N,N−二甲基−二硫代甲酰胺丙磺酸钠对THPED体系化学镀铜的影响

研究了N,N?二甲基?二硫代甲酰胺丙磺酸钠(DPS)作为添加剂对以四羟丙基乙二胺(THPED)为单一配位剂的化学镀铜体系的沉积速率、镀层形貌和晶体结构的影响。结果发现,当DPS的质量浓度从0 mg/L增大到1.0 mg/L时,沉积速率从2.91μm/h提高到6.73μm/h,所得镀层结晶均匀、细致。线性扫描伏安测量结果表明,DPS是通过促进甲醛的阳极氧化来加速化学镀过程。本体系的Cu镀层主要呈面心立方多晶取向,DPS的添加会令晶面取向从(220)转变为(111)。     

Thermal stability behaviors of Cr(N,O)/CrN double-layered coatings by TGA/DTA analysis

In this study, Cr(N,O)/CrN double-layered coatings were synthesized using the cathodic arc deposition (CAD) process. CrN film was first deposited onto a substrate as an interlayer to ensure better adhesion, and Cr(N,O) film was subsequently deposited on top of the CrN layer as the surface layer. Variation in the Cr(N,O) coating composition was achieved through changing the O₂/N₂ flow ratio during the last stage of processing. Phase structure, chemical composition, and morphology of the resulting coatings were analyzed and observed using the X-ray diffractometer, Auger electron spectrometer and SEM. In addition, oxidation behavior of the coatings was investigated using TGA/DTA methods. The tests were carried out by increasing temperature up to 1000 °C in ambient air. With the introduction of oxygen gas during the CAD process, a superficial layer was produced in the Cr(N,O) constituent containing CrN and Cr₂O₃ phases. The formation of the oxide phase attributed to the reaction of chromium and oxygen was more favorable than that of chromium and nitrogen. The results also showed that Cr(N,O)/CrN double-layered coatings exhibited superior oxidation resistance at elevated temperature than that of CrN single-layer coated specimen (870 °C vs. 750 °C).     

Effect of laser fluences on the structure of carbon nitride films deposited by direct current plasma assisted pulsed laser ablation

Carbon nitride films were deposited by direct current plasma assisted pulsed laser ablation of a graphite target under a nitrogen atmosphere at room temperature. The surface morphology, composition and bonding structure of the deposited films were characterized by atomic force microscopy (AFM), Fourier transform infrared (FTIR) spectroscopy, Raman, and X-ray photoelectron spectroscopy (XPS). The effect of laser fluences in the range 0.5–3 J/cm² on the surface morphology, composition and bonding structure of the carbon nitride films were systematically studied. As laser fluence is increased, AFM results show a great decrease in the surface roughness of carbon nitride films. FTIR and XPS results indicate an increase in the N/C ratio and the content of N atoms bonded to sp³ C, as well as a decrease in the content of H atoms and the content of N atoms boned to sp² C in the deposited films, and Raman spectra indicate an increase in the content of disordered sp² C atoms and the sp² cluster size. The increase in the film density and the decrease in the particle fraction contribute to the decrease of surface roughness with increasing laser fluence.     

Magnetic and mechanical properties of FeSi alloys with high Si content

The chemical vapor（CVD） deposition-diffusion method was applied to prepare FeSi alloys with high silicon content up to 6.5%. In spite of various deposition and post-annealing, the sample remains α-Fe bcc structure. The cross section of the composition was analyzed to evaluate the Si content and distribution before and after annealing. The results show that the soft magnetic properties are improved by increasing the silicon content. For the samples containing about 6.5% Si, the coercivity decreases to 60 from 237.3 A/m of the original. It is also obtained that, in addition to the Si content, Si distribution has a large influence on the core loss due to the effect of resistivity. The micro-hardnesses were also evaluated along the cross-section after various annealings.     

酸性Ni-Mo-P/Ni-P双层化学镀工艺研究

对酸性Ni-Mo-P／Ni—P双层直接连续化学镀的工艺进行了试验研究。通过对钼酸根与次磷酸根加量比对镀速的影响，络合剂与pH对镀速及成分影响的研究，优化得到一种双层化学镀的酸性镀液的组成。试验研究了钼含量对镀层结构的影响，进而确定了具有非晶结构的双层镀的最佳工艺并对其性能进行了研究。     

Nanostructured component fabrication by electron beam-physical vapor deposition

Fabrication of cost-effective, nano-grained net-shaped components has brought considerable interest to Department of Defense, National Aeronautics and Space Administration, and Department of Energy. The objective of this paper is to demonstrate the versatility of electron beam-physical vapor deposition (EB-PVD) technology in engineering new nanostructured materials with controlled microstructure and microchemistry in the form of coatings and net-shaped components for many applications including the space, turbine, optical, biomedical, and auto industries. Coatings are often applied on components to extent their performance and life under severe environmental conditions including thermal, corrosion, wear, and oxidation. Performance and properties of the coatings depend upon their composition, microstructure, and deposition condition. Simultaneous co-evaporation of multiple ingots of different compositions in the high energy EB-PVD chamber has brought considerable interest in the architecture of functional graded coatings, nano-laminated coatings, and design of new structural materials that could not be produced economically by conventional methods. In addition, high evaporation and condensate rates allowed fabricating precision net-shaped components with nanograined microstructure for various applications. Using EB-PVD, nano-grained rhenium (Re) coatings and net-shaped components with tailored microstructure and properties were fabricated in the form of tubes, plates, and Re-coated spherical graphite cores. This paper will also present the results of various metallic and ceramic coatings including chromium, titanium carbide (TiC), titanium diboride (TiB₂), hafnium nitride (HfN), titanium-boron-carbonitride (TiBCN), and partially yttria stabilized zirconia (YSZ) TBC coatings deposited by EB-PVD for various applications. This paper was presented at the International Symposium on Manufacturing, Properties, and Applications of Nanocrystalline Materials sponsored by the ASM International Nanotechnology Task Force and TMS Powder Materials Committee, October 18–20, 2004, Columbus, OH.     

镀铬技术进展

镀铬层具有多方面的优异性能,在工业上已得到了广泛的应用。镀铬技术大体上可以分为电镀铬和真空镀铬。本文侧重于介绍真空镀铬技术。对于工业上通用的电镀铬技术及其近年来的进展也作了概括介绍。并对电镀铬和真空镀铬技术的特点作出了对比说明,还讨论了两种技术的未来发展趋势。     

TiN/SiNx submicronic multilayer coatings obtained by chemical vapor deposition in a fluidized bed reactor at atmospheric pressure (AP/FBR-CVD)

TiN/SiN_x multilayer coatings were deposited on stainless steel by Chemical Vapor Deposition in a Fluidized Bed Reactor at Atmospheric Pressure (AP/FBR-CVD) by reaction of TiCl₄ and SiCl₄ with NH₃ at 850 °C. Due to the immiscibility of crystalline TiN and amorphous SiN_x, interdiffusion between layers is avoided even at the high working temperature. The thickness of the individual layer was in the nanometer range. Coatings were characterized by means of SEM, TEM, GD-OES, SIMS, XRD and nanoindentation. A mechanism for the growth rate and diffusion of Ti and Si into the steel is discussed.     

等离子熔积直接成形形状特性的基础研究

系统分析了熔积成形技术中影响成形形状特性的原因,研究了转移弧电流、扫描速度和起弧高度对成形精度的影响机理.实验表明,以上参数对等离子熔积直接成形形状特性的影响显著,对改善零件的成形精度起决定性的作用;通过优化成形工艺参数,焊道表面质量得到显著好转.     

Reaction of Iradium with Metal Carbides in the Temperature Range of 1923 to 2400 K

The reactions of titanium carbide and hafnium carbide with iridium have been studied in thin film couples fabricated by vapor deposition processes. The reaction product layers after exposure in the temperature range of 1923 to 2400 K are dependent on the stoichiometry of the metal carbide layers and range from simple solid solutions to MIr_x compounds. The observed microstructures are predictable from available thermochemical data. The morphology of residual carbon in the reacted metal carbide-iridium product layer varies from interfacial deposits to uniform carbon dispersion and depends upon exposure temperature and metal carbide stoichiometry.