Preparation and spectral analysis of gold nanoparticles using magnetron sputtering and thermal annealing

Gold(Au) nanoparticles were prepared on Au-fi lm-coated K9 glass and silicon substrates by direct current(DC) magnetron sputtering and thermal annealing treatment. The effects of substrate material, annealing temperature, and time on morphologies of Au nanoparticles were investigated, and the formation mechanism of Au nanoparticles was discussed. The experimental results indicate that silicon substrate is more suitable for the formation of Au nanoparticles. On a silicon substrate, Au nanoparticles formed with good spherical shapes at temperature over 700 ℃. It was also found by spectral analysis that the fi eld enhancement factor of the island-shaped Au particles was smaller than that of the granular Au particles; the better the spherical shape as well as the smaller the size and spacing of Au particles, the higher the light absorption rate; the absorption peak had a red shift with increasing particle size and spacing.     

反应磁控溅射MgO薄膜溅射模式的分形维表征

用反应磁控溅射的方法制备了MgO薄膜，基于原子力显微镜观测，并借助Fourier变换，计算了薄膜表面形貌的分形维数。发现分形维数变化对应于薄膜溅射模式的变化，二者之间有相关性，氧分压30％的分形维数是一个临界点，分形维数若发生明显跌落，意味着溅射模式发生变化，界于临界值两侧的分形维数，分别对应两种截然不同的溅射模式，与临界值对应的溅射状态则处于金属模式和氧化物模式的混和状态。     

Effects of ZrO2 on the structure and magnetic properties of CoPt thin films

[CoPt 1.5 ml/ZrO2 xnm]10 multilayer films were deposited on glass substrates by magnetron sputtering and then annealed in vacuum at 600℃ for 30 min. Their structures and magnetic properties were investigated as a function of ZrO2 content. The results show that the grain size and coercivity first increase and then decrease with the increase in ZrO2 content. The maximum coercivity and grain size are obtained at 37 vol.% of ZrO2. The content of ZrO2 in the film plays an important role in the separation of CoPt grains and in the reduction of intergrain exchange interaction. On the basis of the studies of angular dependent coercivity, it is found that the magnetization reversal of CoPt films with （111 ） texture is different from either the domain wall motion or the S-W type of rotation mode.     

Microstructure and mechanical properties of pulsed DC magnetron sputtered nanocomposite Cr-Cu-N thin films

The nanocomposite Cr-Cu-N thin films have been deposited at a substrate temperature of 250 °C by a bipolar asymmetric pulsed DC reactive magnetron sputtering process. Different Cu contents ranging from 0.4 to 14.9 at.% were achieved. The structures of Cr-Cu-N thin films were analyzed by XRD. The surface and cross sectional morphologies of thin films were examined by scanning electron microscopy (SEM) and transmission electron microscopy (TEM). The nanoindentation and scratch tests were adopted to evaluate the mechanical and tribological properties of Cr-Cu-N coatings. The influences of Cu content on the structure, mechanical and tribological properties of Cr-Cu-N coatings were explored. It is observed that the columnar structure no longer exists when the Cu content exceeds 10.9 at.%. The stability of CrN phase in the coating is influenced by the Cu content. The scratching coefficient of thin films decreases with increasing Cu content. Sufficient adhesion and tribological properties of Cr-Cu-N coatings are achieved. The maximum average hardness around 20 GPa and scratching coefficient around 0.1 are found in the coatings with around 2.1 to 2.6 at.% Cu in this work.     

Microstructure, mechanical and tribological properties of Cr1−xAlxN films deposited by pulsed-closed field unbalanced magnetron sputtering (P-CFUBMS)

Nanocrystallized Cr_1−xAl_xN films with various Al contents (0 to 68 at.%) were deposited by pulsed closed field unbalanced magnetron sputtering (P-CFUBMS). The effects of aluminum content on the microstructure, mechanical and tribological properties of the Cr_1−xAl_xN films have been investigated. It was found that the hardness and elastic modulus of Cr_1−xAl_xN films increased with increasing Al contents in the films and reached the highest value of 36 GPa and 370 GPa, respectively, at an Al content of 58.5 at.%. Addition of Al beyond 64.0 at.% resulted in a change in crystal structure from B1 cubic to B4 hexagonal phase. The wear resistance improved gradually with the increase of Al in the Cr_1−xAl_xN films. A combination of the abrasive and adhesive wear mechanism was proposed based on the SEM and EDS analysis of the wear track. The steady state dry coefficient of friction measured against a WC ball for the Cr_1−xAl_xN films were in the range of 0.36-0.55, and the wear rate was in the 10^− 6 mm³ N^− 1 m^− 1 range.     

THE EFFECTS OF SPUTTERING POWER ON STRUCTURE AND ELECTRICAL PROPERTIES OF Cu FILMS

1. IntroductionCu filnls are very pron1isillg for electronic devices because of both high electromigrationresista11ce alld high electrical conductivity['--']. For a sputter-deposited film, base pressure,deposition rate, substrate temperature and energetic…     

Preparation and optical properties of Nb-NbN multilayer films as solar selective absorptive coatings

Based on the cermet double layer structure, Nb-NbN multi-layer films for solar selective coatings were deposited by direct current reactive magnetron sputtering. The Nb/Nb-NbN/Al2O3 trilayered structure was deposited on a stainless steel (SS) substrate by using a single niobium target. The expected components were adjusted by changing the gas flowing ratios of Ar: N2. The Al2O3 antireflective layer on the top of the film was produced by r. f. magnetron sputtering using Al2O3 ceramic target. A solar absorptivity of 0.94 and a normal emissivity of 0.16 at room temperature have been achieved for the coating. Thermal vacuum aging to the samples was carried out at 350 and 500 ℃ for 1 h. The results show a good thermal stability. Microstructure and its dependence on temperature of the Nb, NbN and Nb-NbN single layers were investigated, respectively.     

High temperature oxidation of a (Cr2N−Mo2S3)/Cr double-layered coating deposited on steel by D.C. magnetron sputtering

A coating consisting of (Cr₂N−Mo₂S₃) overlay coating and an underlying Cr coating was deposited on a steel substrate by D.C. magnetron sputtering. The oxidation characteristics of the deposited double-layered coating were studied at temperatures ranging from 400 to 900 °C in air. The oxidation product was primarily Cr₂O₃. The unreacted coating beneath the oxide scale had some dissolved oxygen, sulfur, and iron. Oxidation of the coating occurred via complex routes such as the outward diffusion of chromium and nitrogen from Cr₂N and iron from the substrate, and the inward transport of oxygen from air, chromium from Cr₂N, and S from Mo₂S₃. This counter diffusion of various ions occurred easily via fine crystallites that constituted the coating, which had some solubility of S, O, and Fe.     

Ti衬底层对FePt颗粒膜的微结构和磁特性的影响

在室温下,应用对靶直流磁控溅射设备在普通玻璃基片上制备了FePt(30nm)/Ti(tnm)颗粒膜样品,随后,在真空中进行了原位退火.详细研究了Ti衬底层对FePt颗粒膜的微结构和磁特性的影响.X射线衍射图谱表明样品形成了较有序的L10织构,Ti和FePt形成了三元FePtTi合金.当Ti层厚度t=5 nm、退火温度Ta=500℃时,样品具有高度有序的L10织构、小的颗粒尺寸和优异的磁特性.矫顽力超过了6.7 kOe,饱和磁化强度为620emu/cc.并且具有较小的开关场分布.结果表明FePt/Ti颗粒膜系统可作为超高密度磁记录介质的候选者.     

Fabrication of ZnO films by radio frequency magnetron sputtering and annealing

ZnO thin films were deposited on Si（111） substrates through a radio frequency （rf） magnetron sputtering system. Then the samples were annealed at different temperatures in air ambience and ammonia ambience respectively. The structure and composition of the ZnO films were studied by X-ray diffraction （XRD） and X-ray photoelectron spectroscopy （XPS）. The morphology of the samples was studied by scanning electron microscopy （SEM）. Measured results show that ZnO films with hexagonal wurtzite structure were grown on Si（111） substrates when annealed in the two ambiences. The volatilization process of ZnO in the ammonia ambience at high temperature was discussed and the mechanism of the reaction was analyzed.