热蒸发铜粉法制备硅纳米线的研究

研究发现,热蒸发铜粉即可在硅衬底上直接生长出硅纳米线.场发射电子扫描电镜和透射电镜分析表明,纳米线的形貌、结构及生长机制,随沉积区域的不同而变化.在高温沉积区,硅纳米线高度弯曲且相互缠绕,按气-液-固机制生长;在低温沉积区,高度定向生长的直硅纳米线,规整地排列在硅衬底表面,其生长机制是氧化辅助生长机制.     

纳米多层膜的电性能及表面形貌

用热蒸发沉积和自然氧化法制备纳米量级的Al／Al2O3及Cr／Cr2O3薄膜和多层膜．本文采用三点法测定了常温、低温下的U—I特性，发现常温、低温下纳米量级的Al／Al2O3及Cr／Cr2O3薄膜具有类似负阻的特性。SEM检测表明，薄膜表面均匀，薄膜的厚度和称重法所得的厚度基本相符．AFM和STM观察表明薄膜表面存在着岛状结构，表面粗糙度在纳米尺度范围内。     

Densification and anticorrosion performances of vacuum evaporated aluminium coatings on NdFeB magnets

Al coated NdFeB magnets obtained by vacuum evaporation technique were densified by high energy ball milling method.The surface morphology,metal composition and micro structure of the coatings were characterized by scanning electron microscopy,X-ray diffraction and X-ray photoelectron spectroscopy,respectively.The anticorrosive properties were investigated by potentiodynamic polarization curves and neutral salt spray test.The pores in the Al coatings of columnar crystals(Al) induced by the evaporation technique,were apparently filled in the following ball milling process,leading to the densification of Al coatings and the evident improvement of the anticorrosive performances.When treated with ball milling for 30 min,the sample achieves the best anticorrosive performances with the self-corrosion potential of-0.87 V,self-corrosion current density of 1.65 μA/cm~2 and the neutral salt spray(NSS) time of 144 h(red rust).The improvement of the anticorro sive performances of vacuum evaporated Al coating mainly lies in the densification effect of the coating,which depends on different loading conditions of ball milling process.     

闪蒸法制备N型Bi2( Te0.95Se0.05)3薄膜的微结构及热电性能研究

采用闪蒸法在温度为473 K的玻璃基体上沉积了厚度为800 nm的N型Bi2(Te0.95Se0.05)3热电薄膜,并在373 ～573 K进行1h的真空退火处理.利用X射线衍射(XRD)、场发射扫描电子显微镜(FESEM)分别对薄膜的物相结构和表面形貌进行分析.采用表面粗糙度测量仪测定薄膜厚度,薄膜的电阻率采用四探针法进行测量,采用温差电动势法在室温下对薄膜的Seebeck系数进行表征.沉积态薄膜表明了(015)衍射峰为最强峰,退火处理后最强衍射峰为(006);沉积态薄膜由许多纳米晶粒组成,晶粒大小分布较均匀,平均晶粒尺寸大约45 nm,退火处理后出现了斜方六面体的片状晶体结构.退火温度从373 K增加到473 K,薄膜的电阻率和Seebeck系数增加,激活能也随退火温度的增加而增大,退火温度从523 K增加到573 K,薄膜的电阻率和Seebeck系数都缓慢下降.从373 ～473 K,热电功率因子随退火温度的升高而单调增加,退火温度为473 K时,电阻率和Seebeck系数分别是2.7 mΩ.cm和-180μV·K-1,热电功率因子最大值为12 μW.cmK-2.退火温度从523 K增加到573 K,热电功率因子的值逐渐下降.     

多组元钛合金电子束冷床炉熔炼挥发规律研究

利用电子束冷床炉(EB炉)一次熔炼制备TC4、Ti6242、TA15钛合金铸锭,采用Langmuir定律对熔炼过程中Al、Sn、Zr、Mo等元素的挥发规律做了简要的数值分析,并与实际挥发规律进行了对比分析.结果表明:EB炉熔炼TC4、Ti6242、TA15钛合金过程中,Al元素在3种合金中的挥发率有所不同,挥发率由大到...     

浅析热媒脱水和脱轻馏分的优化方式

长输管道输送原油需要加热.阐述了新型原油加热系统热媒脱水、脱轻馏分的工艺,针对用户在使用热媒炉系统过程中易发生水击,无法实现自动控制和优化运行,热效率低,热媒乳化失效快等问题进行了攻关,发现主要根源是热媒脱水、脱轻馏分工艺操作不合理造成的.经过长期的实验,得出了热媒脱水和脱轻馏分的优化曲线,实现了热媒炉系统的安全、平稳、高效运行.     

减少高压溶出机组碳酸钠结晶及处理方法

高压溶出机组碳酸钠的结晶给生产带来严重危害，了解碳酸钠成分来源并采取措施，降低其含量是必要的。     

Liquid-liquid and vapour-liquid behaviour of oleyl alcohol applied to extractive fermentation processing

Investigations into the product recovery step of the extractive ethanol fermentation through partition experiments for ethanol-water-Adol^r? 85 NF ternary systems were undertaken. Experimental liquid-liquid equilibrium data for this ternary system were compared with numerical predictions based on the UNIFAC method. The influence of salts on distribution coefficients for ethanol extraction was also examined. An improvement in extraction characteristics was observed for ternary systems with salts. Flash vaporisation was used to subsequently examine the effect of liquid-liquid ternary compositions on vapour-liquid partitioning. The UNIFAC model was found to be very useful for semi-quantitative analysis of such liquid extraction systems.     

Field ion microscopic observations of LaB6 on tungsten

The importance of field ion microscopy as a unique surface microscopic technique has been pointed out with particular reference to the lanthanum hexaboride (LaB₆)-deposited refractory metal cathodes. In the core, field ion microscopic observations of LaB₆ deposited tungsten are described. The observations are discussed in relation to the field electron emission microscopy of LaB₆/W system. The paper ends with a few comments on the scope of further study of this or a similar system using the field ion microscopy and the atom probe field ion microscope.     

Annealing behaviour of electron-beam deposited tin dioxide films

The sheet resistivity of tin dioxide films deposited by electron-beam evaporation has been studied during annealing, both as a function of time and temperature. The annealing behaviour of SnO₂ films under the above two different conditions is consistent. A qualitative interpretation has been given for the decrease and the minimum observed in the resistivity. The increase in resistivity has been confirmed by scanning-electron micrographs. The films were also characterized by x-ray diffractometry.