Improving Lipid Production of Yarrowia lipolytica by the Aldehyde Dehydrogenase-Mediated Furfural Detoxification

Yarrowia lipolytica, the non-conventional yeast capable of high lipogenesis, is a microbial chassis for producing lipid-based biofuels and chemicals from renewable resources such as lignocellulosic biomass. However, the low tolerance of Y. lipolytica against furfural, a major inhibitory furan aldehyde derived from the pretreatment processes of lignocellulosic biomass, has restricted the efficient conversion of lignocellulosic hydrolysates. In this study, the furfural tolerance of Y. lipolytica has been improved by supporting its endogenous detoxification mechanism. Specifically, the endogenous genes encoding the aldehyde dehydrogenase family proteins were overexpressed in Y. lipolytica to support the conversion of furfural to furoic acid. Among them, YALI0E15400p (FALDH2) has shown the highest conversion rate of furfural to furoic acid and resulted in two-fold increased cell growth and lipid production in the presence of 0.4 g/L of furfural. To our knowledge, this is the first report to identify the native furfural detoxification mechanism and increase furfural resistance through rational engineering in Y. lipolytica. Overall, these results will improve the potential of Y. lipolytica to produce lipids and other value-added chemicals from a carbon-neutral feedstock of lignocellulosic biomass.     

Strain-softening behavior of an Fe-6.5 wt%Si alloy during warm deformation and its applications

An Fe-6.5 wt%Si alloy with columnar grains was compressed at a temperature below its recrystallization temperature. The Vickers hardness and structure of the alloy before and after deformation were investigated. The results showed that with an increase in the degree of deformation, Vickers hardness of the alloy initially increased rapidly and then decreased slowly, indicating that the alloy had a strain-softening behavior after a large deformation. Meanwhile, the work-hardening exponent of the alloy decreased significantly. Transmission electron microscopy confirmed that the decrease of the order degree was responsible for the strain-softening behavior of the deformed alloy. Applying its softening behavior, the Fe-6.5 wt%Si alloy with columnar grains was rolled at 400 °C and then at room temperature. An Fe-6.5 wt%Si thin strip with thickness of 0.20 mm was fabricated. The surface of the strip was bright and had no obvious edge cracks.     

Compression Stability of Reversed Austenite in 9Ni Steel

The effect of compressive stress on the stability of reversed austenite in 9Ni steel was investigated by uniaxial and hydrostatic compression.It was found that the uniaxial compressive pressure promoted the γ→α transformation,while the hydrostatic pressure suppressed the γ→α transformation.The pressure dependent transformation behavior can be explained according to thermodynamic analysis.     

平板式固体氧化物燃料电池Ni/YSZ阳极上甲烷重整过程实验研究

为了开发甲烷直接内部重整的高效固体氧化物(solid oxide fuel cell,SOFC)燃料电池系统,必须对阳极上甲烷水蒸气重整过程进行详细研究。文中搭建了实验台,对开发的平板式SOFC燃料电池多孔介质阳极上甲烷重整过程进行了实验研究。给出在不同燃料流量和不同水蒸气/甲烷比(S/C)工况下出口气体各组分的摩尔分数和甲烷转化率的分布。实验结果表明工作参数对甲烷的转化率有很大的影响,在相同工作温度下甲烷的转化率随着进口燃料流量增加而降低,因此出口气体中氢气的摩尔浓度也相应降低。另外通过分析实验结果,可见阳极的入口处最有可能有碳形成。     

Spacer defined FinFET: Active area patterning of sub-20 nm fins with high density

We present a method to obtain Si-fins with a critical dimension (CD) below 20 nm, separated by a minimum distance of 25 nm and connected by a common source/drain (S/D) pad. The method comprises of recursive spacer defined patterning to quadruple the line density of a 350 nm pitch resist pattern defined by 193 nm lithography. Spacer defined patterning is combined with resist based patterning to simultaneously define fins and S/D pads in a Silicon on Insulator (SOI) film. CD and Line Width Roughness (LWR) analysis was done on top down SEM images taken in a center die and in an edge die of a 200 mm wafer. The average CD is 17 nm in the center of the wafer and 18 nm at the edge. The LWR is 3 nm for both center and edge. Additional process steps to remove etch damage and round the top corner of the fin (i.e. oxidation followed by H₂ anneal) further reduce the CD to 13 nm.     

改善激光熔覆镍基合金和陶瓷硬质相复合涂层性能的研究

激光熔覆镍基合金和陶瓷硬质相（WC）复合涂层过程中存在的问题是容易形成缺陷和开裂。通过调整WC的比例和分布,合理的工艺参数,增设韧性良好的过渡层,并加入微量混合稀土氧化物,对发生马氏体相变硬化的热影响区进行激光回火处理等,以获得无裂纹缺陷,金相组织均匀,并具有硬度平滑过渡的优质熔覆层。     

Effect of annealing temperature on Ti/Al/Ni/Au ohmic contacts on undoped AlN films

The Ti/Al/Ni/Au metals were deposited on undoped AlN films by electron beam evaporation. The influence of annealing temperature on the properties of contacts was investigated. When the annealing temperatures were between 800 and 950℃, the AlN-Ti/Al/Ni/Au contacts became ohmic contacts and the resistance decreased with the increase of annealing temperature. A lowest specific contacts resistance of 0.379 Ω·cm² was obtained for the sample annealed at 950℃. In this work, we confirmed that the formation mechanism of ohmic contacts on AlN was due to the formation of Al-Au, Au-Ti and Al-Ni alloys, and reduction of the specific contacts resistance could originate from the formation of Au₂Ti and AlAu₂ alloys. This result provided a possibility for the preparation of AlN-based high-frequency, high-power devices and deep ultraviolet devices.     

0-3型(Ba1-x-ySrxPby)(Mn,Ti)O3铁电厚膜的制备与表征

铁电纳米超细粉体的合成与分散技术是成功制备0-3型铁电厚膜的关键和难点之一。采用Sol-Gel技术可制备呈球形软团聚、钙钛矿相结构完整的30nm～70nm MPBST超细粉体，以及致密无裂纹、表面光洁和铁电性能优良(Pr=3．8μC／cm^2)的0-3型铁电厚膜。通过TEM、XRD、TGA-DTA、AFM等手段分析了Sol-Gel工艺的化学机制和热演化历程，结果表明：采用以乙二醇乙醚为主要溶剂的Sol-Gel技术可降低MPBST粉体／厚膜的合成温度,提高粉体均匀性和晶相结构单一性。     

基于VC++6.0的PC机与单片机之间的串行通信

介绍了在Windows系列（Windows 98/2000/XP）环境下，如何利用VC^ 6.0的通信控件MSComm来实现PC机与单片机之间的串行通信。硬件电路中，采用MAX232AESE芯片解决了PC机与单片机之间通信连接电平的不一致问题；软件部分，分别利用VC^ 6.0的汇编语言，给出了他们之间的通信程序。