于国产滑板，且两种滑板材料都有不同的石墨相组成，不同相的石墨化度也不同；经过高温烧结处理，滑板材料的石墨化度提高。     

煤灰熔融过程中的矿物演变及其对灰熔点的影响

煤的结渣特性是影响电厂锅炉安全经济运行的主要因素之一。该文利用热分析方法和X-射线衍射物相分析对低灰熔点的神木煤(温家梁,TDT=1200℃)和高灰熔点的淮南煤(新庄,TDT>1500℃)煤灰在加热过程中矿物质的热行为及其演变进行了对比研究,2种煤灰的热分析曲线存在较大差异,它们的矿物质成分也随着温度升高发生了不同的转变,分别对其灰熔点产生了不同的影响。温家梁灰中大量存在的CaCO3、CaSO4为钙黄长石、钙长石的大量生成提供了条件,这2种矿物的低温共熔是温家梁煤灰熔点低的主要原因;新庄灰中大量生成的莫来石使得新庄灰的熔点很高。该文的对比研究为研究配煤解决锅炉结渣问题提供了新的思路。     

透明导电薄膜在不同衬底上的性能对比研究

为了对比研究不同透明衬底上ZnO:Al(ZAO)薄膜的性能,采用直流反应溅射法制备薄膜,并对其作EDS、XRD和电学测试分析.结果表明:所制备的ZAO薄膜具有典型的ZnO晶体结构;沉积在玻璃基片上的ZAO薄膜,Al,O含量高于沉积在透明聚酯塑料基片上的,而Zn的含量则相反;在两种衬底上获得的ZAO薄膜电阻率分别为4.5×10-4Ω*cm和9.73×10-4Ω*cm,可见光透射率分别达到87.7%和81.5%.由此可见:用直流反应磁控溅射法在不同衬底上都能获得可见光透射率达到80%以上的ZAO薄膜;相比而言,在玻璃衬底上获得的ZAO薄膜电阻率低,而在透明聚酯塑料上沉积的ZAO薄膜透射性好.     

Photocurrent enhancement of d.c. sputtered copper oxide thin films

Copper oxide (CuO) thin films with photocurrent as high as 25 μA/cm² were deposited on conductive glass substrates using d.c. reactive sputtering. This was the highest reported photocurrent for sputteredp- type copper oxide measured in the electrolyte KI. The photocurrent drastically increased up to 25 (μA/cm² as the sputtering pressure and the substrate temperature were increased up to 8.5 mbar and 192°C, respectively. All the synthesized films contained single phase of CuO in this range of pressure and substrate temperature. Variation of the photocurrent, photovoltage, structure and absorbance with deposition conditions were studied in detail.     

Correlations between the Optical Properties and the Microstructure of TiO_2 Thin Films Prepared by Reactive Electron-beam Evaporation

1　IntroductionInrecentyears ,theoreticalandexperimentalinvesti gationsonthetitaniumoxidefilmsareconductedonac countoftheirremarkableproperties .Titaniumdioxidefilmshaveattractedconsiderableattentiontoapplytomi croelectronicdevices ,opticalthin filmdevice…