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71.
Thin films on aluminum-tungsten alloys were prepared by co-deposition of pure aluminum and pure tungsten, each sputtered by an independently controlled magnetron source, on glass and sapphire substrates. Completely amorphous films were obtained in the Al80W20-Al67W33 composition range. Passivity and corrosion behavior of amorphous Al-W alloys were investigated in 1 M deaerated hydrochloric acid solution using polarization and impedance spectroscopy measurements and have been correlated with the properties of pure alloy components. Tungsten and sputter-deposited Al-W thin films are inherently passive materials while aluminum undergoes pitting corrosion in hydrochloric acid solution. The passive film formed at the OCP on each alloy possesses excellent electric and dielectric properties comparable to those of the isolating film on tungsten. The absolute impedance increases with increasing tungsten content in the alloy. According to electrochemical polarization measurements, alloying Al with W in solid solution significantly enhances the material's resistance to pitting corrosion by shifting the breakdown potential above 2000 mV (Al67W33) and lowering the corrosion rate at the OCP by more than two orders of magnitude. The most likely mechanism explaining the passivity of amorphous Al-W alloys, the Solute Vacancy Interaction Model (SVIM), involves the formation of complexes between highly oxidized solute atoms (W+6) and mobile cation vacancies, which restrict the transport of Cl− through the oxide film and inhibit its breakdown in hydrochloric acid solution. The role that film stress relaxation effects and microscopic defects in amorphous Al-W films, of the some composition, and deposited on various substrates play in their corrosion resistance is discussed. 相似文献
72.
M.E. Enyiegbulam 《International Journal of Adhesion and Adhesives》1985,5(4):207-210
Increased wetting of the coupling agent/epoxy resin interface was observed when γ-glycidoxypropyltrimethoxysilane, polyfunctional aminosilane and γ-aminopropyltriethoxysilane were applied respectively from methyllethylketone, dimethylformamide and water on woven glass cloths which had been cleaned at 300°C. However, when factory-applied coupling agents were burnt off the woven cloths and fresh coupling agents re-applied, it was found that the nature of the factory-applied coupling agent influenced subsequent wetting. Thinner glass fibres showed a greater improvement in wetting rate than thicker fibres in those solvents identified to be good for improved wettability, irrespective of the heat-cleaning temperature. 相似文献
73.
74.
ABSTRACT: Physical aging of amorphous anhydrous fructose at temperature 5 °C and at 22 °C was studied using differential scanning calorimetry (DSC). The dynamic glass transition temperature, Tg0 for unaged samples was 16 °C and 13.3 °C for heating rate of 10 °C/min and 1 °C/min, respectively. The fictive temperature, Tf0 for unaged samples calculated by Richardson and Savill method was 12 °C, which is close to the dynamic value obtained from the lower DSC heating rate. The fictive temperature Tf of the aged fructose glasses at temperatures both below and above the transition region was fitted well by a non-exponential decay function (Williams-Watts form). Aging above the transition region (22 °C) for 18 d increased both the dynamic glass transition temperature Tg and the fictive temperature Tf . However, aging below the transition region (5 °C) for 1 d increased the dynamic glass transition temperature Tg but decreased the fictive temperature Tf . 相似文献
75.
研究了用光漂白的方法制备PMMA/DR1聚合物非线性定向耦合器,提出了一种容易的制备方法来得到要求的耦合长度.测量了材料的光学非线性对定向耦合器两臂透过率的影响.实验结果表明由于光学非线性,耦合器的耦合长度随着入射光强度的改变而发生变化. 相似文献
76.
QifengShu JiayunZhang 《北京科技大学学报(英文版)》2005,12(3):221-224
Based on recently published experimental data, the Riboud model was modified for viscosity estimation of the slags containing calcium fluoride. The estimated values were in good agreement with measured data. Reasonable estimation can be achieved using the modified Riboud model for mould fluxes and ESR (eletro slag remelting) slags. Especially for ESR slags, the modified Riboud model can provide much more precise values than the original Riboud model. 相似文献
77.
The bonding of β'-Al2O3 and pyrex glass to Al matrix composites by anodic bonding process is achieved. The microstructure of the bonded interface and the joining mechanisms are analyzed with scanning electron microscope (SEM), energy dispersive X-ray fluorescence spectrometer (EDX). It is observed that the bonding region across the interface consists of the metal layer, oxide transitional layer and the ceramic layer, with the transitional layer composed of surface region and sub-surface region. The bonding process can mainly be categorized into anodic bonding process and solid state diffusing process. The pile-up of the ions and its drift in the interface area are the main reasons for anode oxidation and joining of the interface. The temperature, voltage and the drift ions in the ceramic or glass during the bonding process are the essential conditions to solid state diffusing and oxide bonding at the interface. The voltages, temperature, pressure as well as the surface state are the main factors that influence the anodic bonding. 相似文献
78.
Oxide films were deposited on different substrates by laser molecular beam epitaxy. Reflection high-energy electron diffraction was performed to in situ investigate the change of growth mode and the lattice relaxation during the growth. An asymmetrical phenomenon was found in the two kinds of strain states, compressive stress and tensile stress of heterostructures with different lattice mismatch. In the case of BaTiO3/SrTiO3 (2.2%), 2D layer-by-layer growth mode without lattice relaxation can be maintained for a longer period for BTO films on STO with compressive stress, comparing to STO films on BTO with tensile stress. When MgO films were deposited on SrTiO3 with a large mismatch of 7.8%, compressive stress leads to rapid lattice relaxation with a very thin wet layer, and 3D strained island were observed. As a comparison, SrTiO3 films on MgO with tensile stress were configured. No RHEED patterns can be observed duo to a large tensile stress. 相似文献
79.
80.
基体温度对磁控溅射沉积ZAO薄膜性能的影响 总被引:8,自引:2,他引:6
利用中频交流磁控溅射方法 ,采用氧化锌铝陶瓷靶材 [w(ZnO) =98%、w(Al2 O3 ) =2 % ]制备了ZAO(ZnO∶Al)薄膜 ,观察了基体温度对ZAO薄膜的晶体结构、电学和光学性能的影响 ,采用X射线衍射仪对薄膜的结构进行了分析 ,采用光学分度计和电阻测试仪测量了薄膜的光学、电学特性 ,采用霍尔测试仪测量了薄膜的载流子浓度和霍尔迁移率。结果表明 :沉积薄膜时的基体温度对薄膜的结构、结晶状况、可见光透射率以及导电性有较大的影响。当基体温度为 2 5 0℃ ,Ar分压为 0 8Pa时 ,薄膜的最低电阻率为 4 6× 10 -4Ω·cm ,方块电阻为 35Ω时 ,可见光 (λ =5 5 0nm)透射率高达 92 0 %。 相似文献