具有多品种晶圆混合加工的单臂组合设备调度

为了提高晶圆制造中组合设备的生产效率,在考虑晶圆驻留时间约束条件下,研究没有共享加工模块的多品种晶圆混合加工的单臂组合设备调度问题.首先,采用面向资源的Petri网模型描述多种晶圆产品的混合加工过程,引入控制变迁避免模型的死锁,采用赋时库所和赋时变迁模拟系统资源的活动时间.其次,通过虚拟加工的方法平衡工序的负载,基于系统Petri网模型和拉式调度策略,推导出单臂组合设备在多品种晶圆混合加工情形下的可调度性判定条件,并以解析形式描述.最后,提出了系统稳态调度求解算法并以实例验证了算法的有效性和可行性.     

Microstructure Control in 3D Printing with Digital Light Processing

Digital light processing stereolithography is a promising technique for 3D printing. However, it offers little control over the surface appearance of the printed object. The printing process is typically layered, which leads to aliasing artefacts that affect surface appearance. An antialiasing option is to use greyscale pixel values in the layer images that we supply to the printer. This enables a kind of subvoxel growth control. We explore this concept and use it for editing surface microstructure. In other words, we modify the surface appearance of a printed object by applying a greyscale pattern to the surface voxels before sending the cross-sectional layer images to the printer. We find that a smooth noise function is an excellent tool for varying surface roughness and for breaking the regularities that lead to aliasing. Conversely, we also present examples that introduce regularities to produce controlled anisotropic surface appearance. Our hope is that subvoxel growth control in stereolithography can lead 3D printing towards customizable surface appearance. The printing process adds what we call ground noise to the printed result. We suggest a way of modelling this ground noise to provide users with a tool for estimating a printer's ability to control surface reflectance.     

In Situ Inkjet Printing Strategy for Fabricating Perovskite Quantum Dot Patterns

Perovskite quantum dots are emerging as attractive materials for photonic and optoelectronic applications. Patterning is an important step to incorporate them into display, anti‐counterfeiting, and optical chip applications. In this work, an in situ inkjet printing strategy is demonstrated for fabricating perovskite quantum dots patterns by printing perovskite precursor solutions onto a polymeric layer. Importantly, this strategy can achieve bright photoluminescence with a quantum yield up to 80% and shows broad applicability to a variety of perovskites and polymers. Moreover, the as‐fabricated perovskite quantum dots patterns are composed of a microdisks array on the surface of polymeric layer. The size of these microdisks can be varied by adjusting the printing temperature. To demonstrate the potential use in display and advanced anti‐counterfeiting applications, color pixel patterns and 2D code pattern are fabricated by varying the precursor solutions. The combination of superior photoluminescence properties, simple process, and low cost makes the in situ inkjet printing strategy very promising for patterning perovskite quantum dots toward photonic integrations.     

Ultrafast Laser Pulses Enable One‐Step Graphene Patterning on Woods and Leaves for Green Electronics

Fast, simple, cost‐efficient, eco‐friendly, and design‐flexible patterning of high‐quality graphene from abundant natural resources is of immense interest for the mass production of next‐generation graphene‐based green electronics. Most electronic components have been manufactured by repetitive photolithography processes involving a large number of masks, photoresists, and toxic etchants; resulting in slow, complex, expensive, less‐flexible, and often corrosive electronics manufacturing processes to date. Here, a one‐step formation and patterning of highly conductive graphene on natural woods and leaves by programmable irradiation of ultrafast high‐photon‐energy laser pulses in ambient air is presented. Direct photoconversion of woods and leaves into graphene is realized at a low temperature by intense ultrafast light pulses with controlled fluences. Green graphene electronic components of electrical interconnects, flexible temperature sensors, and energy‐storing pseudocapacitors are fabricated from woods and leaves. This direct graphene synthesis is a breakthrough toward biocompatible, biodegradable, and eco‐friendlily manufactured green electronics for the sustainable earth.     

Scalable,Template Driven Formation of Highly Crystalline Lead-Tin Halide Perovskite Films

Low bandgap lead-tin halide perovskites are predicted to be candidates to maximize the performance of single junction and tandem solar cells based on metal halide perovskites. In spite of the tremendous progress in lab-scale device efficiency, devices fabricated with scalable techniques fail to reach the same efficiencies, which hinder their potential industrialization. Herein, a method is proposed that involves a template of a 2D perovskite deposited with a scalable technique (blade coating), which is then converted in situ to form a highly crystalline 3D lead-tin perovskite. These templated grown films are alloyed with stoichiometric ratio and are highly oriented with the (l00) planes aligning parallel to the substrate. The low surface/volume ratio of the obtained single-crystal-like films contributes to their enhanced stability in different environments. Finally, the converted films are demonstrated as active layer for solar cells, opening up the opportunity to develop this scalable technique for the growth of highly crystalline hybrid halide perovskites for photovoltaic devices.     

稳态调度下单臂组合设备时间延迟分析与优化

在半导体晶圆制造过程中,驻留时间延迟过长对晶圆质量具有消极影响.本文研究单臂组合设备稳态调度中如何合理地分配机械手等待时间,抵消驻留时间延迟的问题.首先,采用Petri网模型描述晶圆制造过程,分析了单臂组合设备稳态调度的时间特性,获得了稳态下工序驻留时间延迟计算表达式.其次,通过解构机械手等待时间对驻留时间延迟的影响机理,提出了一种机械手等待时间分配优先级规则.进一步,将虚拟瓶颈工序用于辅助分配机械手等待时间,结合优先级规则,提出了一种单臂组合设备稳态调度启发式算法.最后,通过例子验证了算法的可行性与有效性.与传统拉式策略和尽早加工策略对比,该算法能有效地减少单臂组合设备稳态调度下的驻留时间延迟并能满足晶圆制造的严格要求.     

无压自浸渗法制备SiCp/Al复合材料的概况

概述了无压自浸渗法制备SiCp/Al复合材料的理论及现状,介绍了利用无压自浸渗法制备SiCp/Al复合材料最佳工艺条件,并就过程中工艺参数对浸渗和材料性能的影响进行了分析。     

高导热率AIN陶瓷材料制备与应用进展

综述了高导热AIN陶瓷材料的制备技术及应用进展，指出了高导热AIN陶瓷材料制备工艺及其应用中存在的一些问题和其发展动向。     

Large area mold fabrication for the nanoimprint lithography using electron beam lithography

The mold fabrication is a critical issue for the development of nanoimprint lithography as an effective low-cost and mass production process.This paper describes the fabrication process developed to fabricate the large area nanoimprint molds on the silicon wafers.The optimization of e-beam exposure dose and pattern design is presented.The overlayer process is developed to improve the field stitching accuracy of e-beam exposure,and around 10 nm field stitching accuracy is obtained.By means of the optimizatio...