GaN/C60多层膜结构及光学特性的理论分析

使用转移矩阵方法计算了GaN／C60多层膜一维光子晶体的带隙结构。计算结果表明,由厚度分别为21nm、49nm的GaN、C60薄膜组成的多层膜结构,在中心带隙为6．46eV处有一不完全的光子带隙存在,反射率最高可达64．3％。     

氨化硅基Ga2O3／Al2O3制备GaN薄膜性质研究

研究了Ga2O3／Al2O3膜反应自组装制备GaN薄膜。首先利用磁控溅射法在硅衬底上制备Ga2O3／Al2O3膜，再将Ga2O3／Al2O3膜在高纯氨气气氛中氨化反应得到GaN薄膜。用傅里叶红外谱仪(FTIR)，X射线衍射(XRD)和扫描电镜(SEM)对试样进行结构、组分和形貌分析。通过分析薄膜各方面的性质，得出了用此方法制备氮化镓薄膜的Al2O3缓冲层最佳的厚度为15nm左右，最佳氨化条件是在900℃下氨化15min。     

粒状氮化镓微晶的合成及其结构性能的研究

在950℃的氮化温度下,通过单氢氧化镓（GaO2H）粉末与流动的NH3反应35 min制备出粒状GaN微晶.通过X射线衍射（XRD）和扫描电镜（SEM）研究发现,GaN粉末是六角纤锌矿结构的粒状微晶,其晶格常数a和c分别为0.3191 nm和0.5192 nm.X射线光电子能谱（XPS）揭示试样中有Ga-N键形成,Ga与N两元素比为1∶1.     

氮化镓纳米铅笔与纳米塔制备及优异场发射性能研究

通过化学气相沉积法,用氧化镓和氨气反应成功制备出氮化镓纳米铅笔和纳米塔。通过扫描电镜表征发现氮化镓纳米铅笔分为两个部分:底部是一个大直径的纳米线,顶部是一个小直径的纳米线;氮化镓纳米塔为层状结构。氮化镓纳米铅笔和纳米塔的形成机理是气-液-固机制。场发射性能测试显示氮化镓纳米铅笔的开启电场为2.6 V/μm,纳米塔的开启电场为4.1 V/μm,这使得它们可以用于场发射平板显示及显示装置的冷阴极电子源,它们还可以使用于设计复杂纳米电子器件。     

Deep levels and nonlinear characterization of AlGaN/GaN HEMTs on silicon carbide substrate

Deep levels in AlGaN/GaN high electron mobility transistors (HEMTs) on SiC substrate are known to be responsible for trapping processes like: threshold voltage shift, leakage current, degradation current, kink effect and hysteresis effect. The related deep levels are directly characterized by conductance deep level transient spectroscopy (CDLTS) method. Hereby, we have detected five carrier traps with activation energy ranging from 0.84 to 0.07 eV. In this study, we have revealed the presence of two hole-like traps (HL1 and HL2) observed for the first time by CDLTS with activations energy of 0.40 and 0.84 eV. The localisation and the identification of these traps are presented. Finally, the correlation between the anomalies observed on output and defects is discussed.     

Maskless pendeo-epitaxial growth of GaN films

High-resolution x-ray diffraction (XRD) and atomic force microscopy (AFM) of pendeo-epitaxial (PE) GaN films confirmed transmission electron microscopy (TEM) results regarding the reduction in dislocations in the wings. Wing tilt ≤0.15° was due to tensile stresses in the stripes induced by thermal expansion mismatch between the GaN and the SiC substrate. A strong D°X peak at ≈3.466 eV (full-width half-maximum (FWHM) ≤300 μeV) was measured in the wing material. Films grown at 1020°C exhibited similar vertical [0001] and lateral [11 0] growth rates. Increasing the temperature increased the latter due to the higher thermal stability of the GaN(11 0). The (11 0) surface was atomically smooth under all growth conditions with a root mean square (RMS)=0.17 nm.     

Development of partial-charge potential for GaN

Partial-charged potentials for GaN are systematically developed that describe a wide range of structural properties, where the reference data for fitting the potential parameters are taken from ab initial calculations or experiments. The present potential model provides a good fit to different structural geometries and high pressure phases of GaN. The high-pressure transition from wurtzite to rock-salt structure is correctly predicted yielding the phase transition pressure of about 55 GPa, and the calculated volume change at the transition is in good agreement with experimental data. The results are compared with those obtained by ab initio simulations.     

An analysis for AlGaN/GaN modulation doped field effect transistor using accurate velocity-field dependence for high power microwave frequency applications

An analytical model of Al_0.15Ga_0.85N/GaN modulation doped field effect transistor (MODFET), which uses an accurate velocity field relationship and incorporates the dominant effect of piezoelectric polarization induced charge at the AlGaN/GaN interface is presented. The effect of traps has also been taken into account. The calculated DC characteristics are in excellent agreement with the measured data. The model is extended to predict the microwave performance of the device. High current levels (>500 mA/mm), large transconductance (160.83 mS/mm) and a high cutoff frequency (9.6 GHz) have been achieved analytically and are in close agreement with the experimental data.     

Ultradense GaN nanopillar and nanopore arrays by self-assembly nanopatterning

We report on the details of controlled fabrication of highly crystalline gallium nitride (GaN) two-dimensional highly periodic ultradense nanopore and nanopillar arrays by self-assembly nanopatterning. Nanopore synthesis relies on the use of anodized alumina oxide template as a mask for dry etching of GaN top surface using chlorine gas. The inverse patterning is accomplished by site-selective deposition of metal nanodot array by e-beam evaporation of Ni through the pores of the template; after which the template is removed and dry etching is performed. The formed patterns demonstrate an excellent hexagonal order and uniformity according to fast Fourier transformation performed. The presented approach is robust, highly reproducible, and technically undemanding. Moreover, unreduced crystallinity of the produced nanopillars and nanopores was confirmed with Raman measurements, which suggests their possible use as future substrates for engineering advanced nano-optoelectronic devices and sensors.