Transparent p-type conducting K-doped NiO films deposited by pulsed plasma deposition

Transparent p-type conducting K-doped NiO thin films were prepared by pulsed plasma deposition. The structural, electrical and optical properties of the films were investigated using X-ray diffraction, atomic force microscope, X-ray photoelectron spectroscopy, Hall measurement, and ultraviolet-visible spectroscopy, respectively. The dependency of film properties on K doping content and substrate temperature was studied. The film with K doping content of 25 at.% deposited at room temperature exhibits the highest conductivity of 4.25 S cm^− 1 and an average transmittance of nearly 60% in visible light region.     

梯度掺杂生长绒面结构ZnO:B-TCO薄膜及其特性研究

采用新的金属有机化学气相淀积(MOCVD)-ZnO镀膜工艺技术-梯度掺杂技术生长绒面结构。研究ZnO:B-TCO薄膜。结果表明,梯度掺杂技术可有效增加薄膜晶粒尺寸和提高光散射作用。并且,梯度掺杂技术有效地提高了薄膜在近红外区域的光学透过率,有利于应用于宽谱域薄膜太阳电池。生长获得的MOCVD-ZnO薄膜,其薄膜电子迁移率为24 cm2/V,电阻率为2.17×10-3Ω.cm,载流子浓度为1.20×1020cm-3,且在小于1 000 nm波长范围内的平均透过率大于85%。     

Transparent conductive oxide‐less three‐dimensional cylindrical dye‐sensitized solar cell fabricated with flexible metal mesh electrode

A cylindrical transparent conductive oxide‐less dye‐sensitized solar cell (DSSC) consisting of glass tube/stainless steel mesh–TiO₂–dye/gel electrolytes/Pt‐Ti rod having capability of self‐light trapping is reported. Replacing the glass tube with heat‐shrinkable tube to reduce electrolyte gap and optical loss due to light transmission and reflection led to the enhancement in the power conversion efficiency from 2.61% to 3.91%. Profiling of the current distribution measured by laser beam‐induced current exhibited nearly the same current in the axial and radial directions, suggesting that light reflection on a cylindrical DSSC does not affect the efficiency seriously. Optimized best DSSC in this novel device architecture gave a short‐circuit current density of 11.94 mA/cm², an open‐circuit voltage of 0.71 V and a fill factor of 0.66 leading to the power conversion efficiency of 5.58% at AM 1.5 under simulated solar irradiation. Copyright © 2011 John Wiley & Sons, Ltd.     

磁控溅射法沉积TCO薄膜的电源技术

电源在磁控溅射法制备透明导电氧化物(TCO)薄膜的技术中起着重要的作用。本文重点介绍了磁控溅射TCO薄膜的电源技术发展现状及进展,首先简要说明了目前应用最广泛的直流电源技术及具备灭弧能力的脉冲电源技术的原理和主要优缺点。进一步的,介绍了具备快速灭弧补偿功能的新型直流电源技术和模块化电源技术。最后进一步分析了代表新一代技术的高功率脉冲磁控溅射(HPPMS)电源的基本原理和优良特性,并指出其发展所面临的挑战。     

Properties of indium tin oxide films deposited using High Target Utilisation Sputtering

Indium tin oxide (ITO) films were deposited on soda lime glass and polyimide substrates using an innovative process known as High Target Utilisation Sputtering (HiTUS). The influence of the oxygen flow rate, substrate temperature and sputtering pressure, on the electrical, optical and thermal stability properties of the films was investigated. High substrate temperature, medium oxygen flow rate and moderate pressure gave the best compromise of low resistivity and high transmittance. The lowest resistivity was 1.6 × 10^− 4 Ω cm on glass while that on the polyimide was 1.9 × 10^− 4 Ω cm. Substrate temperatures above 100 °C were required to obtain visible light transmittance exceeding 85% for ITO films on glass. The thermal stability of the films was mainly influenced by the oxygen flow rate and thus the initial degree of oxidation. The film resistivity was either unaffected or reduced after heating in vacuum but generally increased for oxygen deficient films when heated in air. The greatest increase in transmittance of oxygen deficient films occurred for heat treatment in air while that of the highly oxidised films was largely unaffected by heating in both media. This study has demonstrated the potential of HiTUS as a favourable deposition method for high quality ITO suitable for use in thin film solar cells.     

Fabrication of IZO transparent conducting thin films by the use of magnetron sputtering equipped with ion‐beam system

Abstract— Indium zinc oxide (IZO) thin films have been prepared on glass, polycarbonate (PC), and polyethylene terephthalate (PET) substrates by using a radio‐frequency (RF) magnetron sputtering system equipped with an ion gun, and a simple OLED device was made by using IZO film. The influence of the RF power, the Ar gas volume, and the substrate temperature during the deposition process on the roughness and the electrical and optical properties of the films have been investigated. In addition, End‐Hall ion‐beam treatment of the substrates is applied before the sputtering deposition process. The sheet resistance of the IZO films is 25 Ω/□ for the glass, 21 Ω/□ for the PC, and 20 Ω/□ for the PET substrate with a thickness of 150 nm, and the lowest root‐mean‐square (rms) roughness of these IZO films were measured to be 0.58, 0.35, and 0.32 nm for glass, PC, and PET substrate, respectively. The decrease in the sheet resistance of the IZO films becomes evident after the ion‐beam treatment and makes the surface of the thin film more hydrophilic. Relative to non‐treated IZO film, the ion‐beam‐treated IZO anode in the OLED device seems to inject holes into the emitting layer to enhance the current density.     

Wearable 4‐in. QVGA full‐color‐video flexible AMOLEDs for rugged applications

Abstract— Work on the world's first wrist‐worn communications device built on a flexible, low‐power‐consumption full‐color AMOLED using phosphorescent OLEDs is presented. The device offers the wearer the ability to see high‐information‐content video‐rate information in a thin‐and‐rugged‐form‐factor 4‐in. QVGA display, conformed around a human wrist.     

TCO解决方案在高校计算机实验室的应用

本文作者通过一个高校计算机实验室应用传统模式的维护、管理与采用了TCO解决方案之后的维护、管理的对比分析,认为传统模式费时、费力而且不能很好的完成实验教学;采用TCO解决方案,虽然初期投资可能增加,但寿命周期成本会大大降低,且极大的提高工作效率和减轻实验室工作人员的劳动强度,同时,取得良好的实验教学效果.     

Shape Controlled Plasmonic Sn Doped CdO Colloidal Nanocrystals: A Synthetic Route to Maximize the Figure of Merit of Transparent Conducting Oxide

The synthesis of different anisotropic shaped (eight different shapes) Sn⁴⁺ doped CdO (Sn:CdO) colloidal nanocrystals (NCs) by precise tuning of precursor reactivity and proper choice of capping agent is reported. In all these systems, formation of Sn:CdO quantum dots (QDs) of 2–3 nm is identified at very early stage of reaction. The colloidally stable QDs act as a continuous source for the formation of primary nanoparticles that can be transformed selectively into specific type of nanoparticle morphology. The specific facet stabilization of fcc (face centered cubic)CdO is predicted by particular choice of ligand. Fine tuning of plasmonic absorbance band can be achieved by variation of Sn⁴⁺ doping concentration. Different anisotropic Sn:CdO NCs exhibit interesting shape dependent plasmonic absorbance features in NIR region. High quality crack free uniform dense thin film has been deposited on glass substrate to make high quality transparent conducting oxide (TCO) coatings. figure of merit of TCO can be maximized as high as 0.523 Ω^?1 with conductivity of 43 600 S cm^?1 and visible transmittance of ≈85% which is much higher than commercially available tin doped indium oxide and other transparent electrodes.     

P-type SnO thin films prepared by reactive sputtering at high deposition rates

SnO is an ideally suitable p-type conductive material, with large hole mobility, and has attracted great interest in connection with next-generation electronic applications. In the present work, tin oxide (SnO_x) thin films were deposited on unheated soda lime glass substrates by reactive DC sputtering from a pure Sn target. The structural, optical and electrical properties of the films were analysed as a function of the oxygen partial pressure in the sputtering atmosphere and of the post-deposition annealing temperature in air. A structural analysis was carried out using Raman spectroscopy and X-ray diffraction. Optical and electrical characterizations were performed using photo-spectrometry and Hall effect measurements, respectively. The films grown at room temperature and low oxygen pressures reached high deposition rates of above 45 nm/min, showing poorly crystalline SnO and low transparency. Subsequent heating to 350 °C allowed to achieve a more crystalline tetragonal SnO with an average visible transmittance of 65%, a p-type conductivity of 0.8 S/cm, and a hole mobility of 3.5 cm²/(V s).