分子束外延生长p型ZnTe:Sb-ZnSe应变层超晶格材料

我们以掺Fe的高阻InP作衬底材料,在国产MBE-Ⅲ型设备上,采用调制掺杂技术,成功地生长出了p型ZnTe:Sb-ZnSe应变层超晶格材料。室温霍耳效应测量表明:载流子浓度为10~(14)/cm~3量级,迁移率为250cm~2/V·s。俄歇谱分析清楚表明,仅在ZnTe层中Sb原子存在,且界面比较分明,调制掺杂已获初步成功。     

气相色谱法测定新鲜茶叶中有机氯农药残留量

对新鲜茶树叶中六六六和滴滴涕共八种异构体的残留量进行测定,与同地点成品茶叶农药残留量相比较基本无差异。本法检测限为>1.8ng/g,回收率为78.2％-99.0％,相对标准偏差<10.0％。     

浅谈影响气相色谱法测定食用植物油中溶剂残留的诸因素

简单介绍了气相色谱法测定食用植物油中溶剂残留的原理，着重从检测角度提出影响测定准确的六个因素及防范措施。     

纺织器材机件的新型修复技术（二）

4气相沉积技术气相沉积按机理划分，可分为物理气相沉积（PhysicalVapourdisposion）和化学气相沉积（ChemicalVapourdisposion），前者通称PVD，后者通称CVD。4.1PVD法阴极溅射4.1.1阴极溅射的基本原理阴极溅射就是在真空的条件下，用荷能粒子轰击某一靶材（阴极），使靶材表面原子以一定的能量溅出，然后在机件表面沉积的过程，图4-1是阴极溅射系统简图。靶是一平板，由欲沉图4-1阴极溅射系统简囤积的材料组成，将它与电源的负极相联（阴极）。固定装置可以接地、悬空、偏置、加热、冷却。真空槽中充入1．33×10Pa～1．33×10-1Pa的…     

益舒宝颗粒剂气相色谱分析

使用５％ＯＶ－１０１（或ＳＥ－３０）为固定液的１ｍ长填充柱，以邻苯二甲酸二丁酯为内标物，进行了１０％益舒宝颗粒剂的气相色谱定量分析。     

化学束外延

本文介绍了化学束外延(CBE)的发明和发展,论述了CBE的原理和设备。文中还介绍了最近提出的一种生长机理。     

GaAs MBE生长过程中的RHEED强度振荡

本文报道了用RHEED强度振荡方法来测定GaAs,Al_xGa_(1-x)As生长速度及Al组分,并初步讨论了产生RHEED强度振荡的机制及其与生长条件的关系。     

Si3N4／CrN nanostructured muitilayers grown by RF reactive magnetron sputtering

The amorphous/polycrystalline Si3N4/CrN nancrstructured multilayer films have been prepared by radio frequency (RF) reactive magnetron sputtering. The composition, microstructure and mechanical properties of these films were characterized by X-ray photoelectron spectroscopy (XPS), X-ray diffraction (XRD), high-resolution transmission electron microscopy (HRTEM) and nano-indentation. The CrN and Si3N4 single layer films are polycrystalline face centered-cubic and amorphous structures, respectively. The CrN and Si3N4 layers are nearly stoichiometric. The HRTEM image indicates that the interfaces are planar and modulation structure is clear in multilayers. The hardness values of Si3N4/CrN multilayers are between those of the constituent CrN and Si3N4 films at a substrate temperature of 20℃, and are somewhat higher than those of Si3N4 films at a deposition temperature of 500℃. There is no superhardness effect in the Si3N4/CrN multilayers. Based on the experimental results, the hardening mechanisms in the multilayers have been discussed.