Investigation into polishing process of CVD diamond films

A new technique used for polishing chemical vapor deposition (CVD) diamond films has been investigated, by which rough polishing of the CVD diamond films can be achieved efficiently. A CVD diamond film is coated with a thin layer of electrically conductive material in advance, and then electro-discharge machining (EDM) is used to machine the coated surface. As a result, peaks on the surface of the diamond film are removed rapidly. During machining, graphitization of diamond enables the EDM process to continue. The single pulse discharge shows that the material of the coated layer evidently affects removal behavior of the CVD diamond films. Compared with the machining of ordinary metal materials, the process of EDM CVD diamond films possesses a quite different characteristic. The removal mechanism of the CVD diamond films is discussed.     

Characterization and optimization of copper chemical mechanical planarization

The feature scale planarization of the copper chemical mechanical planarization (CMP) process has been characterized for two copper processes using Hitachi 430-TU/Hitachi T605 and Cabot 5001/Arch Cu10K consumables. The first process is an example of an abrasive-free polish with a high-selectivity barrier slurry, while the second is an example of a conventional abrasive slurry with a low-selectivity barrier slurry. Copper fill planarization has been characterized for structures with conformal deposition as well as with bumps resulting from bottom-up fill. Dishing and erosion were characterized for several structures after clearing. The abrasive-free polish resulted in low sensitivity to overpolish and low saturation levels for dishing and erosion. Consequently, this demonstrated superior performance when compared to the International Technology Roadmap for Semiconductors (ITRS) 2000 roadmap targets for planarization. While the conventional slurry could achieve the 0.13-μm technology node requirements, the abrasive-free polish met the planarization requirements beyond the 0.10-μm technology node.     

锰铜基高阻尼合金中锌量的测定──硫氰酸盐萃取分离络合滴定法

基于甲基异丁基甲酮于稀盐酸介质中定量地萃取Ｚｎ￣（２＋）与ＣＮＳ￣－形成的络阴离子。从而达到与共存的锰、镍、铝、铬的完全分离。在有氟化物、硫脲存在时Ｆｅ￣（３＋）、Ｃｎ￣（２＋）和Ａｇ￣＋也不被萃取。有机相中的锌于ＰＨ５．５“六胺”缓冲介质中返萃取回水相，用ＥＤＴＡ滴定。在文中给定的条件下锌的一次被萃取率可达９９％以上，成功地解决了锰铜基高阻尼合金中共存离子对锌量测定的干扰问题。     

冶金过程中复杂夹杂物和钢液化学平衡计算

本文提出一个同温冶炼过程中预测非金属夹杂物沉淀的计算机程序。本研究中，多元硅酸盐溶体的Ｇｉｂｂｓ自由能由基于统计热力学的晶胞模型来计算，该晶胞模型按照氧与周围的阳离子构成的对称和非对称晶胞来描述硅酸盐熔体结构，假定高温冶炼时认与非金属夹杂物平衡，钢液中氧化物元素的活度由Ｗａｇｎｅｒ交互作用系数来计算，利用本程序可以估计炼钢时沉淀的非金属氧化物的成分，为调整冶炼工艺和提高产品质量提供指导，进一步可计     

中国古典园林三维造型研究

论述了采用层次结构化及参数化三维造型方法，建立一个以造型函数库为核心，从而构造各类、各级园林景观构件表面模型的方法和过程。对于某些非建筑类的园林配景构件，采用了Ｆｒａｃｔａｌ方法进行造型。     

教学动画制作系统Movie-Maker

Ｍｏｖｉｅ－Ｍａｋｅｒ是一个集成化的适合于结构化图形的教学动画制作工具，它具有较强的功能和通用友好的用户界面，可望为ＣＡＩ的发展作出较大贡献。本文主要阐述该系统的设计思想和总体结构。     

ATMOSPHERIC DEPOSITION OF CHEMICAL SPECIES TO POLAR SNOW

Particles and gases can deposit from the atmosphere to polar snow by several mechanisms. Dry deposition can be considered to consist of three steps: aerodynamic transport from the free atmosphere to the viscous sublayer near the surface, boundary layer transport across the sublayer, and interactions with the surface. The particle dry deposition mass flux is dominated by the largest particles present in a size distribution. Wet deposition includes in-cloud and below-cloud scavenging, where the former refers to uptake of particles during nucleation of cloudwater as well as scavenging of particles and gases by existing droplets and ice crystals. Of all the wet deposition mechanisms, nucleation scavenging is often the most important mechanism for particles in the polar regions. Finally, incorporation of particles and gases into fog droplets and subsequent settling of the fog to the snow surface can be an important removal process in regions of frequent fog. For Summit, Greenland, the total deposition of MSA, SO₄^2-, Na⁺, K⁺, and Ca²⁺ during May 24-July 13, 1993 was dominated by wet deposition: this mechanism accounted for an average of 62% of the total deposition for these species. Fog and dry deposition accounted for 21% and 17% of the total, respectively. These results suggest that all three mechanisms may need to be considered when estimating total deposition of certain chemical species to polar snow.     

液闪效率示踪法校正效果的评价

本文评价了Aloka商品液闪仪效率示踪法dpm校正的效果。轻,中度猝灭校正效果理想,具有简便、实用和适用性广泛的特点。严重化学和颜色猝灭样品的校正结果分别随猝灭增加而向增大和减小的方向偏离,形成喇叭状曲线,文中对这一现象给出初步解释。     

我国化学工业产业技术政策研究与思考(要点)

简要分析了我国化工产业技术发展的现状、背景 ,提出了“十五”期间我国化学工业产业技术发展的重点和政策措施     

莲心中可溶性成分的有效提取

采用不同的原料处理,改变提取的流程和提取时间，测定不同条件下所得提取液的可见吸收光谱，以此反映各提取液的组分和浓度是否发生变化，并比较在最大吸收波长下各提取液的吸光度大小，从而确定将莲心捣碎后，加热回流时间为60min的提取方法效果最佳。