短路环激光切割机

制造液晶TFT的关键设备——“液晶屏短路环激光切割机”2004年4月上旬研制成功。有关专家称，我国是目前继日本之后世界上第二个掌握该制造技术的国家，其形成规模生产后，将提升我国在光电子设备制造方面的影响力。     

变！变！变！看清陌生品牌内存

由于当前P4C、P4E等主流处理器纷纷选入800MHz前端总线时代，DDR40O内存已成为标准配置。关于DDR400内存的选购知识，本已没多少可以再给读者介绍的地方，本刊以及其他媒体都有详细的介绍。然而，近段时间以来在内存市场中突然涌现出了不少闻所未闻的内存品牌，比如大富豪、金士泰、LPT、超胜、威刚、黑     

11 用Hyades推导烧蚀压定标律

Hyades是一套一维三温流体力学数值模拟程序，主要用于模拟计算激光打靶实验中，靶中或者飞片中冲击波传播的物理过程。我们通过程序的使用，了解到计算中有一个重要的边界条件：在模拟的烧蚀临界面上，压力维持在烧蚀压大小。     

CO2激光打印系统

该打印系统是一种全自动CO2激光打印系统。     

高精度微细加工激光切割机

Amader公司的超微细加工激光切割机可切割直径达0．01mm的金属箔，并可打直径为0．01mm的微孔。振荡器为密封盘型输出功率为250W的CO2激光器。该切割机可用于IT产品的薄型化和需在装配过程精密化中很难加工的电子部件或薄片的试制和批量生产。适于加工的原材料厚度为0．05～0．5mm的不锈钢或磷青铜等薄板金属。加工的材料热变形小，     

Design of Polarization-independent Wavelength-interleave Coupler in Fluorinated Polyimide Waveguide

Based on the measurement of dispersion characteristic and birefractive index of the fluorinated polyimide film,a statistical optimum design method is proposed and used to realize the design of 32-and 36-wavelengths optical waveguide wavelength-interleave coupler (i,e.,interleaver) with the optimization of polarization fluctuation and wavelength interval of 0.8nm at 1550nm. The largest cross coupling ratios of the two interleavers are respectively less than 1.8% and 3.5%, while the least through coupling ratios are respectively greater than 98. 2% and 96. 5%. The output differences due to polarization fluctuation are less than 1.7% and 3.2%     

激光显示业期望新光源

在饱受经济萧条之苦后，激光业正翘首期望激光显示市场的繁荣。虽然美国很多一流的激光显示公司已离开这个行业，但从2003年国际激光显示会议上却不难看出这一行业已出现复苏迹象。     

激光技术与应用

2004030182半导体激光器=半导体レ-ザ[日]/玉贯岳正//オプトロニクス.-2003,22(12).-203～209 2004030183Pllin型激光式前置准直器=レ-ザ式プ-リアライメント器“プラライン”[日]/八木聪//计测技术.-2003,31(10).-54～552004030184Fujinon激光干涉仪=フジノンレ-ザ干涉计[日]/天野高宏//光アライアンス.-2003,14(3).-41～452004030185装有可视激光器的工作台=可视光レ-ザ搭载ト-タルステ-シヨン[日]/木幸治//光アライアンス.-2003,14(7).-28～322004030186激光CVD修复SL465E的开发=レ-ザCVDリペア-SL465Eの开发[日]/古泉真一//光…     

Full Complex Amplitude Digital Holograms： Design, Fabrication and Optical Characterization

Diffractive optical elements have a large number of industrial applications, such as beam shaping and optical filtering. Traditionally, these elements modulate the phase of the incoming light or its amplitude, but not both. To overcome this limitation, full complex-amplitude modulation diffractive optical elements were developed. Well-established integrated circuit fabrication steps were employed to fabricate the devices with high precision. Using this approach, the new element‘s optical performances are improved also for near field operations. With this device it is possible to obtain 100% efficient spatial filtering and low noise reconstructed images.