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101.
Structural and magnetic properties have been studied for polycrystalline Zn1  xTMxO films where transition metal (TM) = Fe, Cr. The Zn1  xTMxO films were prepared by the radio frequency magnetron sputtering technique on Al2O3 (001) substrates. The microstructures of the films are characterized by X-ray diffraction and X-ray photoelectron spectroscopy. TM in the films exists mainly in the form of TM2+, and the TM2+ ions have substituted for the Zn2+ ions bonded in TM-O in the ZnO lattice and do not change the wurtzite structure of ZnO. The result of magnetic measurement shows that the Zn1  xTMxO films are ferromagnetic at 5 K and 300 K respectively. Subsequently, we discuss the origin of the ferromagnetism in the films.  相似文献   
102.
It is reported that CuInO2 single phase is hardly obtainable by using the general mixed oxide synthesis route [M. Shimode, M. Sasaki, K. Mukaida, J. Solid State Chem. 151(1) (2000) 16.; L. Liu, K. Bai, H. Gong, P. Wu, Phys. Rev. B 72(12) (2005) 1252041.; H. Hahnn, C. Lorent, Z. Anorg. Allg. Chem. 279 (1955) 281.]. Therefore, the manufacturing of highly dense single phase targets for CuInO2 thin film growing is still challenging. In this study, a Cu2O-In2O3 composite target instead of a CuInO2 single phase target was fabricated by using the general mixed oxide synthesis route. Thin films of CuInO2 were grown on sapphire substrates by a pulsed laser deposition (PLD) process under various conditions, and c-axis oriented single phase CuInO2 thin films were grown successfully when oxygen partial pressure was controlled.  相似文献   
103.
纳木材料的制备技术结合Sol-Gel工艺在(100)单晶硅上制备了粒径在20~80nm的多晶PLT(Pb_(1-x)La_xTiO_3)纳采晶膜,并用IR、TGA、XRD、SEM等对膜的制备过程及结果进行了研究。结果表明,所制各的PLT纳米晶膜属多晶钙钦矿结构,薄膜表面平整致密,厚度均匀,约为1μ,颗粒为球形或椭球形,粒度呈对称分布。  相似文献   
104.
105.
Surface passivation performances of Al2O3 layers deposited on p-type Czochralski Si wafers by atomic layer deposition(ALD) were investigated as a function of post-deposition annealing conditions.The maximal minority carrier lifetime of 4.7 ms was obtained for AI2O3 passivated p-type Si.Surface passivation mechanisms of Al2O3 layers were investigated in terms of interfacial state density(Dit) and negative fixed charge densities(Qfix) through capacitance—voltage(C— V) characterization.High density of Qfix and low density of Dit were needed for high passivation performances,while high density of Dit and low density of Qfixdegraded the passivation performances.A low Dit was a prerequisite to benefit from the strong field effect passivation induced by high density of negative fixed charges in the Al2O3 layer.  相似文献   
106.
Ferroelectric PZT(20/80) thick films were fabricated by the screen printing method. And the PZT precursor solution was spin-coated on the PZT thick films to obtain a densification. Electrical properties of the thick films as a function of the firing temperature of the PZT precursor solution were investigated. The thickness of all thick films was approximately 60-62 μm. The porosity increased with increasing the firing temperature of the sol, and the porous microstructure and some large pores were observed above 700 °C due to the PbO evaporation. The relative dielectric constant, remanent polarization and dielectric breakdown strength of the specimen fired at 650 °C were 222, 16.5 μC/cm2 and 73 kV/cm, respectively.  相似文献   
107.
Novel sol-gel silica coatings reinforced with multi-walled carbon nanotubes (MWCNTs) have been prepared using the organic sol-gel route and the dip-coating technique on magnesium alloy substrates. Homogeneous and dense composite coatings with good reinforcement dispersion were fabricated using low temperature and atmospheric pressure fabrication conditions. The presence of nanotubes caused a substantial enhancement of silica coating fracture toughness on coatings deposited on grounded substrates but it was not as effective on polished substrates because of the low adhesion of the coating to the substrate. Bridging phenomena caused by the MWCNTs was observed, indicating that an effective load transfer between the silica matrix and the nanotube reinforcement was also achieved.  相似文献   
108.
The mirror-confinement-type electron cyclotron resonance (MCECR) plasma source has high plasma density and high electron temperature, and it is quite useful in many plasma processing, and has been used for etching and thin-film deposition. In this paper, the carbon films about 50 nm thickness were deposited on Si (1 0 0) by MCECR plasma sputtering the sintered carbon target with the argon plasma, and its properties were studied. The bonding structure of the film was analyzed by using the X-ray photoelectron spectropscopy (XPS) and the nanostructure was evaluated with the high-resolution transmission electron microscopy (HRTEM). The tribological properties (friction coefficient, wear rate, and wear life) of the film was investigated by using the pin-on-disk tribometer under the conditions that the normal load is 1 N and the sliding velocity is 0.05 m/s. The nanohardness of the films was measured by using the nanoindenter under conditions that the maximum displacement is 30 nm and the maximum load is 500 μN. The optical properties were measured by using the ellipsometer. The residual stress was measured with a surface profilometer. The surface morphology was studied by using the atomic force microscope (AFM).  相似文献   
109.
110.
The structure and surface morphology of Ni-incorporated diamond like carbon (Ni:DLC) films have been investigated. These films were deposited on Si substrates using pulsed laser deposition (PLD) technique. A KrF Excimer laser (λ = 248 nm) was used for co-ablation from multi component Ni–graphite target. The concentration of Ni was varied by ablating the Ni part of the target with various numbers of laser pulses. The SEM and AFM analysis reveals that the surface is composed of segregates of Ni which increases with the increase in Ni content during the growth process. The structural investigations by XRD and Raman spectroscopy provided information about the orientation of the incorporated constituent and the ordering of the carbon species. Maximum height of the nano structures which were observed on the surface was ∼50 nm. The G-peak of the graphite was shifted towards higher wave number due to enhancement in SP2 sites which have been increased due to the increase in the Ni concentration. A small change in the surface roughness ranging from 7.78 nm to 13.1 nm due to increased Ni concentration was also observed.  相似文献   
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