埋栅结构双极型静电感应晶体管动态特性的改善

双极型静电感应晶体管(BSIT)的失效经常出现在阻断态与导通态之间的瞬态过渡过程。因此,研究BSIT的开关动态过程的物理机理对于设计和制造高性能器件有着重要意义。本文深入研究了埋栅结构电力BSIT瞬态过程的动态特性,讨论了材料、几何结构与工艺参数对BSIT动态性能的影响。提出了一系列改善BSIT动态特性的工艺措施。     

Influence of Si<Subscript>3</Subscript>N<Subscript>4</Subscript> passivation on surface trapping in SiC metal-semiconductor field-effect transistors

The SiC metal-semiconductor field-effect transistors (MESFETs) have been reported to have current instability and strong dispersion caused by trapping phenomena at the surface and in the substrate, which degrade direct-current (DC) and radio-frequency (RF) performance. This paper illustrates the change in electrical characteristics of SiC MESFETs after Si₃N₄ passivation. Because of a reduction of surface trapping effects, Si₃N₄ passivation can diminish current collapse under pulsed DC conditions, increasing the RF power performance. The reduction of surface trapping effects is verified by the change in the ratio of the drain current to the gate current under pinch-off conditions.     

非对称HALO-LDD掺杂石墨烯纳米条带场效应管的电学特性研究(英文)

随着器件沟道尺寸的不断缩小,短沟道效应(SCE)和漏致势垒降低效应(DIBL)对常规类MOSFET结构的石墨烯纳米条带场效应管(GNRFET)影响变大,从而引起器件性能下降。文中提出了一种新型采用非对称HALO-LDD掺杂结构的GNRFET,其能够有效抑制器件中SCE和DIBL,改善器件性能。并采用一种量子力学模型研究GNRFET的电学特性,该模型基于二维NEGF(非平衡格林函数)方程和Poisson方程自洽全量子数值解。结合器件的工作原理,研究了GNRFET的电学特性和器件结构尺寸效应,通过与采用其他掺杂结构的GNRFET的电学特性对比分析,发现这种掺杂结构的石墨烯纳米条带场效应管具有更低的泄漏电流、更低的亚阈值斜率和DIBL以     

Non-functionalized soluble diketopyrrolopyrrole: Simplest p-channel core for organic field-effect transistors

We report the synthesis, characterization and behavior in field-effect transistors of non-functionalized soluble diketopyrrolopyrrole (DPP) core with only a solubilizing alkyl chain (i.e. –C₁₆H₃₃ or –C₁₈H₃₇) as the simplest p-channel semiconductor. The characteristics were evaluated by UV–vis and fluorescence spectroscopy, X-ray diffraction, cyclic voltammetry (CV), thermal analysis, atomic force microscopy (AFM) and density functional theory (DFT) calculation. For top-contact field-effect transistors, two types of active layers were prepared either by a solution process (as a 1D-microwire) or thermal vacuum deposition (as a thin-film) on a cross-linked poly(4-vinylphenol) gate dielectric. All the devices showed typical p-channel behavior with dominant hole transports. The device made with 1D-microwiress of DPP-R18 showed field-effect mobility in the saturation region of 1.42 × 10^?2 cm²/V s with I_ON/I_OFF of 1.82 × 10³. These findings suggest that the non-functionalized soluble DPP core itself without any further functionalization could also be used as a p-channel semiconductor for low-cost organic electronic devices.     

Sputtered oxides used for passivation layers of amorphous InGaZnO thin film transistors

Four sputtered oxide films (SiO₂, Al₂O₃, Y₂O₃ and TiO₂) along with their passivating amorphous InGaZnO thin film transistors (a-IGZO TFTs) were comparatively studied in this paper. The device passivated by an Al₂O₃ thin film showed both satisfactory performance (μ_FE=5.3 cm²/V s, I_on/I_off>10⁷) and stability, as was probably related to smooth surface of Al₂O₃ thin films. Although the performance of the a-IGZO TFTs with a TiO₂ passivation layer was also good enough (μ_FE=3.5 cm²/V s, I_on/I_off>10⁷), apparent V_th shift occurred in positive bias-stress tests due to the abnormal interface state between IGZO and TiO₂ thin films. Sputtered Y₂O₃ was proved no potential for passivation layers of a-IGZO TFTs in this study. Despite unsatisfactory performance of the corresponding a-IGZO TFT devices, sputtered SiO₂ passivation layer might still be preferred for its high deposition rate and excellent transparency which benefit the mass production of flat panel displays, especially active-matrix liquid crystal displays.     

SiGe HBT工艺宽带功率放大器

A novel broadband power amplifier fabricated in 0.13 m SiGe HBT technology is realized.The pseudo-differential structure is proposed to avoid the influence of the bonding wire due to the AC virtual ground created at the common emitter node.A compensated matching technique is adopted in interstage matching to expand bandwidth.A multi-stage broadband matching technique is used in an input/output matching network to offer broadband impedance matching,which ensures maximum power transfer.An adaptive bias circuit could improve linearity and efficiency in wide output power level.With 2.5 V power supply,the measured results achieve 96% 3-dB bandwidth(517-1470 MHz),27.2 dB power gain,26.9 dBm maximum output power,19.7 dBm output 1 dB compression point,and 26.7% power added efficiency.     

Temperature dependence of transfer characteristics of OTFT memory based on DNA-CTMA gate dielectric

A nonvolatile memory based on an organic thin-film transistor (OTFT) with a biopolymer of DNA-cetyltrimethylammonium chloride (DNA-CTMA) acting as the gate dielectric layer was fabricated. The transfer characteristics of the device prepared by both DNA alone and DNA-CTMA showed a very large and stable hysteresis. In order to analyze the memory mechanism, the temperature dependence of the transfer characteristics, electric conductivity, differential scanning calorimetry (DSC), thermally stimulated depolarization current (TSDC) as well as the dielectric property of the DNA-CTMA film have been investigated. As a result, the quasi-ferroelectric polarization originating from the alignment of the intrinsic dipole moment inside the DNA-CTMA complex was identified as the main source of hysteresis in the lower temperature region.     

Direct investigations of the interface impedance of organic field-effect transistors with self-assembled-monolayer-modified electrodes

It has been demonstrated that the modification of electrodes with self-assembled monolayers (SAMs) reduces the contact resistance and improves the device performances of organic field-effect transistors (OFETs). However, it has been difficult to judge if the contact resistance was reduced by the change in the electronic properties or by the change in the morphology of the metal–organic interface caused by the SAM modification because they have been difficult to be separately assessed. We have directly investigated the local impedance and the potential difference at the electrode–channel interfaces of the OFETs with and without modification of the electrodes by a pentafluorobenzenethiol SAM using frequency-modulation scanning impedance microscopy (FM-SIM). The potential profile measurement and the FM-SIM measurement at the interface showed that the improvement of the field-effect mobility in the SAM-modified OFET was caused by the reduction of the energy level mismatch, namely, the hole injection barrier at the source–channel interface, presumably with the reduction of the hole trap sites at the source–channel interface.     

Improvement of n-type OTFT electrical stability by gold electrode modification

N-type organic thin film transistors (OTFT) containing modified gold electrodes have been fabricated to investigate the influence of the self assembled monolayer on the transistor characteristics. We report on the effect of drain/source modification by thiol derivatives on the performances, electrical parameters uniformity and electrical stability of C₆₀ transistors. In the literature, electrical instability is often attributed to organic semiconductor (OSC), OSC-insulator interface and insulator. We found here that OSC-metal interfaces affect dramatically the operational stability for bottom gate/bottom contact structure. These effects have been attributed to morphological evolution at the interface metal-OSC induced by the self-assembled monolayers.     

一种提高硅双极器件频率和功率的新技术

提出了一种能同时提高硅双极器件频率和功率的新技术－具有深阱终端结构的新型梳状深阱结构技术。采用ＭＥＤＩＣＩ模拟分析表明,该技术可交双极器件的击穿电压ＢＶＣＢ０提高到平行平面结的９０％以上;可减小寄生效应和漏电流,有助于提高小电流β０;可适当的增加集电区掺杂浓度,减小τｄ,同时提高ＩＣＭ和Ｐｏ。