封隔器胶筒接触应力分布有限元计算

利用ANSYS软件对3种封隔器胶筒的接触应力进行了有限元计算，得到了接触应力沿胶筒轴向的分布情况。比较不同结构封隔器胶筒在相同条件下的接触应力分布，可知新型封隔器胶筒在高压下接触应力分布更为均匀合理，具有较好的应用前景。     

超薄氧化层中的中性陷阱对隧穿电流的影响和应变诱导漏电流

用数值分析的方法讨论了中性陷阱对超薄场效应晶体管(MOSFET )隧穿电流的影响.中性陷阱引起势垒的变化在二氧化硅的导带中形成一个方形的势阱.对于不同的势垒变化,计算了电子隧穿氧化层厚度为4nm的超薄金属氧化物半导体结构的电流.结果表明,中性陷阱对隧穿电流的影响不能被忽略,中性陷阱的存在使隧穿电流增加,并且通过这个简单的模型能够理解应变诱导漏电流的产生机制.     

推进波作用下的底泥起动

在介绍推进波作用下底泥起动特点的基础上，将上层水体作为粘性流体，底泥作为粘弹性体，推导了推进波作用下泥床面剪应力的表达式，并根据试验结果，给出了推进波作用下底泥起动时的床面剪应力与底泥流变参数的关系。     

Residual stress measurements in bevel gear after different production phases

This article discusses residual stress measurements by means of electrochemical removal of material layers with residual stresses and simultaneous measurement of strain on the opposite specimen side with strain gages. Exact measurements are impossible particularly because of the small bevel gear module. With the method presented, the average residual stresses in the tooth root plane and underlying layers are measured. Residual stress distribution after each consecutive production phase is plotted and analyzed. Residual stress measurements enable the engineer to adequately assess each individual production phase and by that improve the quality of the complete production process.     

Non-destructive evaluation of residual stresses in thin films via x-ray diffraction topography methods

Quantitative x-ray diffraction topography techniques have been used to measure the residual strain magnitude and uniformity of deposition for Mo and W sputtered films on Si(100) substrates. High sensitivity rocking curve measurements were able to determine differential strains for films as thin as 2.5 nm; while Bragg angle contour mapping had similar sensitivity and was also able to assess coating uniformity and stress distribution over areas covering a whole wafer. Measurements of strain versus film thickness over a range of 2.5 nm to 80 nm showed that a critical thickness exists for maximum residual strain. Growth beyond this range produces stress relaxation. This non-destructive type of analysis could be employed on a wide range of film-substrate combinations.     

Effects of shear flow on long-ranged correlations,spinodal demixing kinetics,and the location of the critical point and cloud point

A derivation of an expression for the shear rate-dependent Ornstein Zernike structure factor is discussed, together with the resulting anomalous behavior of the turbidity. The predicted scaling behavior of the turbidity, comprising the effect of both temperature and shear rate, is in good agreement with experiments on binary fluids. Then initial spinodal decomposition is discussed, and an explicit expression for the time- and shear rate-dependent effective diffusion coefficient is derived, which shows all the typical characteristics of anisotropic light scattering patterns that are observed experimentally for binary fluids. Next it is shown that the spinodal is shifted linearly with the (bare) Peclet number for not too large Peclet numbers, whereas the cloud point is singularly displaced into the unstable region due to a shear now. This is in agreement with an experiment on a two-polymer/solvent mixture and binary fluid mixtures. It is argued that light scattering is useless to determine the location of the spinodal of a sheared system.Paper presented at the Twelfth Symposium on Thermophysical Properties, June 19–24, 1994, Boulder, Colorado, U.S.A.     

内燃机车曲轴中频淬火过程的数值模拟

借助 ANSYS大型有限元分析软件 ,实现了 16 V2 4 0曲轴淬火过程的计算机模拟 ,模拟结果可直观地显示出任一时刻曲轴表面及内部的温度分布、冷却曲线以及淬火结束后的残余应力分布 ,并能预测淬硬层深度。同时对比了轴颈内圆角处进行淬火和不进行淬火两种工艺的效果 ,为现场提供了用虚拟现实方法详尽分析和研究淬火工艺的工具。     

全20CrMnTi表面激光重熔的组织与性能研究

本文对激光重熔20CrMnTi材料表明改性层显微组织分布特征、表面硬度分布规律以及残余应力状态作了研究,结果表明,表面改性层由熔融层、相变硬化层及过渡层组成,且材料表面显微硬度得到大幅度提高,表面硬度达到HV841,约提高4倍。硬化层深度约1mm。残余应力测试得出最大残余应力出现在熔凝带中心,表现为压应力。随着离中心距离的增大,残余应力逐步降低,到熔化带边缘,表现为低幅值压应力;而熔池的外边缘应力在热影响区则转变为拉应力状态。     

也谈轻型钢结构房屋柱基设计

对柱脚抗剪键的设置和计算中所取用的荷载组合提出个人观点,同时对轻钢结构柱脚螺栓受拉计算提出注意事项.