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101.
真空熔炼AZ91镁合金过程中Mg元素的蒸发行为 总被引:2,自引:0,他引:2
在真空Ar气氛中熔炼AZ91镁合金,测定了不同精炼温度下Mg元素的蒸发速率。结果表明,随着精炼温度的升高,Mg元素的蒸发量增大。通过计算可知,Mg的蒸气压是Al的10^9倍,是Zn的46倍,因此主要是Mg的蒸发而导致合金其他元素含量升高。XRD分析表明,蒸发物是Mg元素。结合Mg元素的蒸发机制,在该试验条件下推导出Mg元素蒸发率的计算公式以及Mg元素的表观传质系数、蒸发率与精炼温度的关系,计算得出Mg元素蒸发率为0.86×10^-3-1.35×10^3g/cm^2·s,Mg元素的表观传质系数在2×10^-5-24×10^-5cm/s范围内。 相似文献
102.
103.
The melting, evaporation and oxidation behaviors as well as the solidification phenomena of tungsten and molybdenum in induction plasma were studied. Scanning electron microscopy was used to examine the morphology and the cross section of plasma-processed powders. X-ray diffraction was used to analyze the oxides formed on the particle surface of these two metals. The influence of spray chamber pressure on the spheroidization and oxidation phenomena was discussed. The results show that fewer Mo particles than W particles are spheroidized at the same powder feed rate under the same plasma spray condition although molybdenum has a lower melting point. A small fraction of tungsten is evaporized and condensed either on the surface of tungsten particles nearby or on the wall of spray chamber. Tungsten oxides were found in tungsten powder processed under soft vacuum condition. Extremely large grains form inside some spheroidized particles of tungsten powder. 相似文献
104.
Effect of surface modification of metal hydride electrode on performance of MH/Ni batteries 总被引:1,自引:0,他引:1
A novel method was applied to the surface modification of the metal hydride(MH)electrode of MH/Ni batteries.Both sides of the electrode were plated with a thin silver film about 0.1μm thick using vacuum evaporation plating technology,and the effect of the electrode on the performance of MH/Ni batteries was examined.It is found that the surface modification can enhance the electrode conductivity and decrease the battery ohimic resistance.After surface modification,the discharge capacity at 5C(7.5A)is increased by 212 mA.h and the discharge voltage is increased by 0.11 V,the resistance of the batteries is also decreased by 32%.The batteries with modified electrode exhibit satisfactory durability.The remaining capacity of the modified batteries is 89%of the initial capacity even after 500 cycles.The inner pressure of the batteries during overcharging is lowered and the charging efficiency of the batteries is improved. 相似文献
105.
106.
A series of Co/Si/(Co/Cu/Co) multilayers and Co/Si/Co sandwiches were prepared by high vacuum electron-beam evaporation. It was found that a Si spacer (≥0.9 nm) could greatly decrease the interlayer coupling in Co/Si/Co sandwiches and there was no magnetoresistance(MR) or spin-valve MR in them due to the high resistivity of Si spacer. While in Co/Si/(Co/Cu/Co) multilayers, we observed a spin-valve MR of about 0.5% through a nominal 2.7 nm Si spacer at room temperature. The spin-valve MR in Co/Si/(Co/Cu/Co) multilayers was attributed to the enhanced spin polarization of conduction electrons caused by the top Co/Cu/Co sandwich with GMR mechanism and high spin-dependent scattering at Co/Cu interface. 相似文献
107.
薄膜厚度对HfO2薄膜残余应力的影响 总被引:1,自引:0,他引:1
HfO2薄膜是用电子束蒸发方法制备的,利用ZYGO干涉仪测量了基片镀膜前后曲率半径的变化,计算了薄膜应力。对样品进行了XRD测试,讨论了膜厚对薄膜残余应力的影响。结果发现不同厚度HfO2薄膜的残余应力均为张应力,应力值随薄膜厚度的增加而减小,当薄膜厚度达到一定值后,应力值趋于稳定。从微观结构变化对实验结果进行了分析,发现微结构演变引起的本征应力变化是引起薄膜残余应力改变的主要因素。 相似文献
108.
We report the stress relaxation behavior of arc-evaporated TiCxN1−x thin films during isothermal annealing between 350 and 900°C. Films with x=0, 0.15, and 0.45, each having an initial compressive intrinsic stress σint=−5.4 GPa, were deposited by varying the substrate bias Vs and the gas composition. Annealing above the deposition temperature leads to a steep decrease in the magnitude of σint to a saturation stress value, which is a function of the annealing temperature. The corresponding apparent activation energies for stress relaxation are Ea=2.4, 2.9, and 3.1 eV, for x=0, 0.15, and 0.45, respectively. TiC0.45N0.55 films with a lower initial stress σint=−3 GPa, obtained using a high substrate bias, show a higher activation energy Ea=4.2 eV. In all the films, stress relaxation is accompanied by a decrease in defect density indicated by the decreased width of X-ray diffraction peaks and decreased strain contrast in transmission electron micrographs. Correlation of these results with film hardness and microstructure measurements indicates that the stress relaxation is a result of point-defect annihilation taking place both during short-lived metal-ion surface collision cascades during deposition, and during post-deposition annealing by thermally activated processes. The difference in Ea for the films of the same composition deposited at different Vs suggests the existence of different types of point-defect configurations and recombination mechanisms. 相似文献
109.
Graded and multilayered AlxTi1−xN nanocrystalline coatings were synthesized by using cathodic-arc evaporation (CAE) process. Ti33Al67 and Ti50Al50 alloy cathodes were used for the deposition of AlxTi1−xN nanocrystalline coatings with different Al/(Ti+Al) ratios. Optical emission spectra of the plasma species including atomic and ionized Ti, atomic Al, excited and ionized nitrogen (N2 and N2+) revealed that the excitation, ionization and charge transfer reactions of the Al-Ti-N plasma occurred during the AlxTi1−xN coating process. A preferred (111) orientation was shown in the Al0.67Ti0.33N with high Al/(Ti+Al) atomic content ratio (0.63) and small grain size (29 nm). The graded Al0.67Ti0.33N/TiN possessed the highest hardness of Hv25 g 3850 ± 180. However, the multilayered Al0.67Ti0.33N/TiN coating supported a longer tool life with lower residual stress. It has been found that the wear performance and mechanical properties of the films were correlated with the Al/(Ti+Al) content ratio and multilayered structure. 相似文献
110.