Subnanometer Analysis and Modeling of MBE Grown InP Based MODFETs

InGaAs/InAlAs double-doped double-strained modulation-doped field-effect transistors OD-SMODFETs)1 were grown by solid source molecular beam epitaxy. The structures were characterized using high resolution x-ray diffraction, Hall effect, and cross-sectional scanning tunneling microscopy. A record two-dimensional electron gas (2DEG) sheet density of 8.5 × 10¹²/cm² and 8.1 × 10¹²/cm² for 300 and 77K, respectively, was achieved. The mobility was 6500 and 12000 cm²/ Vs for 300 and 77K, respectively. To the author’s knowledge,² the previous record 2DEG result was 6.58 × 10¹²/cm². The electron mobility was limited by alloy scattering and interface roughness caused by the presence of “clustering.” Using cross-sectional scanning tunneling microscopy to verify the presence of these clusters, we have the first images of the lattice matched InAlAs (spacer)-InGaAs (quantum well) interface. These images reveal clusters that have approximate spherical or cylindrical shapes with equivalent cubic dimensions ranging from 25 to 45Å.     

继电器簧片气隙的激光校正试验研究

叙述了激光校正的基本原理，制作了相应的激光校正测试试验台。在该试验台上对继电器金属簧片进行了大量的校正测试，结果表明，激光测量点到激光校正点的间距x2与校正量h之间近似成正比例线性关系；激光功率P恒定时，激光照射时间t越长，校正量h也越大，但时间延长到某一数值后，有拐点出现，此后校正量h随时间t的延长而减小；在激光能量状态E相同的情况下，功率P越大，时间t越短，获得的校正量h越大；同一点处多次连续的激光照射并不能获得更大的校正量，只是浪费激光功率和工作时间。     

Geometrical design of thin film photovoltaic modules for improved shade tolerance and performance

Partial shading in photovoltaic modules is an important reliability and performance concern for all photovoltaic technologies. In this paper, we show how cell geometry can be used as a design variable for improved shade tolerance and performance in monolithic thin film photovoltaic modules (TFPV). We use circuit simulations to illustrate the geometrical aspects of partial shading in typical monolithic TFPV modules with rectangular cells, and formulate rules for shade tolerant design. We show that the problem of partial shading can be overcome by modifying the cell shape and orientation, while preserving the module shape and output characteristics. We discuss two geometrical designs with cells arranged in radial and spiral patterns, which (i) prevent the reverse breakdown of partially shaded cells, (ii) improve the overall power output under partial shading, and (iii) in case of spiral design, may additionally improve the module efficiency by reducing sheet resistance losses. We compare these designs quantitatively using realistic parameters and discuss the practical aspects for their implementation. Copyright © 2013 John Wiley & Sons, Ltd.     

旋转气流控制激光切割特种钢薄板

以氧为辅助气体的激光切割工艺切割不锈钢等特种钢板时容易产生挂渣现象,因此大多采用高压高纯度氮气或惰性气体辅助激光切割不锈钢。在对熔渣形成原因及规律进行实验研究的前提下,提出了仍以氧辅助切割以降低激光切割功率,通过在工件底部加设旋风除渣器,形成旋转气流控制熔渣流向以去除熔渣的方法。实验证明,当同轴辅助切割气体为氧气,气体压力降低为300 kPa,旋转气流引导装置气体压力为100 kPa,激光功率为500 W,模式为TEM01,焦点位于0.5 mm厚硅钢片工件上表面,切割速度为3 m/min时,可获得光滑的高质量切口。     

用单片法测量不同工况下非晶合金带材的工频磁性能*

阐述了软磁材料磁性能测量使用的单片测试方法,包括电流法和H-coil法。采用单片H-coil法对不同工况下非晶合金带材的工频磁性能进行测试,对比正弦工况与谐波工况条件下的磁性能变化差异。     

Sensitivity analysis of ion implanted silicon wafers after rapid thermal annealing

In this study, we have investigated sensitivities of the ion implanted silicon wafers processed by rapid thermal annealing (RTA), which can reveal the variation of sheet resistance as a function of annealing temperature as well as implantation parameters. All the wafers were sequentially implanted by the arsenic or phosphorous implantations at 40, 80, and 100 keV with the dose level of 10¹⁴ to 2 × 10¹⁶ ions/cm². Rapid thermal annealing was carried out for 10 s by the infrared irradiation at a temperature between 850 and 1150°C in the nitrogen ambient. The activated wafer was characterized by the measurements of the sheet resistance and its uniformity mapping. The values of sensitivities are determined from the curve fitting of the experimental data to the fitting equation of correlation between the sheet resistance and process variables. From the sensitivity values and the deviation of sheet resistance, the optimum process conditions minimizing the effects of straggle in process parameters are obtained. As a result, a strong dependence of the sensitivity on the process variables, especially annealing temperatures and dose levels is also found. From the sensitivity analysis of the 10 s RTA process, the optimum values for the implant dose and annealing temperature are found to be in the range of 10¹⁶ ions/cm² and 1050-1100°C, respectively. The sensitivity analysis of sheet resistance will provide valuable data for accurate activation process, offering a guideline for dose monitoring and calibration of ion implantation process.     

全断面混凝土衬砌钢模台车的应用

羊湖电站引水隧洞总长５８８３ｍ,为φ２．５ｍ的圆形有压隧洞,全线采用钢筋混凝土衬砌。施工区空气稀薄,严重缺氧,气候寒冷。混凝土衬砌采用φ２．５ｍ全断面钢模台车进行,混凝土由洞外拌和系统拌和,有轨运输进洞,混凝土泵送入仓。全断面钢模台车由钢模、台车和外部支撑三部份组成,钢模的构成方式为“三铰两缝式”。本文介绍了羊湖水站引水隧洞混凝土衬砌中应用φ２．５ｍ全断面钢模台车的使用情况和施工方法。     

激光冲击波在铝合金薄板中传播特性研究

为了研究激光冲击波在铝合金薄板中的传播特性,采用数值仿真的方法,分析了不同节点路径下,冲击波在3003铝合金薄板中的传播特性。研究结果表明,激光加载初期,板料表面光斑边缘位置处应力最大,而板料表面中心区域仅为较小的波动,1000 ns后,表面波传播至板料上的凹模口对应位置,同时中心位置区域应力增大至200 MPa,塑性变形加大,板料变形不均匀,易出现减薄失效问题;沿激光冲击方向,经历60 ns压力波传播至板料自由面,并回传拉伸波,在102 ns左右,拉应力达到最大值1782 MPa,板料易出现层裂失效问题。因此针对激光冲击波在铝合金薄板中传播特性的研究对提高铝合金薄板激光冲击成形性能具有重要的意义。     

高精密度液体感光树脂凸版(液体版)的工艺研究

提出一种制作LCD用高精密度网点液体版的方案，通过接近式曝光理论分析和采用特殊的工艺方法，使得网点的浮雕结构合理，获得了高分辨率、高均匀性的网点结构，从而可印刷出不同厚度且膜层均匀的PI定向膜。     

脉冲激光冲击LY12CZ铝合金成形的实验和数值模拟

激光冲击板料变形是利用高能脉冲激光和材料相互作用诱导的高幅冲击波的力效应使板料产生塑性变形的新技术。本文利用钕玻璃强激光对厚度为1,2mm的LY12CZ铝合金板料进行了激光单点冲击成形的实验。利用ABAQUS软件对激光单点冲击成形过程进行了数值模拟,探讨了激光冲击次数和板料成形之间的关系,得出它们之间的关系曲线,为激光多点冲击成形奠定了基础,以及为实现板料复杂形状的激光冲击成形提供理论依据。