多功能半导体激光医疗仪电源的研制

根据“多功能半导体激光医疗仪”整机的要求,采用同一电源对667nm和808nm半导体激光器实施供电。为避免电源在开、关机时对半导体激光管产生浪涌冲击,电源在设计中采用了适当的逻辑功能。并可保证对667nm激光器供电时,即使打开808nm激光器供电开关,也不对808nm半导体激光器供电,反之亦然。电源设有手动、计算机两种控制方法,及恒定功率、电流两种工作方式。     

一种新颖的半导体光放大器镀膜监控方法

本文介绍了一种在半导体光放大器镀膜过程中监测端面反射率的简单而有效的方法。理论模型的建立考虑了光放大器的漏电流和自发发射速率随载流于浓度的非线性变化，并且基于实验测量的ＰＩ（输出功率与注入电流）曲线，采用曲线拟合的方法来修正一些依赖于器件的参数，理论计算结果与有关文献的测量结果较好地吻合。     

Investigation of Ni/4H-SiC diodes as radiation detectors with low doped n-type 4H-SiC epilayers

The development of SiC minimum ionising particle (MIP) detectors imposes severe constrains in the electronic quality and the thickness of the material due to the relatively high value of the energy required to produce an electron–hole pair in this material by MIP against the value for Si. In this work, particle detectors were made using semiconductor epitaxial undoped n-type 4H-SiC as the detection medium. The thickness of the epilayer is on the order of 40 μm and the detectors are realised by the formation of a nickel silicide on the silicon surface of the epitaxial layer (Schottky contact) and of the ohmic contact on the back side of 4H-SiC substrate. The low doping concentration (6×10¹³ cm⁻³) of the epilayer allows the detector to be totally depleted at relatively low reverse voltages (100 V). We present experimental data on the charge collection properties by using 5.486 MeV -particles impinging on the Schottky contact. A 100% charge collection efficiency (CCE) is demonstrated for reverse voltages higher than the one needed to have a depletion region equal to the -particle extrapolated range in SiC. The diffusion contribution of the minority change carriers to CCE is pointed out. By comparing measured CCE values to the outcomes of drift–diffusion simulation, values are inferred for the hole lifetime within the neutral region of the charge carrier generation layer.     

Electronic and optical analysis of high-efficiency photovoltaic materials based on a GaN semiconductor

An ab initio study using the local spin density approximation of the electronic and optical properties of materials where Cr transition metal substitutes for N in the GaN host semiconductor with an atomic concentration of 1.56% is presented. This material, characterized by an isolated and partially filled intermediate band, is a candidate for high-efficiency solar cells. The atomic and orbital composition of this band has been analyzed showing that is mainly made up of a t-group orbital of the transition metal. The absorption coefficient theoretical results show a sub-gap absorption with respect to the host semiconductor which could lead to an increase in solar conversion efficiency.     

光孤子源的研制

报道了利用增益开关分布反馈半导体激光器，Ｆ－Ｐ光学滤波器及掺饵光纤放大顺研制成光孤子源的研究工作。光孤子源性能稳定，输出的超短光脉冲重复频率为２．５ＧＨｚ脉宽２４，谱宽０．１４ｎｍ，时间带宽积０．４１９，平均输出光功率２．４ｍＷ。     

半导体浪涌保护器基区参数探讨

讨论了半导体浪涌保护器件的基区宽度，着重分析了基区宽度与开通电压、静电电容、浪涌能力的关系，指出控制基区宽度，可有效地提高器件的浪涌能力，降低静电电容和开通电压     

TFT有源矩阵α－Si∶H薄膜PECVD淀积工艺研究

分析了α－Ｓｉ∶Ｈ薄膜的质量和厚度对α－Ｓｉ∶ＨＴＦＴ关键性指标的影响，深入、详细地讨论了其ＰＥＣＶＤ淀积工艺，并在实验的基础上确定了最佳淀积工艺参数，从而获得了高性能的７５ｍｍ３７２×２７６像素α－Ｓｉ∶ＨＴＦＴ有源矩阵     

提高E^2PROM中NMOS管源漏穿通电压的实验研究

为了提高Ｅ＾２ＰＲＯＭ中Ｎ管源漏穿通电压，用实验的方法对制造工艺进行了研究。结果表明，高能量注入是提高ＶＰＴ的有效手段，但受到ｐｎ结击穿的限制，只适用于低区短沟Ｎ管；ＤＤＤ工艺大幅度高ＶＰＴ，但ｐｎ结击穿电压低于２０Ｖ，不能应用于高压ＭＯＳ管；采用适量的防穿通注入和适当增大沟道长度为最理想的工艺途径。     

弱光位敏探测器

提出卫种新型弱光位敏探测器，总结了该器件理论分析设计，给出了实验结果，并与传统光电倍增管比较了优缺点。     

In0.53Ga0.47As／InP异质结光电二极管的深能级

采用深能级瞬态谱仪（ＤＬＴＳ）测定了Ｉｎ０．５３Ｇａ０．４７Ａｓ／ＩｎＰ异质结光电二极管的ＤＬＴＳ谱。发现存在一电子陷阱，该陷阱能级位于导带底以下０．４４ｅＶ处，能级密度为３．１０×１０１３ｃｍ－３，电子俘获截面为１．７２×１０－１２ｃｍ－２。由于深能级的存在，导致了该器件存在一种新的“暗电流”──“深能级协助隧穿电流”。