Light-splitting photovoltaic system utilizing two dual-junction solar cells

There are many difficulties limiting the further development of monolithic multi-junction solar cells, such as the growth of lattice-mismatched material and the current matching constraint. As an alternative approach, the light-splitting photovoltaic system is investigated intensively in different aspects, including the energy loss mechanism and the choice of energy bandgaps of solar cells. Based on the investigation, a two-dual junction system has been implemented employing lattice-matched GaInP/GaAs and InGaAsP/InGaAs cells grown epitaxially on GaAs and InP substrates, respectively.     

电子辐照GaInP/GaAs/Ge三结太阳电池少子寿命的变化

为研究电子辐照空间太阳电池的损伤机制,对电子辐照GaInP/GaAs/Ge三结太阳电池进行了光致发光谱测量,分析了GaInP顶电池及GaAs中间电池发光强度随电子注量的变化规律。利用辐射效率关系对归一化发光强度随电子辐照注量的变化进行了拟合,分别得到了GaInP顶电池及GaAs中间电池在不同辐照条件下的少子非辐射复合寿命τ_nr,通过对比辐照前后少子非辐射复合寿命的衰降变化,发现GaInP顶电池的抗辐照性能优于GaAs中间电池。     

两级聚光光伏系统中砷化镓电池特性的实验研究

针对一般聚光系统中光斑不均匀而导致电池性能下降的问题,设计并搭建了具有二级聚光器的碟式聚光光伏发电系统,介绍了系统的结构及工作原理,进行了户外实验。在相同聚光比条件下(150X),与单级聚光系统相比,三结砷化镓光伏电池的平均峰值功率为1.515 W/cm2,平均效率为29.29%,平均峰值功率和平均效率分别提高了23.32%和9.12%。     

Growth characteristics of hydride-free chemical beam epitaxy and application to GaInP/GaAs heterojunction bipolar transistors

We report on the complete characterization of a hydride- and hydrogen-free chemical beam epitaxy (CBE) process for the realization of GaAs/GaInP heterojunction bipolar transistors. Alternative group V sources tertiarybutylarsine, tertiarybutylphosphine, and trisdimethylaminoarsenic are used instead of traditionally employed AsH₃ and PH₃. A very high degree of reproducibility of growth parameters (fluxes, substrate temperature, doping levels) is demonstrated. Total defect densities lower than 10 def/cm² are routinely obtained. Large-area GaInP/GaAs heterojunction bipolar transistors (HBTs) show a high current gain of 225 for base sheet resistance of 400 ohm/sq. The devices also exhibit excellent high-frequency characteristics. A cut-off frequency of 48 GHz and a maximum oscillation frequency of 60 GHz have been obtained. These results demonstrate the high potential capability of CBE for high-throughput GaInP/GaAs HBT production.     

Control of ordering in GaInP and effect on bandgap energy

Ga_xIn_1-x P layers with x ≈ 0.5 have been grown by atmospheric pressure organometallic vapor phase epitaxy on GaAs substrates with 10 micron wide, [110]-oriented grooves produced photolithographically on the surface. The [110] steps and the misorientation produced at the edges of the grooves have been found to have important effects on the formation of the Cu-Pt ordered structure (ordering on {111} planes) in the GaInP layers during growth. In this work, the groove shape is demonstrated to be critically important. For the optimum groove shape, with a maximum angle to the (001) surface of between 10 and 16°, single domains of the (-111) and (1-11) variants of the Cu-Pt ordered structure are formed on the two sides of the groove. Shallow (≤0.25 μm deep) grooves, with maximum angles of <10°, are less effective. Within the large domains on each side of the groove, small domains of the other variant are observed. The boundary between the two domains is seen to wander laterally by a micron or more during growth, due to the change in shape of the groove during growth. For deep (1.5 μm) grooves, with maximum angles to the (001) plane of 35°, only a single variant is formed on each side of the groove. However, the domains are small, dispersed in a disordered matrix. For substrates with deep grooves on a GaAs substrate misoriented by 9° toward the [-110] direction, an interesting and useful pattern is produced. One half of the groove is a single domain which shrinks in size as the growth proceeds. The other half of the groove, where the misorientation is larger, is disordered. Thus, every groove contains large (>1 μm² cross-sectional area and several mm long) regions of highly ordered and completely disordered material separated by no more than a few microns. This allows a direct determination of the effect of ordering on the bandgap of the material using cathodoluminescence (CL) spectroscopy. The 10K photoluminescence (PL) consists of three distinct peaks at 1.94, 1.88, and 1.84 eV. High resolution CL images reveal that the peaks come from different regions of the sample. The high energy peak comes from the disordered material and the low energy peak comes from the large ordered domains. Electron microprobe measurements of the solid composition demonstrate that the shift in emission energy is not due to changes in solid composition. This is the firstdirect verification that ordering causes a reduction in bandgap of any III/V alloy. Decreasing the Ga_0.5In_0.5P growth rate from the normal 2.0 to 0.5 μ/h is found to enhance ordering in layers grown on planar GaAs substrates. Transmission electron diffraction results show that the domain size also increases significantly. For material grown on exactly (001)-oriented substrates, a pronounced [001] streaking of the superlattice spots is observed. This is correlated with the presence of a dense pattern of fine lines lying in the (001) plane in the transmission electron micrographs. The PL of this highly ordered material consists of a single peak that shifts to higher energy by > 110 meV as the excitation intensity is increased by several orders of magnitude.     

Thermal analysis of multi‐finger GaInP collector‐up heterojunction bipolar transistors with miniature heat‐dissipation packaging structures

We build up a finite element modeling (FEM) approach to analyze the thermal performance of collector‐up (C‐up) heterojunction bipolar transistor (HBTs) with a heat‐dissipation via configuration. Highly compact heat‐dissipation packaging structures of GaInP/GaAs C‐up HBTs have been designed and evaluated systematically. In this work, we devise the 2‐D and 3‐D models to simulate the actual devices and to investigate the temperature distribution behavior. Results from 2‐D model indicate that the large heat‐dissipation via configuration can be further reduced by 29% to meet the requirement of HBT‐based small high‐power amplifiers (HPAs) for the cellular phones. Furthermore, the demonstrated results show that the maximum temperature within the collector calculated from 3‐D model is lower than that from 2‐D model. In the 3‐D analysis, it is revealed that the configuration can be reduced by 32%. Therefore, thinning the heat‐dissipation via constructed underneath the GaInP/GaAs C‐up HBT should be helpful for miniaturization of HBT‐based HPAs in future mobile communication systems. Copyright © 2009 John Wiley & Sons, Ltd.     

界面复合效应对 Ⅲ-Ⅴ族叠层太阳电池性能的影响研究

界面复合是影响串联叠层太阳能电池效率的主要因素之一,详细分析和计算界面复合效应对理解光伏器件的性能是必要的.本文给出一个典型的GaInP/GaInAs/Ge 叠层太阳电池结构,在AM0辐照光谱工作条件下,通过包括光学和电学模块的理论模型计算了三个子电池正面、背面复合速率对叠层电池电流-电压特性曲线的影响.研究表明,GaInP顶电池界面复合是获得高效率叠层太阳能电池的主要限制因素。     

808 nm大功率无铝有源区非对称波导结构激光器

采用分别限制非对称波导结构,将光场从对称分布变为非对称分布,降低了载流子光吸收损耗,并允许p型区具有更高的掺杂水平,从而使器件电阻降低.对GaAsP/GaInP张应变单量子阱(SQW)非对称波导结构激光器的光场特性进行了理论分析,设计了波导层厚度,并制作了波长为808 nm的无铝有源区大功率半导体激光器.器件综合特性测试结果为:腔长900μm器件的阈值电流密度典型值为400 A/cm2,内损耗低至1.0 cm-1;连续工作条件下,150μm条宽器件输出功率达到6 W,最大斜率效率为1.25 W/A.器件激射波长为807.5 nm,平行和垂直结的发散角分别为3.0°和34.8°.20~70℃范围内特征温度达到133 K.结果表明,分别限制非对称波导结构是降低内损耗,提高大功率半导体激光器特性的有效措施.     

国产高效GaInP/GaAs/Ge三结太阳电池的低能质子辐射效应

运用2×1.7MV串列静电加速器提供的质子束,对MOCVD方法制备的GaInP/GaAs/Ge三结电池进行低能质子辐射效应研究.选质子能量为0.28,0.62和2.80MeV,辐照注量为1×1010,1×1011,1×1012和1×1013cm-2.对电池的辐射效应用I-V特性和光谱响应测试进行分析.研究结果表明:随辐照注量的增加,太阳电池性能参数Lsc,Voc和Pmax的衰降幅度均增大;但随质子辐照能量的增加,Lsc,Voc和Pmax的衰降幅度均减小.实验中0.28MeV质子辐照引起电池Lsc,Voc,Pmax衰降最显著,三结电池中光谱响应衰降最明显的是中间GaAs电池.