由失效磷酸基抛光液直接制备纳米锥冰晶石

研究由失效磷酸基抛光液直接制备纳米锥冰晶石新工艺。在反应温度为50℃,反应时间为40min,搅拌速度为200r/min,氢氧化钠用量为理论化学计量的1.0倍,氢氟酸添加量为理论化学计量的1.2倍,静置时间为1d的条件下,失效磷酸基抛光液中铝脱除率可达90%以上,锥冰晶石产率为抛光液处理质量的8%~10%。,锥冰晶石粒径在25nm~30nm。与传统失效磷酸基抛光液处理工艺比较,新工艺不仅使抛光液得到再生利用,而且容易获得纯度高的纳米锥冰晶石产品,具有良好的推广应用前景。     

Damage mechanisms during lapping and mechanical polishing CdZnTe wafers

CdZnTe wafers were machined by lapping and mechanical polishing processes, and their surface and subsurface damages were investigated.The surface damages are mainly induced by three-body abrasive wear and embedded abrasive wear during lapping process. A new damage type, which is induced by the indentation of embedded abrasives, is found in the subsurface. When a floss pad is used to replace the lapping plate during machining, the surface damage is mainly induced by two-body abrasive and three-body abrasive wear, and the effect of embed-ded abrasives on the surface is greatly weakened. Moreover, this new damage type nearly disappears on the subsurface.     

Ni /Ti 多层膜界面状态优化分析

目的减小Ni/Ti多层膜表面粗糙度,提高Ni/Ti多层膜对中子束的反射率。方法采用离子束辅助沉积设备沉积Ni/Ti周期性多层膜,通过不同抛光时间和不同离子能量轰击对多层膜界面进行清洗抛光;采用反应溅射法,在镀Ti层时使用氢气和氩气混合气为工作气体,将H原子掺入Ti层以改变晶粒结构而影响多层膜界面状态。结果随着辅助离子源功率的增加,Ni/Ti多层膜的表面粗糙度增加;在合适的离子能量下,随着抛光时间的不断增加,Ni/Ti多层膜的表面粗糙度逐渐减小。Ti层中掺H的Ni/Ti多层膜比未掺H的多层膜表面粗糙度小,界面更加清晰。结论低能量的离子轰击条件下,适当的抛光时间能对多层膜实现较好的抛光效果。Ti层中掺入H原子,抑制了Ni原子与Ti原子的扩散,减小了Ti膜层晶粒大小,从而抑制了表面粗糙度的增加。     

有序排布钎焊金刚石磨盘的实验研究

将有序排布理论运用到钎焊技术,成功制备适合黑色金属、钢铁材料磨拋的新型工具—有序排布单层钎焊金刚石磨盘;将平面单颗磨粒有序排布方式与磨料群可控排布方式相结合,设计出一种新型磨盘顶端平面排布方式,并确定排布参数;对船用钢板Q345低合金高强度结构钢进行磨拋试验,对比分析新型钎焊金刚石磨盘与传统树脂砂轮片的磨削性能。结果表明:新型磨盘较树脂砂轮片噪音提高,磨屑规则(主要呈带状),磨粒以磨损失效为主,几乎无整颗磨粒脱落,磨削效率约为树脂砂轮片的1.5倍。     

阴离子表面活性剂及复配对阻挡层抛光液性能的影响

为提高铜互连化学机械抛光(CMP)后表面质量,在抛光液中需引入适当的表面活性剂以改善磨料的稳定性以及CMP后铜的表面粗糙度。研究了十二烷基硫酸铵(ADSA)、脂肪醇聚氧乙烯醚硫酸铵(AESA)、直链烷基苯磺酸(LABSA)3种不同阴离子表面活性剂,以及非离子表面活性剂脂肪醇聚氧乙烯醚(AEO-9)和LABSA复配表面活性剂对钽阻挡层抛光液润湿性、分散性以及对材料去除速率的影响。通过接触角测量仪、纳米粒度仪、扫描电镜和原子力显微镜测试表面张力、接触角、大颗粒数、粒径分布以及CMP后铜的表面粗糙度,并分析复配表面活性剂的作用机制。结果表明：抛光液中加入LABSA后,因其具有直链型结构,抛光液的润湿性和分散性效果最好,抛光后铜表面的粗糙度最低;AEO-9和LABSA进行复配,相较于单一的LABSA,抛光液的润湿性、分散性、稳定性和抛光后铜表面粗糙度均有所改善,体积分数0.1%LABSA+0.1%AEO-9的复配表面活性剂性能最优,CMP后铜表面粗糙度降至0.7 nm。     

钒及钒基合金金相试样的制备方法

介绍了一种钒及钒基合金金相试样的常规制样方法,即试样的机械磨光,机械化学抛光,化学侵蚀等技术和经验。     

蓝宝石晶片纳米级超光滑表面加工技术研究

本文提出以蓝宝石塑性磨削和化学机械抛光为主要手段，以原子力显微镜为主要检测工具，来制备满足光电子领域要求的纳米级超光滑蓝宝石晶片的新方法。在高刚性磨床上，用W7的金刚石砂轮以f=1μm／r进给量，实现了蓝宝石晶片的浅损伤塑性域磨削。配制了以SiO2溶胶为抛光料的监宝石晶片专用抛光液，稳定地获得了无损伤层的RMS小于0.2nm的超光滑蓝宝石晶片表面。GaN外延生长所需蓝宝石晶片的合理抛光参数是：SiO2的粒子直径为7nm、浓度为3％、pH=11、压力P=200Pa。     

3D surface topography assessment of the effect of different electrolytes during electrochemical polishing of EDM surfaces

In many countries the most common polishing practice in die making is to hand polish the part as a finishing operation after the electro discharge machining process (EDM). The usual polishing abrasives are silicon carbide paper and diamond paste of different grit sizes.However, during the last decade researchers especially in Japan and the USA have tried to combine EDM and electrochemical machining (ECM) in one machine so as to use the positive aspects of each individual process. The ECM process uses high density, typically 50 A/cm², and also a pulse current with a servo-controlled electrode. These investigators have mostly used sodium nitrate solutions (of different concentrations) as the electrolyte.This paper deals with an experiment that was undertaken in order to assess the effect of four different electrolytes in an electrochemical polishing process (ECP) on the surface topography of EDM surfaces. The primary set of 3D surface parameters was used as a basis to characterise the surface produced by the combined processes in different electrolytic media.     

Fine structure of tooth enamel in the yellowing human teeth: SEM and HRTEM studies

Objective : The aim of this study was to clarify an influence of the fine structure of human tooth enamel to the yellowing teeth. Materials and methods : Sound maxillary first premolars of 15–50‐year‐old females that were extracted for the orthodontic treatment were used as the test samples. The tooth enamel sections of these teeth that prepared by ion polishing were observed by scanning electron microscopy (SEM). Furthermore, the fine structure of substance filling the inter‐rod spaces was analyzed by high resolution transmission electron microscopy (HRTEM). Results : In white tooth, the inter‐rod spaces were observed at the width of about 0.1 μm, while in yellow tooth, the inter‐rod spaces were not clearly observed by SEM. HRTEM observations revealed for the first time that the inter‐rod spaces were filled with fine particles of poorly crystallized hydroxyapatite in the yellow tooth. In yellow tooth, it was considered that the color of the inner dentin was recognized due to the decrease of light scattering by filling the tooth enamel inter‐rod spaces. The generation of particles in the tooth enamel inter‐rod spaces was considered to be caused by the long‐time progression of calcification. Conclusions : These results suggested that the change in fine structure, filling in inter‐rod spaces of tooth enamel, was related to progression of calcification in the inter‐rod spaces with advancing age and one of the factors of yellowness of human tooth. Microsc. Res. Tech. 79:14–22, 2016. © 2015 Wiley Periodicals, Inc.     

基于弹性基体磨具的3D打印高温合金叶片磨抛试验

目的 验证弹性基体磨具自适应磨削抛光加工增材制造镍基高温合金叶片的工艺可行性。方法 以硅橡胶基体磨具弹性磨抛技术为基础,建立弹性磨具与叶片接触的有限元模型,分析磨具与工件接触区域内应力和材料去除分布。以有限元分析结果为指导,研究磨具接触变形和材料去除对轨迹规划的影响,确定合理的轨迹步长和间距,并通过控制工件位姿角的变化,保证在磨抛过程中磨具与工件的接触状态不变。以GH4169镍基合金叶片为加工对象,采用硅橡胶弹性固结磨料磨具在小型四轴加工平台上进行磨抛试验。结果 仿真结果表明,弹性磨具与曲面工件之间的接触区域为椭圆形,应力和材料去除分布都由椭圆心到周围逐渐减小;当弹性磨具的压缩量为3 mm时,基于弹性接触有限元分析结果确定的最优轨迹间距为9 mm。试验结果表明,采用自适应磨抛轨迹抛光后,叶片表面无明显划痕和抛光纹理,表面粗糙度Ra由开始的1.846μm降至0.182μm,标准差由0.108μm降至0.026μm,材料去除率为3.432×10⁹μm³/min。结论 硅橡胶弹性固结磨料磨具可用于GH4169镍基合金叶片的超精密磨抛,基于弹性磨具接...