火焰原子吸收测定固体废物浸出液中锌、镍和铜

采用硫酸硝酸浸提、火焰原子吸收分光光度法测定催化剂固体废弃物中的锌、镍和铜3种元素,加标回收率为93．2—108．5％,相对标准偏差为0．4—1．7％。结果表明,该方法具有检出限低,重现性好、分析效率高、操作简便等优点。     

向环境友好发展的高速／高频PCB用基板材料——日立化成新产品MCL—LZ-71G赏析

本文简要介绍了日立化成高速／高频PCB用基板材料路线图,分析了日立化成最新推出的环境友好的高速／高频PCB用基板材料MCL—LZ-71G的技术特点,从传输损失、树脂体系组成、填料界面控制等方面详细介绍MCL—LZ-71G树脂体系设计,从高频性能、传输损失、耐湿性能、耐热性、可靠性、眼图测试、耐CAF性能、热冲击测试等方面综述了MCL—LZ-71G的性能。     

回归方程在标准加入法测高岭土中铜的应用

用原子吸收光谱法测定高岭土中铜,分别用标准曲线法及标准加入法定量分析铜元素含量,比较了作图法和回归方程法处理标准加入法数据。结果表明,随铜元素变量,标准曲线法及标准加入法均有较好的线性关系,但测定的结果有差异。标准加入法因可消除基体干扰,测得铜结果准确度高。标准加入法适合基体复杂的试样的分析。作图法及回归方程均适用于标准加入法测铜的数据处理,作图法误差大,而回归方程法是快捷,误差小的简便方法。     

Inhibition of copper corrosion in aerated hydrochloric acid solution by heterocyclic compounds containing a mercapto group

Inhibition of copper corrosion by benzotriazole (BTA), 2-mercapto benzoxazole (MBO) and 2-mercapto benzimidazole (MBI) in 0.5 mol L⁻¹ HCl was investigated by weight-loss measurements, potentiodynamic polarization curves and electrochemical impedance spectroscopy. MBI was shown to be the most effective inhibitor among those tested. Potentiodynamic polarization results revealed that the three compounds acted as anodic inhibitors, particularly MBI strongly suppressed anodic current densities. Molecular structure parameters of BTA, MBO and MBI were obtained by using an MM2 forcefield program and PPP–SCF quantum chemical calculation. It was found that MBI has higher levels of HOMO and LUMO energy and the larger π-electron density.     

Computer simulation of the corrosion inhibition of copper in acidic solution by alkyl esters of 5-carboxybenzotriazole

A series of alkyl esters (methyl, butyl, hexyl, and octyl) synthesised from a mixture of 4- and 5-carboxybenzotriazole (4-CBTAH and 5-CBTAH) inhibited copper corrosion in aerated solution (pH∼0). Inhibition efficiency (IE%) of the protonated esters (CBTAH₂⁺-R) increased with hydrocarbon chain length and this is attributed to chemisorption (through azole ring N) and increased physical adsorption as more methyl groups are introduced. A modelling package employing molecular mechanics and molecular dynamics has been used to simulate the docking of a single protonated species (5-CBTAH₂⁺-R) onto a clean copper (1 1 0) surface. A decrease in potential energy was associated with the flattening of the ester ring system onto the surface and further decreases in energy were associated with the extension of the aliphatic chain onto the surface. The crude binding energy (E_bind) of each ester with the surface was estimated and this energy also increased regularly with carbon chain length. The study suggests that molecular modelling and calculation of E_bind of a single molecule on a specified metallic surface can be used to predict the inhibition performance of compounds whose structures change in a regular way.     

导电体应用铝材 符合国情

现代冶金技术、双金属熔合技术、铝加工技术迅猛发展,而铜价猛涨,我国铜资源贫乏,从技术、价格、安全、资源利用等方面进行分析,提出导电体应以铝代铜。     

铜铅混合精矿硫酸预氧化-浮选分离参数优化试验研究

方铅矿与黄铜矿的分离一直是选矿领域的难点。使用硫酸预氧化可选择性抑制方铅矿表面可浮性,使得两种矿物可浮性产生差异,实现浮选分离。本研究针对铜铅混合精矿硫酸预氧化-浮选分离工艺进行了系统的参数优化。首先,利用单因素试验,分析了预氧化硫酸浓度、温度、时间等关键因素对铜铅混合精矿浮选分离效果的影响;其次,利用正交试验分析,建立了预氧化过程中各影响因素与浮选指标之间的数学模型;通过模型求解,得到最佳预氧化条件为硫酸浓度5 mol/L、时间40 min 、温度100 ℃。最后在上述条件下进行了混合精矿预氧化-浮选闭路试验,获得了铜精矿Cu品位18.03%,Cu回收率94.52%;铅精矿Pb品位47.12%,Pb回收率为91.29%的良好指标,铜铅分离效果显著,对铜铅硫化混合精矿的浮选高效分离提供了一定的借鉴。     

Molecular Formation upon Ionization of van der Waals Clusters and Implication to Astrochemistry

The presence and formation of a large variety of organic molecules in the interstellar medium is evident from both astronomical data of absorption and emission bands at different regions of the spectrum. Specifically, polycyclic aromatic hydrocarbons (PAHs) are ubiquitous in the interstellar medium (ISM). The mechanism for their formation in ISM‘s low temperature environment is, as of yet, a mystery nonetheless. Understanding the mechanism of formation of complex molecules such as PAHs and nitrogen-based PAHs (PANH) in the ISM is a long-standing challenge which has been drawing a growing attention for the past several decades. In this review we wish to emphasize two things: Firstly, the essential role quantum chemistry can play in the study of astrochemical reactions. Secondly, we wish to demonstrate that said variety of possibilities for chemical reaction, starting upon ionization of van der Waals clusters. The potential for different chemical reactions to occur within a cluster environment arises from the fact that such processes can take place at low temperatures as the systems pose large amounts of energy upon ionization. Moreover, the spectator molecules in the cluster can provide a dissipation route for energy by detachment from the cluster, thus the system can stabilize efficiently even at low densities. The spectator molecules can also change the potential energy surface, by which it will pose a catalytic effect for certain reactions. We will demonstrate this by presenting Ab Initio Molecular Dynamic results on ionization of small acetylene clusters.     

Evaluation of a novel unfluorinated copper precursor for chemical vapor deposition

A kinetics of the chemical vapor deposition (CVD) of copper using novel unfluorinated precursor, copper(I)(N(1(dimethylvinylsiloxy)-1-methylethano)-2-imino-4-pentanoate), namely Cu-KI5, was studied. Since its great thermal stability, Cu-KI5 allowed high source temperature to provide high vapor pressure, for example Cu-KI5 has a vapor pressure of 0.2-2.2 Torr at the temperature range of 100-140 °C. Furthermore, copper could be deposited by direct reduction from Cu-KI5 instead of disproportionation. By using formic acid (HCOOH) as a reducing agent, copper films were deposited on ruthenium substrate at temperature range of 150-350 °C. The activation energy was 48.9 kJ/mol in surface reaction limited region (<210 °C) and 1.9 kJ/mol in diffusion limited region (>210 °C) at the total pressure of 5 Torr. Secondary ion mass spectroscopy (SIMS) analysis showed that CVD copper film of high purity (>99.99%) was deposited at 250 °C. The as-deposited copper films grown at 150-300 °C exhibited strong 〈111〉 preferred orientation. The minimum resistivity of the copper film was 1.77 μΩ cm obtained at the deposition temperature of 250 °C. In the surface reaction limited region, kinetic data extracted from experiments enabled 2-D computational simulation to predict copper deposition into trench structures. Simulation results showed excellent step coverage, which was larger than 90% for aspect ratio of 10:1. Cu-KI5 is a promising Cu-CVD precursor for the fabrication of ultra large scale integration (ULSI) or through silicon via (TSV) copper interconnects.     

微米级镀银铜粉的镀层结构及热稳定性

为了提高铜粉的热稳定性,采用滴入化学镀法在铜粉末表面包覆一层金属银,用SEM、X射线衍射(XRD)、粒度分布和热重分析表征了不同包覆厚度的镀银铜粉和原始铜粉的表面形貌、表面结构及抗氧化性.结果表明:铜粉表面镀层结构与银离子形核长大机制和银含量有关;镀银铜粉的热稳定与表面镀层结构有关;完全包覆结构的镀银铜粉具有较好的热稳定性,抗氧化温度可以达到800℃以上.