Glass powders and reactive silicone binder: Interactions and application to additive manufacturing of bioactive glass-ceramic scaffolds

A novel concept for the additive manufacturing of three-dimensional glass-ceramic scaffolds, to be used for tissue engineering applications, was based on fine glass powders mixed with a reactive binder, in the form of a commercial silicone. The powders consisted of ‘silica-defective glass’ specifically designed to react, upon firing in air, with the amorphous silica yielded by the binder. By silica incorporation, the glass was intended to reach the composition of an already known CaONa₂OB₂O₃SiO₂ system. Silica from the binder provided up to 15 wt% of the total silica. With the same overall formulation, silicone-glass powder mixtures led to nearly the same phase assemblage formed by the reference system, crystallizing into wollastonite (CaSiO₃) and Ca-borate (CaB₂O₄). Samples from silicone-glass powder mixtures exhibited an excellent shape retention after firing, which was later exploited in highly porous reticulated scaffolds, obtained by means of direct ink writing (DIW).     

Modelling of copper etching in aerated chloride solutions

The effect of dissolved oxygen on the rate of chemical etching of copper by acidic cuprous chloride solution was investigated numerically for the case of a rotating disc electrode (RDE). Copper dissolution in aerated acidic cupric chloride solutions of composition 3.5M CuCl2 + 0.5M HCl + 0.5M KCl and 3.5M CuCl2+0.5M HCl was investigated with consideration of the instantaneous homogeneous reaction 4CuCl32-+4H++O2rlhar4CuCl 3-+2H2O which takes place within the mass transport boundary layer. It was assumed that CuCl32- and O2 react instantaneously, resulting in the formation of a reaction plane which separated the mass transport boundary layer into two regions: a region adjacent to the electrode where oxygen was depleted, and a region adjacent to the bulk where CuCl32- was absent. A one-dimensional mathematical model was developed to predict the position of the reaction plane. The model accounted for diffusion, migration and fluid flow generated by an RDE and included nine species and five heterogeneous electrochemical reactions. The homogeneous redox reaction served to regenerate the chemical etchant solution and thus enhance the etch rate. With increasing oxygen concentration and rotation rate the reaction plane was found to move closer toward the electrode and thus the etch rate of copper increased. Addition of KCl increased the Cl- content in solution so as to shift the reaction plane toward the bulk.     

Evaluation of some of the properties of plasma treated wool fabric

Low temperature plasma (LTP) treatment was applied to wool fabric with the use of a nonpolymerizing gas, namely oxygen. Properties of the LTP‐treated samples including low stress mechanical behavior, air permeability, and thermal characteristics were evaluated in this study. Kawabata evaluation system fabric (KES‐F) was employed to determine the tensile, shearing, bending, and compression strength properties and surface roughness of the specimens. The changes in these properties are believed to be closely related to the interfiber and interyarn frictional force induced by the LTP. The decrease in the air permeability of the LTP‐treated wool fabric was found to be probably because of the plasma action effect on increasing the fabric thickness and a change in fabric surface morphology, which was confirmed by scanning electron microscopy micrographs. The change in the thermal properties of the LTP‐treated wool fabric was in good agreement with the earlier findings and can be attributed to the amount of air trapped between the yarns and fibers. This study suggested that the LTP treatment can influence the final properties of the wool fabric, and also provide information for developing LTP‐treated wool fabric for industrial use. © 2006 Wiley Periodicals, Inc. J Appl Polym Sci 102: 5958–5964, 2006     

环氧丙烷生产工艺进展

综述了近年来环氧丙烷合成工艺的新进展,包括对现有环氧丙烷生产工艺的革新、直接氧化法、光催化环氧化等方法,并对各种方法的特点和发展前景进行了讨论.     

The Effect of Aluminum Ions on the DC Etching of Aluminum Foil

A study has been made of the electrochemical etching of 99.99% aluminum foils at a current density of 50 mA cm^–2in AlCl₃–HCl solutions (1 m Cl^–) at 80 °C. The solutions were made by dissolving metallic aluminum into 1m HCl solution, to give a Cl^– concentration of 1 m. The number density of etch tunnels and the homogeneity of tunnel length decreased, and the mean pit size and its standard deviation increased with increasing Al³⁺ concentration. The results were discussed based on potential transients at a current density of 50 mA cm^–2, current–potential curves at a scan rate of 10 m Vs^–1 and electrochemical impedance spectra.     

通过淀积-腐蚀-淀积实现平坦化的研究

在半导体器件和集成电路的研制和制备过程中,随着工艺水平的提高及技术进步,双层乃至多层布线越来越多,尺寸也越来越小。然而,在尺寸较小、台阶较高的情况下,如果在第一层金属上淀积介质后直接形成上层布线就会导致断条现象的出现,这就导致了平坦化成为非常重要的一项工艺。给出了平坦化工艺的基本原理,通过优化工艺条件并进行实验验证,确定了平坦化的最佳工艺条件,可以确保进行一次金属刻蚀以后,片子表面仍能基本平坦,这样就为二次布线打下了良好基础,杜绝了断条现象的产生。     

核电厂小型承压容器泄漏率直读的可行性分析

对比气体泄漏率的精确计算值与直读值的差异,分析误差的成因并找出切实可行的缩小误差的方法,使得直读法在小型承压容器的大批量泄漏率检测中发挥了重要的作用。     

Theoretical Aspects Of The Kinetics Of Competitive First Reactions Of Ozone In The O3/H2O2 And O3/UV Oxidation Processes

Kinetics of competition between the ozone direct reaction with compounds in water, ozone-hydroperoxide ion reaction leading to free radicals in the O₃/H₂O₂ process, and the photolysis of ozone in the O₃/UV process are discussed in terms of diffusion and reaction times to establish conditions for these reactions to be competitive. Film theory and chemical kinetic concepts then are applied to estimate initial rates of ozone absorption and consumption, removal rates of compounds present in water, and the importance of the radical oxidation path versus direct ozone and/or photolysis reactions.     

Self-aligned fabrication of single crystal diamond gated field emitter array

This paper describes a self-aligned fabrication process for diamond gated field emitter array (FEA). Utilizing the non-conformal coverage sputtering conditions of silicon oxide, an interesting “sphere on cone” structure is formed on diamond nano tip array, which is the key point of gate hole opening process. This structure causes shadowing at certain regions of side-wall during Ti / Au gate metal deposition. Removal of “sphere” by wet etching leads to the successful fabrication of a single crystalline diamond gated FEA. Scanning electron microscope observations reveal the fabrication of a uniform emitter array with tip radius of curvature (20 nm) and gate hole (1.4 μm). We also confirmed that no noticeable physical damage exists on tip. In field emission characteristics of the fabricated single crystal diamond gated FEA, gate voltage control of field emission current is realized.     

熔体直纺129dtex/144f涤纶细旦POY的生产工艺

介绍了在直接纺丝设备上,通过工艺调整与设备改进,成功开发129dtex/144f涤纶细旦POY的经验。